THIN FILM TRANSISTOR PANEL AND MANUFACTURING METHOD THEREOF
    21.
    发明申请
    THIN FILM TRANSISTOR PANEL AND MANUFACTURING METHOD THEREOF 审中-公开
    薄膜晶体管面板及其制造方法

    公开(公告)号:US20160197190A1

    公开(公告)日:2016-07-07

    申请号:US14754213

    申请日:2015-06-29

    CPC classification number: H01L29/7869 H01L27/124 H01L29/401 H01L29/78696

    Abstract: Provided is a thin film transistor panel including: a substrate; a gate electrode positioned on the substrate; a gate insulating layer positioned on the gate electrode; an oxide semiconductor positioned on the gate insulating layer and including an oxide layer; and a source electrode and a drain electrode positioned on the oxide semiconductor and facing each other based on a channel of the oxide semiconductor, in which the oxide layer overlaps the gate electrode and is positioned on the oxide semiconductor.

    Abstract translation: 提供一种薄膜晶体管面板,包括:基板; 位于所述基板上的栅电极; 位于所述栅电极上的栅极绝缘层; 位于所述栅极绝缘层上且包括氧化物层的氧化物半导体; 以及位于所述氧化物半导体上的源电极和漏极,并且基于所述氧化物半导体的沟道彼此相对,所述氧化物层与所述栅电极重叠并位于所述氧化物半导体上。

Patent Agency Ranking