公开(公告)号：US20070271374A1

公开(公告)日：2007-11-22

申请号：US11700155

申请日：2007-01-31

申请人： Yusuke Shomura ,  Yoshinori Watanabe ,  Takeshi Shibata

发明人： Yusuke Shomura ,  Yoshinori Watanabe ,  Takeshi Shibata

IPC分类号： G06F15/173

CPC分类号： H04L43/026 ,  H04L43/022 ,  H04L43/024 ,  H04L43/16

摘要： A statistical information collecting system and device for finding the detailed state of traffic flowing in a network to effectively reduce the traffic flow by sending statistical information from a statistical information collection apparatus to a collector device. A statistical information collection system with a statistical information collection apparatus comprising a collector device, in which the statistical information collection apparatus receives packets and collects statistical information from the received packets, and sends the collected statistical information to a collector device; the statistical information collection apparatus contains flow information including flow identification conditions for identifying flows that the received packets belong to, and sorts the statistical information on the collected packets for each flow identified by the flow identification conditions while referring to statistical information sorted for each flow, and the statistical information collection apparatus decides the transmit intervals for each flow for sending the statistical information to the collector device.

摘要翻译： 一种统计信息收集系统和装置，用于通过从统计信息收集装置向收集装置发送统计信息来查找网络流量的详细状态，从而有效地减少流量。 一种具有统计信息收集装置的统计信息收集装置，包括收集装置，其中所述统计信息收集装置从所接收的分组接收分组并收集统计信息，并将所收集的统计信息发送到收集装置; 统计信息收集装置包含流量信息，其中包括用于识别接收到的分组属于的流的流识别条件，并且针对针对每个流排序的统计信息，针对由流识别条件标识的每个流分别收集分组的统计信息， 并且统计信息收集装置确定用于将统计信息发送到收集器装置的每个流的发送间隔。

公开(公告)号：US07282725B2

公开(公告)日：2007-10-16

申请号：US11284035

申请日：2005-11-22

申请人： Takeshi Shibata ,  Hisanori Misawa

发明人： Takeshi Shibata ,  Hisanori Misawa

IPC分类号： H01J37/08

CPC分类号： H01J37/3171 ,  H01J2237/31711

摘要： A manufacturing apparatus of a semiconductor device is disclosed, which comprises an implantation source which applies particles or an electromagnetic wave into an implantation region of a semiconductor substrate in a θ direction shifted by an angle θ from a vertical direction of the semiconductor substrate, a first stencil mask disposed between the semiconductor substrate and the implantation source, the first stencil mask having a first opening corresponding in the θ direction to the implantation region, and a second stencil mask disposed between the first stencil mask and the implantation source, the second stencil mask having a second opening corresponding in the θ direction to the implantation region.

摘要翻译： 公开了一种半导体器件的制造装置，其包括：注入源，其以从半导体衬底的垂直方向偏移角度θ的θ方向将粒子或电磁波施加到半导体衬底的注入区域;第一 设置在半导体衬底和注入源之间的模板掩模，第一模版掩模具有在θ方向上与注入区对应的第一开口，以及设置在第一模板掩模和注入源之间的第二模板掩模，第二模板掩模 具有在θ方向上对应于植入区域的第二开口。

公开(公告)号：US20070045264A1

公开(公告)日：2007-03-01

申请号：US11553707

申请日：2006-10-27

申请人： Takashi Nekoda ,  Teruji Nagaoka ,  Takeshi Shibata

发明人： Takashi Nekoda ,  Teruji Nagaoka ,  Takeshi Shibata

IPC分类号： B60L1/02

CPC分类号： C03B23/0256 ,  C03C17/36 ,  C03C17/3607 ,  C03C17/3655 ,  C03C17/3673 ,  C03C17/3681 ,  C03C2218/34 ,  H01Q1/1271 ,  H05B3/84 ,  H05B2203/002 ,  H05B2203/016

摘要： A glass plate having printed conductive members, comprises a functional strip (30) being a printed conductive member, a first bus bar (20a) electrically connected to an end of the functional strip and being a printed conductive member, a second bus bar (20b) electrically connected to the other end of the functional strip and being a printed conductive member and a printed dark ceramics (13) provided along the periphery of a glass plate (10), wherein the bus bars (20a, 20b) are provided on the printed dark ceramics and have cut-out portions (23a, 24a) in which the printed dark ceramics is exposed. Generation of uneven temperature distribution due to the difference of heat absorptivities between the printed dark ceramics and the bus bars is prevented, whereby a glass plate having printed conductive members is provided by more simple method and at lower cost than before.

