Illumination optical system and exposure apparatus
    21.
    发明授权
    Illumination optical system and exposure apparatus 失效
    照明光学系统和曝光装置

    公开(公告)号:US07110084B2

    公开(公告)日:2006-09-19

    申请号:US10769373

    申请日:2004-01-30

    申请人: Toshihiko Tsuji

    发明人: Toshihiko Tsuji

    IPC分类号: G03B27/42

    CPC分类号: G03F7/702 G21K2201/06

    摘要: Attempting to provide an illumination optical system and an exposure apparatus using the same, which provide a more uniform angular distribution of light for illuminating a mask than the prior art, an illumination optical system for illuminating an object surface includes an optical unit that converts light from a light source section into approximately parallel light, and includes first and second mirrors, wherein the first mirror has an opening, through which light reflected by the second mirror passes.

    摘要翻译: 为了提供照明光学系统和使用该照明光学系统的曝光装置,其提供了比现有技术更光亮的用于照射掩模的光的角度分布,用于照射物体表面的照明光学系统包括:光学单元,其将来自 光源部分成近似平行的光,并且包括第一和第二反射镜,其中第一反射镜具有开口,第二反射镜反射的光穿过该开口。

    Exposure method and exposure apparatus
    22.
    发明授权
    Exposure method and exposure apparatus 失效
    曝光方法和曝光装置

    公开(公告)号:US06903799B2

    公开(公告)日:2005-06-07

    申请号:US10603807

    申请日:2003-06-26

    IPC分类号: G03F7/20 G03B27/52 G03B27/42

    摘要: The present invention provides an exposure method and exposure apparatus that enable the effects on an apparatus main body of heat generated by a control system to be suppressed when an error occurs in an air-conditioning system or temperature control system. In the exposure apparatus of the present invention, if an error occurs in an air-conditioning system (50) that air-conditions an interior of a chamber (11 to 16) in which an exposure body section (STP) is housed or occurs in a temperature control system (52) that controls a temperature of the exposure body section (STP), a power supply of a control system (53 to 56) that controls the exposure body section (STP) is shut down.

    摘要翻译: 本发明提供了一种在空调系统或温度控制系统中发生错误时能够抑制由控制系统产生的热量对设备主体产生影响的曝光方法和曝光装置。 在本发明的曝光装置中,如果空调系统(50)发生错误,该空调系统(50)使在其中容纳或发生曝光体部分(STP)的室(11至16)的内部进行空调 控制曝光体部分(STP)的温度的温度控制系统(52),控制曝光体部分(STP)的控制系统(53〜56)的电源被关闭。

    Projection exposure apparatus and device manufacturing method
    23.
    发明授权
    Projection exposure apparatus and device manufacturing method 失效
    投影曝光装置及装置制造方法

    公开(公告)号:US06885432B2

    公开(公告)日:2005-04-26

    申请号:US10411834

    申请日:2003-04-11

    申请人: Toshihiko Tsuji

    发明人: Toshihiko Tsuji

    摘要: Disclosed is an exposure apparatus for illuminating a reflection type mask with light from a light source and for exposing a substrate with a pattern of the illuminated reflection type mask, wherein the apparatus includes a projection optical system for projecting the pattern of the reflection type mask onto the substrate, the projection optical system having a stop, wherein the stop has a first opening for defining a numerical aperture of the projection optical system, and a second opening through which light from the reflection type mask passes. This structure effective avoids unwanted physical interference among optical components of an illumination system or the projection optical system even when the size of the whole exposure apparatus is made compact to some degree.

    摘要翻译: 公开了一种曝光装置,用于利用来自光源的光照射反射型掩模,并且用照射反射型掩模的图案曝光基板,其中该装置包括投影光学系统,用于将反射型掩模的图案投影到 所述基板,所述投影光学系统具有止动件,其中所述止动件具有用于限定所述投影光学系统的数值孔径的第一开口和来自所述反射型掩模的光通过的第二开口。 这种结构有效地避免了在整个曝光装置的尺寸在某种程度上被紧凑化的情况下,照明系统的光学部件或投影光学系统的不需要的物理干扰。

    Illumination optical system in exposure apparatus
    24.
    发明申请
    Illumination optical system in exposure apparatus 有权
    曝光装置中的照明光学系统

    公开(公告)号:US20050030509A1

    公开(公告)日:2005-02-10

    申请号:US10933328

    申请日:2004-09-03

    申请人: Toshihiko Tsuji

    发明人: Toshihiko Tsuji

    CPC分类号: G03F7/70058 G03B27/54

    摘要: An illumination system for illuminating a surface by use of light from a light source, which includes an emission angle conserving optical unit effective to emit the light from the light source at a constant divergent angle, and a diffractive optical element for producing a desired light intensity distribution on a predetermined plane. The diffractive optical element is disposed at or adjacent to a position where light from the emission angle conserving optical unit is collected.

