Low pass X-ray scintillator system
    21.
    发明授权
    Low pass X-ray scintillator system 有权
    低通X射线闪烁体系统

    公开(公告)号:US07800072B2

    公开(公告)日:2010-09-21

    申请号:US11278836

    申请日:2006-04-06

    CPC classification number: G01T1/2002 G01T1/20

    Abstract: A scintillated CCD detector system for imaging x rays uses x-rays having a photon energy in the range of 1 to 20 keV. The detector differs from existing systems in that it provides extremely high resolution of better than a micrometer, and high detection quantum efficiency of up to 95%. The design of this detector also allows it to function as an energy filter to remove high-energy x-rays. This detector is useful in a wide range of applications including x-ray imaging, spectroscopy, and diffraction. The scintillator optical system has scintillator material with a lens system for collecting the light that is generated in the scintillator material. A substrate is used for spacing the scintillator material from the lens system.

    Abstract translation: 用于对X射线成像的闪烁CCD检测器系统使用具有在1至20keV范围内的光子能量的X射线。 检测器与现有系统不同之处在于它提供比千分尺更高的分辨率,高达95%的高检测量子效率。 该检测器的设计也可以用作能量过滤器,以去除高能X射线。 该检测器可用于广泛的应用,包括X射线成像,光谱和衍射。 闪烁体光学系统具有闪烁体材料,其具有用于收集闪烁体材料中产生的光的透镜系统。 衬底用于将闪烁体材料与透镜系统间隔开。

    CD-GISAXS System and Method
    22.
    发明申请
    CD-GISAXS System and Method 有权
    CD-GISAXS系统和方法

    公开(公告)号:US20080273662A1

    公开(公告)日:2008-11-06

    申请号:US11774183

    申请日:2007-07-06

    CPC classification number: G01N23/201 G03F7/70625

    Abstract: CD-GISAXS achieves reduced measurement times by increasing throughput using longer wavelength radiation (˜12×, for example) such as x-rays in reflective geometry to increase both the collimation acceptance angle of the incident beams and the scattering signal strength, resulting in a substantial combined throughput gain. This wavelength selection and geometry can result in a dramatic reduction in measurement time. Furthermore, the capabilities of the CD-GISAXS can be extended to meet many of the metrology needs of future generations of semiconductor manufacturing and nanostructure characterization, for example.

    Abstract translation: CD-GISAXS通过增加使用较长波长辐射(例如约12x)(例如反射几何形状的x射线)的吞吐量来实现缩短的测量时间,以增加入射光束的准直接收角和散射信号强度,从而导致大量 组合吞吐量增益。 这种波长选择和几何结构可以大大减少测量时间。 此外,CD-GISAXS的功能可以扩展,以满足未来几代半导体制造和纳米结构表征的许多计量需求。

    Optimized x-ray energy for high resolution imaging of integrated circuits structures
    23.
    发明授权
    Optimized x-ray energy for high resolution imaging of integrated circuits structures 有权
    优化的x射线能量用于集成电路结构的高分辨率成像

    公开(公告)号:US07394890B1

    公开(公告)日:2008-07-01

    申请号:US10983415

    申请日:2004-11-08

    CPC classification number: G21K7/00 G21K1/06 G21K2201/067 G21K2207/005

    Abstract: An x-ray imaging system uses particular emission lines that are optimized for imaging specific metallic structures in a semiconductor integrated circuit structures and optimized for the use with specific optical elements and scintillator materials. Such a system is distinguished from currently-existing x-ray imaging systems that primarily use the integral of all emission lines and the broad Bremstralung radiation. The disclosed system provides favorable imaging characteristics such as ability to enhance the contrast of certain materials in a sample, to use different contrast mechanisms in a single imaging system, and to increase the throughput of the system.

    Abstract translation: X射线成像系统使用针对半导体集成电路结构中的特定金属结构进行成像而优化的特定发射线,并针对特定的光学元件和闪烁体材料进行优化。 这种系统与目前存在的主要使用所有发射线和广泛的布氏体辐射的整体的X射线成像系统不同。 所公开的系统提供有利的成像特征,例如增强样品中某些材料的对比度的能力,以在单个成像系统中使用不同的对比度机制,并且增加系统的吞吐量。

    Fabrication Methods for Micro Compound Optics
    24.
    发明申请
    Fabrication Methods for Micro Compound Optics 审中-公开
    微复合光学制造方法

    公开(公告)号:US20080094694A1

    公开(公告)日:2008-04-24

    申请号:US11958544

    申请日:2007-12-18

    Abstract: Methods for fabricating refractive element(s) and aligning the elements in a compound optic, typically to a zone plate element. The techniques are used for fabricating micro refractive, such as Fresnel, optics and compound optics including two or more optical elements for short wavelength radiation. One application is the fabrication of the Achromatic Fresnel Optic (AFO). Techniques for fabricating the refractive element generally include: 1) ultra-high precision mechanical machining, e.g,. diamond turning; 2) lithographic techniques including gray-scale lithography and multi-step lithographic processes; 3) high-energy beam machining, such as electron-beam, focused ion beam, laser, and plasma-beam machining; and 4) photo-induced chemical etching techniques. Also addressed are methods of aligning the two optical elements during fabrication and methods of maintaining the alignment during subsequent operation.