摘要翻译： 具有印刷导电构件的玻璃板包括作为印刷导电构件的功能条（30），电连接到功能条的端部并且是印刷导电部件的第一母线（20a），第二母线 20b）电连接到所述功能条的另一端并且是沿着玻璃板（10）的周边设置的印刷导电构件和印刷的深色陶瓷（13），其中所述汇流条（20b，20b） 设置在印刷的深色陶瓷上，并且具有印刷的深色陶瓷露出的切口部分（23a，24a）。 由于印刷的深色陶瓷和母线之间的热吸收率的差异导致不均匀的温度分布的产生，由此通过更简单的方法并以比以前更低的成本提供具有印刷导电部件的玻璃板。

公开(公告)号：US07179569B2

公开(公告)日：2007-02-20

申请号：US10886656

申请日：2004-07-09

申请人： Kyoichi Suguro ,  Takeshi Shibata ,  Kazuyoshi Sugihara ,  Kouji Matsuo

发明人： Kyoichi Suguro ,  Takeshi Shibata ,  Kazuyoshi Sugihara ,  Kouji Matsuo

IPC分类号： G03F9/00

CPC分类号： B82Y10/00 ,  C23C14/042 ,  C23C14/48 ,  G03F1/20 ,  H01J2237/0453 ,  H01J2237/31788 ,  H01L21/266 ,  Y10T428/24273

摘要： Preparing a stencil mask comprising a silicon thin film in which an opening for selectively irradiating charged particles to a semiconductor substrate is provided and whose irradiation surface on which the charged particles are irradiated is implanted with an impurity, and selectively irradiating charged particles to the semiconductor substrate using the stencil mask which is opposingly arranged on the semiconductor substrate.

公开(公告)号：US07119347B2

公开(公告)日：2006-10-10

申请号：US11088881

申请日：2005-03-25

申请人： Takeshi Shibata

发明人： Takeshi Shibata

IPC分类号： G21K5/10 ,  G01R31/28

CPC分类号： H01J37/304 ,  H01J37/3171

摘要： An ion implantation apparatus includes a laser beam irradiation unit which irradiates the surface of a target substrate with laser beam. The angle of an optical axis of the laser beam relative to the surface is adjustable. A reference line defining unit is adapted to define a virtual reference line which coincides with the optical axis of the laser beam when the angle takes a certain value. An ion irradiation unit provides an ion beam on a trajectory which coincides with the reference line.

摘要翻译： 离子注入装置包括用激光束照射目标基板的表面的激光束照射单元。 激光束相对于表面的光轴的角度是可调节的。 参考线限定单元适于在角度取特定值时限定与激光束的光轴重合的虚拟参考线。 离子照射单元在与参考线重合的轨迹上提供离子束。

公开(公告)号：US07034318B2

公开(公告)日：2006-04-25

申请号：US10738038

申请日：2003-12-18

申请人： Takeshi Shibata ,  Hisanori Misawa

发明人： Takeshi Shibata ,  Hisanori Misawa

IPC分类号： G01K1/08

CPC分类号： H01J37/3171 ,  H01J2237/31711

摘要： A manufacturing apparatus of a semiconductor device is disclosed, which comprises an implantation source which applies particles or an electromagnetic wave into an implantation region of a semiconductor substrate in a θ direction shifted by an angle θ from a vertical direction of the semiconductor substrate, a first stencil mask disposed between the semiconductor substrate and the implantation source, the first stencil mask having a first opening corresponding in the θ direction to the implantation region, and a second stencil mask disposed between the first stencil mask and the implantation source, the second stencil mask having a second opening corresponding in the θ direction to the implantation region.

公开(公告)号：US20060071183A1

公开(公告)日：2006-04-06

申请号：US11284035

申请日：2005-11-22

申请人： Takeshi Shibata ,  Hisanori Misawa

发明人： Takeshi Shibata ,  Hisanori Misawa

IPC分类号： G21K5/10

CPC分类号： H01J37/3171 ,  H01J2237/31711

摘要： A manufacturing apparatus of a semiconductor device is disclosed, which comprises an implantation source which applies particles or an electromagnetic wave into an implantation region of a semiconductor substrate in a θ direction shifted by an angle θ from a vertical direction of the semiconductor substrate, a first stencil mask disposed between the semiconductor substrate and the implantation source, the first stencil mask having a first opening corresponding in the θ direction to the implantation region, and a second stencil mask disposed between the first stencil mask and the implantation source, the second stencil mask having a second opening corresponding in the θ direction to the implantation region.

摘要翻译： 公开了一种半导体器件的制造装置，其包括：注入源，其以从半导体衬底的垂直方向偏移角度θ的θ方向将粒子或电磁波施加到半导体衬底的注入区域;第一 设置在半导体衬底和注入源之间的模板掩模，第一模版掩模具有在θ方向上与注入区对应的第一开口，以及设置在第一模板掩模和注入源之间的第二模板掩模，第二模板掩模 具有在θ方向上对应于植入区域的第二开口。

公开(公告)号：US06770402B2

公开(公告)日：2004-08-03

申请号：US09984475

申请日：2001-10-30

申请人： Kyoichi Suguro ,  Takeshi Shibata ,  Kazuyoshi Sugihara ,  Kouji Matsuo

发明人： Kyoichi Suguro ,  Takeshi Shibata ,  Kazuyoshi Sugihara ,  Kouji Matsuo

IPC分类号： G03F900

CPC分类号： B82Y10/00 ,  C23C14/042 ,  C23C14/48 ,  G03F1/20 ,  H01J2237/0453 ,  H01J2237/31788 ,  H01L21/266 ,  Y10T428/24273

摘要： Preparing a stencil mask comprising a silicon thin film in which an opening for selectively irradiating charged particles to a semiconductor substrate is provided and whose irradiation surface on which the charged particles are irradiated is implanted with an impurity, and selectively irradiating charged particles to the semiconductor substrate using the stencil mask which is opposingly arranged on the semiconductor substrate.