    摘要翻译: 一种用于通过使用来自光源的光来照射表面的照明系统,该照明系统包括有效地以恒定的发散角发射来自光源的光的发光角保存光学单元和用于产生期望的光强度的衍射光学元件 分布在预定平面上。 衍射光学元件设置在收集来自发光角保存光学单元的光的位置处或邻近。

    Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same
    25.
    发明授权
    Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same 失效
    位置检测装置,使用其的装置,曝光装置和使用其的装置制造方法

    公开(公告)号:US06806477B1

    公开(公告)日:2004-10-19

    申请号:US09645434

    申请日:2000-08-25

    IPC分类号: G03F900

    摘要: A position detection device for detecting a position of an object. The detection device includes an irradiation device for irradiating light onto an alignment mark formed on a surface of the object, a probe for detecting near-field light in the vicinity of the alignment mark upon irradiation by the irradiation device and a detector for detecting position information of the object on the basis of the near-field light detected by the probe.

    摘要翻译: 一种位置检测装置,用于检测物体的位置。 检测装置包括:照射装置,用于将光照射到形成在物体表面上的对准标记;探测器,用于在照射装置照射时检测对准标记附近的近场光;以及探测器,用于检测位置信息 基于由探针检测到的近场光。

    Optical inspection method and apparatus including intensity modulation
of a light beam and detection of light scattered at an inspection
position
    26.
    发明授权
    Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position 失效
    包括光束的强度调制和在检查位置散射的光的检测的光学检查方法和装置

    公开(公告)号:US5861952A

    公开(公告)日:1999-01-19

    申请号:US984509

    申请日:1992-12-02

    IPC分类号: G01N21/94 G01B9/02 G01N21/88

    CPC分类号: G01N21/94

    摘要: A light source portion having an acousto-optic element produces a laser beam of two light components having a frequency difference .DELTA.w and having registered polarization directions. The laser beam is subsequently divided by a half mirror. One of the divided laser beams is detected by a photoelectric detector as reference light, and a corresponding signal is applied to a synchronism detector. The other laser beam is projected by a scanning optical system to the surface of, e.g., an original to be examined to scan the same. At the position on the surface irradiated by the scanning light spot, the laser beam is modulated at a beat frequency .DELTA.w on the basis of optical heterodyne interference. A synchronism detector detects a signal corresponding to the scattered light from a particle or defect on the surface being examined, in synchronism with the frequency of the reference light, whereby the particle or defect can be detected with a good signal-to-noise ratio.

    摘要翻译: 具有声光元件的光源部分产生具有频差DELTA w并具有记录的偏振方向的两个光分量的激光束。 激光束随后被半反射镜分开。 其中一个激光束被光电检测器作为参考光检测,相应的信号被施加到同步检测器。 另一个激光束由扫描光学系统投影到例如要检查的原件的表面以扫描它。 在由扫描光点照射的表面上的位置处,基于光学外差干扰以激光束以拍频DELTA w进行调制。 同步检测器与参考光的频率同步地检测与被检查的表面上的颗粒或缺陷相对应的散射光的信号,从而可以以良好的信噪比检测颗粒或缺陷。

    Optical heterodyne interference measuring apparatus and method, and
exposing apparatus and device manufacturing method using the same, in
which a phase difference between beat signals is detected
    28.
    发明授权
    Optical heterodyne interference measuring apparatus and method, and exposing apparatus and device manufacturing method using the same, in which a phase difference between beat signals is detected 失效
    光学外差干涉测量装置和方法以及使用该光学外差干涉测量装置和方法的曝光装置和装置制造方法,其中检测到拍子信号之间的相位差

    公开(公告)号:US5432603A

    公开(公告)日:1995-07-11

    申请号:US153038

    申请日:1993-11-17

    IPC分类号: G03F9/00 G01B9/02

    CPC分类号: G03F9/70

    摘要: An optical element comprised of a plurality of polarizing beam splitters is provided on the optical path of a two-frequency linearly polarized laser beam source, and the optical element divides a light beam from the two-frequency linearly polarized laser beam source into two light beams, whereafter these two light beams are incident on diffraction gratings provided on a mask and a wafer, respectively. A pair of mirrors are provided vertically above the mask, and a pair of lenses, a pair of polarizing plates and a pair of photoelectric detectors are arranged in succession in the directions of reflection of the pair of mirrors. The outputs of the two photoelectric detectors become beat signals, and the phase difference between these beat signals is measured, whereby the alignment of the mask and wafer is effected. Since the optical element is comprised of a plurality of polarizing beam splitters, leak-in light included in each light beam is reduced.