    Abstract translation: 用于制造折射元件并将复合光学元件中的元件对准的方法,通常与区域板元件对准。 这些技术用于制造微折射,例如菲涅尔,光学和复合光学器件,包括用于短波长辐射的两个或更多个光学元件。 一种应用是制造消色差菲涅耳光(AFO)。 用于制造折射元件的技术通常包括:1)超高精度机械加工,例如 钻石车削 2)光刻技术,包括灰阶光刻和多步光刻工艺; 3)高能束加工,如电子束,聚焦离子束,激光和等离子束加工; 和4)光诱导化学蚀刻技术。 还涉及在制造期间对准两个光学元件的方法以及在随后的操作期间维持对准的方法。

    Dual-band detector system for x-ray imaging of biological samples
    25.
    发明授权
    Dual-band detector system for x-ray imaging of biological samples 有权
    用于生物样品X射线成像的双波段检测器系统

    公开(公告)号:US07286640B2

    公开(公告)日:2007-10-23

    申请号:US10990198

    申请日:2004-11-16

    CPC classification number: G01T1/202 G01T1/2018 G21K2207/005

    Abstract: A digital dual-band detector functions as an imaging platform capable of extracting hard and soft tissue images, for example. The detector has a first detector system comprising a first scintillator for converting x-rays from a sample to an first optical signal, and a first detector for detecting the first optical signal in combination with a second detector system comprising a second scintillator for converting x-rays from the sample and passing through the first scintillator to a second optical signal, and a second detector for detecting the second optical signal. The detector can facilitate the implementation and deployment of recent developments and can permit low cost practical deployment in clinical applications as well as biomedical research applications where significant improvement in spatial resolution and image contrast is required.

    Abstract translation: 例如,数字双频带检测器用作能够提取硬和软组织图像的成像平台。 检测器具有第一检测器系统,该第一检测器系统包括用于将来自样品的x射线转换成第一光信号的第一闪烁器,以及用于与第二检测器系统一起检测第一光信号的第一检测器,该第二检测器系统包括用于将x- 来自样品的光并通过第一闪烁体到第二光信号;以及第二检测器,用于检测第二光信号。 检测器可以促进近期发展的实施和部署,并且可以允许临床应用中的低成本实际部署以及需要显着改善空间分辨率和图像对比度的生物医学研究应用。

    Phase contrast microscope for short wavelength radiation and imaging method
    26.
    发明授权
    Phase contrast microscope for short wavelength radiation and imaging method 失效
    相位显微镜用于短波长辐射和成像方法

    公开(公告)号:US07119953B2

    公开(公告)日:2006-10-10

    申请号:US10331108

    申请日:2002-12-27

    Abstract: A phase contrast x-ray microscope has a phase plate that is placed in proximity of and attached rigidly to the objective to form a composite optic. This enables easier initial and long-term maintenance of alignment of the microscope. In one example, they are fabricated on the same high-transmissive substrate. The use of this composite optic allows for lithographic-based alignment that will not change over the lifetime of the instrument. Also, in one configuration, the phase plate is located between the test object and the objective.

    Abstract translation: 相位X射线显微镜具有相位板,其被放置在物镜附近并刚性地附接到物镜上以形成复合光学元件。 这使得显微镜对准的初始和长期维护变得容易。 在一个示例中,它们被制造在相同的高透光性基板上。 使用这种复合光学器件允许在仪器寿命期内不会改变的基于光刻的对准。 而且,在一种配置中,相位板位于测试对象和目标之间。

    Lens Bonded X-Ray Scintillator System and Manufacturing Method Therefor
    27.
    发明申请
    Lens Bonded X-Ray Scintillator System and Manufacturing Method Therefor 有权
    镜片粘结X射线闪烁体系及其制造方法

    公开(公告)号:US20060192129A1

    公开(公告)日:2006-08-31

    申请号:US11278839

    申请日:2006-04-06

    CPC classification number: G01T1/2002 G01T1/20

    Abstract: A scintillated CCD detector system for imaging x rays uses x-rays having a photon energy in the range of 1 to 20 keV. The detector differs from existing systems in that it provides extremely high resolution of better than a micrometer, and high detection quantum efficiency of up to 95%. The design of this detector also allows it to function as an energy filter to remove high-energy x-rays. This detector is useful in a wide range of applications including x-ray imaging, spectroscopy, and diffraction. The scintillator optical system has scintillator material with a lens system for collecting the light that is generated in the scintillator material. A substrate is used for spacing the scintillator material from the lens system.

