Thin film transistor substrate and display device having the same
    21.
    发明授权
    Thin film transistor substrate and display device having the same 有权
    薄膜晶体管基板及其显示装置

    公开(公告)号:US09184253B2

    公开(公告)日:2015-11-10

    申请号:US14156624

    申请日:2014-01-16

    CPC classification number: H01L27/3262 H01L29/42384 H01L29/4908 H01L2227/323

    Abstract: A thin film transistor substrate includes a semiconductor pattern on a base substrate, a first insulation member disposed on the semiconductor pattern, a second insulation pattern disposed on the first insulation member, and a gate electrode disposed on the first insulation member and the second insulation pattern. The second insulation pattern overlaps a first end portion of the semiconductor pattern, and exposes a second end portion of the semiconductor pattern opposite to the first end portion. The gate electrode overlaps both the first insulation member and the second insulation pattern.

    Abstract translation: 薄膜晶体管基板包括在基底基板上的半导体图形,设置在半导体图案上的第一绝缘构件,设置在第一绝缘构件上的第二绝缘图案,以及设置在第一绝缘构件和第二绝缘图案上的栅电极 。 第二绝缘图案与半导体图案的第一端部重叠,并且暴露出与第一端部部分相反的半导体图案的第二端部。 栅电极与第一绝缘构件和第二绝缘图案重叠。

    THIN FILM TRANSISTOR AND ORGANIC LIGHT-EMITTING DISPLAY
    22.
    发明申请
    THIN FILM TRANSISTOR AND ORGANIC LIGHT-EMITTING DISPLAY 审中-公开
    薄膜晶体管和有机发光显示器

    公开(公告)号:US20140217415A1

    公开(公告)日:2014-08-07

    申请号:US14244584

    申请日:2014-04-03

    Abstract: A thin film transistor including: a substrate; an active layer formed over the substrate; a gate insulating layer formed over the active layer; a gate electrode formed over the gate insulating layer; an interlayer insulating layer formed over the gate electrode; and source and drain electrodes that contact the active layer via the interlayer insulating layer. The source and drain electrodes may have a structure including an aluminum (Al) layer, an aluminum-nickel alloy (AlNiX) layer, and an indium tin oxide (ITO) layer, which are sequentially stacked.

    Abstract translation: 1.一种薄膜晶体管,包括:基板; 形成在衬底上的有源层; 形成在有源层上的栅极绝缘层; 形成在所述栅绝缘层上的栅电极; 形成在所述栅电极上的层间绝缘层; 以及经由层间绝缘层与有源层接触的源极和漏极。 源电极和漏电极可以具有依次堆叠的铝(Al)层,铝镍合金(AlNiX)层和氧化铟锡(ITO)层的结构。

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