摘要翻译： 制备包括硅薄膜的模板掩模，其中用于选择性地将带电粒子照射到半导体基板的开口，并且其上照射有带电粒子的照射面被注入杂质，并且将带电粒子选择性地照射到半导体衬底 使用相对设置在半导体衬底上的模板掩模。

公开(公告)号：US06767807B2

公开(公告)日：2004-07-27

申请号：US10084933

申请日：2002-03-01

申请人： Takeshi Shibata ,  Yasushi Araki

发明人： Takeshi Shibata ,  Yasushi Araki

IPC分类号： H01L2131

CPC分类号： H01L27/32 ,  H01L27/3211 ,  H01L51/0013 ,  H01L51/0037 ,  H01L51/0042 ,  H01L51/0062 ,  H01L51/0085 ,  H01L51/56 ,  H01L2251/308 ,  H01L2251/558

摘要： A transfer material comprising an organic thin film uniformly provided by a wet method, etc. with high productivity is used to efficiently produce an organic thin film device such as an organic EL device excellent in light-emitting efficiency, uniformity of light emission and durability. A method for producing the organic thin film device according to the present invention comprises the steps of: making an organic thin film 112 of a transfer material 110 face a transparent electrically conductive layer 102 disposed on a support 101, the transfer material 110 having the organic thin film 112 on a temporally substrate 111; decompressing a space 105 between the transfer material 110 and the transparent electrically conductive layer 102 to bring the transfer material 110 in contact to the transparent electrically conductive layer 102; heating at least one organic thin film 112; and peeling the temporary substrate 111 from the organic thin film 112 to transfer the organic thin film 112 to the transparent electrically conductive layer 102.

摘要翻译： 使用包含通过湿法均匀地以高生产率提供的有机薄膜的转印材料来有效地制造有机薄膜器件，例如发光效率，发光均匀性和耐久性优异的有机EL器件。 根据本发明的制造有机薄膜器件的方法包括以下步骤：使转印材料110的有机薄膜112面对设置在支撑体101上的透明导电层102，转移材料110具有有机物 时间衬底111上的薄膜112; 减压转印材料110和透明导电层102之间的空间105，使转印材料110与透明导电层102接触; 加热至少一个有机薄膜112; 并从有机薄膜112剥离临时衬底111，以将有机薄膜112转移到透明导电层102。

公开(公告)号：US06333143B1

公开(公告)日：2001-12-25

申请号：US09372612

申请日：1999-08-12

申请人： Takeshi Shibata ,  Yuji Mihara

发明人： Takeshi Shibata ,  Yuji Mihara

IPC分类号： G03C516

CPC分类号： G03C5/04 ,  G03C2007/3043 ,  Y10S430/145

摘要： There is disclosed a method for forming an image on a light-sensitive material having on a base at least a light-sensitive silver halide emulsion and a binder, which comprises, subjecting at least one light-sensitive layer to exposure to light, by using an exposure head that has a plurality of different light sources for emitting lights in respective specific wavelength regions correspondingly to adjacent exposure picture elements, to form an image, wherein, in the specific wavelength regions from the shortest wavelength to the longest wavelength for the respective plurality of light sources to be used, the change in sensitivity of the light-sensitive material in the spectral sensitivity curve obtained by plotting the sensitivities of the light-sensitive material in terms of the specific wavelength regions including the wavelengths in centers of gravity of respective light sources is 0.01 log E/nm or less. According to the method, the unevenness of exposure density resulting from a plurality of exposure light sources can be improved.

摘要翻译： 公开了一种在感光材料上形成图像的方法，所述感光材料在至少一种感光卤化银乳剂和粘合剂的基体上形成，该方法包括：使至少一种感光层曝光，通过使用 具有多个不同的光源的曝光头，用于对应于相邻曝光图像元件在各个特定波长区域中发光，以形成图像，其中在各个多个的从最短波长到最长波长的特定波长区域中 要使用的光源的灵敏度的变化，通过将感光材料的感光度绘制在包括各个光的重心的波长的特定波长区域而获得的光谱灵敏度曲线中的感光度的变化 来源为0.01logE / nm以下。 根据该方法，可以提高由多个曝光光源产生的曝光密度的不均匀性。