    Abstract translation: 用于对X射线成像的闪烁CCD检测器系统使用具有在1至20keV范围内的光子能量的X射线。 检测器与现有系统不同之处在于它提供比千分尺更高的分辨率,高达95%的高检测量子效率。 该检测器的设计也可以用作能量过滤器,以去除高能X射线。 该检测器可用于广泛的应用,包括X射线成像,光谱和衍射。 闪烁体光学系统具有闪烁体材料,其具有用于收集闪烁体材料中产生的光的透镜系统。 衬底用于将闪烁体材料与透镜系统间隔开。

    Scintillator optical system and method of manufacture
    28.
    发明授权
    Scintillator optical system and method of manufacture 有权
    闪烁光学系统及其制造方法

    公开(公告)号:US07057187B1

    公开(公告)日:2006-06-06

    申请号:US10704382

    申请日:2003-11-07

    CPC classification number: G01T1/2002 G01T1/20

    Abstract: A scintillated CCD detector system for imaging x rays uses x-rays having a photon energy in the range of 1 to 20 keV. The detector differs from existing systems in that it provides extremely high resolution of better than a micrometer, and high detection quantum efficiency of up to 95%. The design of this detector also allows it to function as an energy filter to remove high-energy x-rays. This detector is useful in a wide range of applications including x-ray imaging, spectroscopy, and diffraction. The scintillator optical system has scintillator material with a lens system for collecting the light that is generated in the scintillator material. A substrate is used for spacing the scintillator material from the lens system.

    Abstract translation: 用于对X射线成像的闪烁CCD检测器系统使用具有在1至20keV范围内的光子能量的X射线。 检测器与现有系统不同之处在于它提供比千分尺更高的分辨率,高达95%的高检测量子效率。 该检测器的设计也可以用作能量过滤器,以去除高能X射线。 该检测器可用于广泛的应用,包括X射线成像,光谱和衍射。 闪烁体光学系统具有闪烁体材料,其具有用于收集闪烁体材料中产生的光的透镜系统。 衬底用于将闪烁体材料与透镜系统间隔开。

    Back-end-of-line metallization inspection and metrology microscopy system and method using x-ray fluorescence
    29.
    发明申请
    Back-end-of-line metallization inspection and metrology microscopy system and method using x-ray fluorescence 审中-公开
    后端金属化检测和计量显微镜系统和使用X射线荧光的方法

    公开(公告)号:US20050282300A1

    公开(公告)日:2005-12-22

    申请号:US11177227

    申请日:2005-07-08

    CPC classification number: G01N23/2252

    Abstract: Systems and methods for performing inspection and metrology operations on metallization processes such as on back-end-of-line (BEOL) metallization thickness and step coverage are disclosed. Specific examples include measurements of thickness and uniformity of barrier layers, including tantalum for example, and seed layers, including copper for example, in Damascene, including dual-Damascene, trenches during the interconnect fabrication steps of integrated circuit production. The invention also relates to the detection and measurement of void formation during and after copper electroplating. The invention utilizes x-ray fluorescence to measure the absolute thicknesses and the thickness uniformity of the barrier layers in the trenches, the copper seed layers for electroplating, and the final copper interconnects.

    Abstract translation: 公开了用于对金属化过程进行检查和计量操作的系统和方法,例如在后端(BEOL)金属化厚度和台阶覆盖。 具体实例包括例如包括钽的阻挡层的厚度和均匀性的测量,以及例如在镶嵌中的包括铜的种子层(包括双镶嵌),在集成电路生产的互连制造步骤期间的沟槽。 本发明还涉及在铜电镀期间和之后的空隙形成的检测和测量。 本发明利用x射线荧光来测量沟槽中的势垒层的绝对厚度和厚度均匀性,用于电镀的铜籽晶层和最终的铜互连。

    ACHROMATIC FRESNEL OPTICS FOR ULTRAVIOLET AND X-RAY RADIATION
    30.
    发明申请
    ACHROMATIC FRESNEL OPTICS FOR ULTRAVIOLET AND X-RAY RADIATION 有权
    用于超紫外线和X射线辐射的高光谱光学

    公开(公告)号:US20050168820A1

    公开(公告)日:2005-08-04

    申请号:US10134026

    申请日:2002-04-25

    Abstract: An achromatic Fresnel optic that combines a Fresnel zone plate and a refractive Fresnel lens. The zone plate provides high resolution for imaging and focusing, while the refractive lens takes advantage of the refraction index change properties of appropriate elements near absorption edges to recombine the electromagnetic radiation of different energies dispersed by the zone plate. This compound lens effectively solves the high chromatic aberration problem of zone plates. The AFO has a wide range of potential applications in lithography, microimaging with various contrast mechanisms and measurement techniques.

    Abstract translation: 一种消色差菲涅耳光学器件,其结合了菲涅尔波带板和折射菲涅尔透镜。 区域板提供用于成像和聚焦的高分辨率,而折射透镜利用靠近吸收边缘的适当元件的折射率变化特性来重新组合由区域板分散的不同能量的电磁辐射。 该复合透镜有效地解决了区域板的高色差问题。 AFO在光刻,各种对比度机制和测量技术的微成像中具有广泛的潜在应用。

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