发明授权
- 专利标题: Illumination optical system and exposure apparatus
- 专利标题(中): 照明光学系统和曝光装置
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申请号: US10769373申请日: 2004-01-30
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公开(公告)号: US07110084B2公开(公告)日: 2006-09-19
- 发明人: Toshihiko Tsuji
- 申请人: Toshihiko Tsuji
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Morgan & Finnegan, LLP
- 优先权: JP2003-324636 20030917
- 主分类号: G03B27/42
- IPC分类号: G03B27/42
摘要:
Attempting to provide an illumination optical system and an exposure apparatus using the same, which provide a more uniform angular distribution of light for illuminating a mask than the prior art, an illumination optical system for illuminating an object surface includes an optical unit that converts light from a light source section into approximately parallel light, and includes first and second mirrors, wherein the first mirror has an opening, through which light reflected by the second mirror passes.
公开/授权文献
- US20050057738A1 Illumination optical system and exposure apparatus 公开/授权日:2005-03-17
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