    摘要翻译: 在双频线性偏振激光束源的光路上设置由多个偏振分束器构成的光学元件,光学元件将来自双频线性偏振激光束源的光束分成两束光束 之后,这两个光束分别入射到设置在掩模和晶片上的衍射光栅上。 一对镜子垂直地设置在掩模上方,并且一对透镜,一对偏振片和一对光电检测器沿着该对反射镜的反射方向相继布置。 两个光电检测器的输出变为差拍信号,并且测量这些拍频信号之间的相位差,从而实现掩模和晶片的对准。 由于光学元件由多个偏振分束器组成,因此减少了包括在每个光束中的泄漏光。

    ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE
    29.
    发明申请
    ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE 有权
    照明光学系统,曝光装置和制造装置的方法

    公开(公告)号:US20120170013A1

    公开(公告)日:2012-07-05

    申请号:US13336022

    申请日:2011-12-23

    申请人: Toshihiko Tsuji

    发明人: Toshihiko Tsuji

    IPC分类号: G03B27/54

    摘要: An illumination optical system which illuminates an illumination surface with light from a light source, includes a divider which divides light from the light source to generate a plurality of light beams, a first reflective integrator which uniformizes light intensity distributions of the plurality of light beams generated by the divider, a condenser which condenses the light beam from the first reflective integrator, a second reflective integrator which receives the light beam from the condenser and illuminates the illumination surface, and an aperture stop arranged between the second reflective integrator and the illumination surface, wherein the divider generates the plurality of light beams so that light beams each having a cross-sectional shape different from a cross-sectional shape of the light provided from the light source to the divider enter a plane on which the aperture stop is arranged.

    摘要翻译: 一种利用来自光源的光来照射照明面的照明光学系统,包括:分割器,其分割来自光源的光以产生多个光束;第一反射积分器,其使产生的多个光束的光强度分布均匀; 通过分压器,聚集来自第一反射积分器的光束的聚光器,接收来自聚光器的光束并照亮照明表面的第二反射积分器,以及布置在第二反射积分器和照明表面之间的孔径光阑, 其中,所述分割器产生所述多个光束,使得各自具有不同于从所述光源提供给所述分光器的光的横截面形状的横截面形状的光束进入设置有所述孔径光阑的平面。

    Exposure apparatus and device manufacturing method
    30.
    发明授权
    Exposure apparatus and device manufacturing method 有权
    曝光装置和装置制造方法

    公开(公告)号:US08035668B2

    公开(公告)日:2011-10-11

    申请号:US11336754

    申请日:2006-01-19

    IPC分类号: G03G13/04

    CPC分类号: G03F7/70275

    摘要: An exposure apparatus which forms a pattern on an object. The apparatus includes an exposure head structure in which a plurality of elemental exposure units are arrayed, each elemental exposure unit including (i) at least one light source for emitting exposure light and (ii) an optical element which forms an image of the at least one light source on the object, for exposing the object. Positions of the images of the at least one light source in a direction perpendicular to a surface of the object include plural positions different from each other. A sensor detects a position of the surface of the object and produces a detection result. A controller receives the detection result and controls the exposure head structure such that a pattern is formed on the object by the exposure is selected to expose the object based on the detection result by the sensor.

    摘要翻译: 在物体上形成图案的曝光装置。 该装置包括其中排列多个元素曝光单元的曝光头结构,每个元素曝光单元包括:(i)至少一个用于发射曝光光的光源;以及(ii)至少形成至少一个图像的光学元件 对象上的一个光源,用于暴露对象。 至少一个光源的图像在垂直于物体表面的方向上的位置包括彼此不同的多个位置。 传感器检测物体表面的位置并产生检测结果。 控制器接收检测结果并控制曝光头结构,使得通过曝光在物体上形成图案被选择以基于传感器的检测结果来曝光物体。