公开(公告)号：US20240071785A1

公开(公告)日：2024-02-29

申请号：US18260566

申请日：2022-06-23

Applicant: NEXTIN, INC.

Inventor： Seoung-Ju Na ,  Heung-Gyoon PARK ,  Keun Young LIM ,  Moo Hwan KIM

IPC: H01L21/67 ,  H01J37/32 ,  H01L21/687

CPC classification number: H01L21/67115 ,  H01J37/32568 ,  H01L21/68792 ,  H01J2893/0016

Abstract: A semiconductor manufacturing apparatus according to an embodiment of the present invention comprises: an ultraviolet generating part which is disposed in an ultraviolet generating chamber and generates ultraviolet rays of a target wavelength; a substrate driving part including a chuck which is disposed in a process chamber where a substrate fed therein is treated with ultraviolet rays and supports the fed substrate, and an axis which rotates and moves up and down the chuck; and a window which is disposed between the ultraviolet generating chamber and the process chamber and transmits the generated ultraviolet rays to the process chamber.