Abstract:
A method for manufacturing an LD is disclosed. The LD has a striped structure including an optical active region. The striped structure is buried with resin, typically benzo-cyclo-butene (BCB). The method to form an opening in the BCB layer has tri-steps etching of the RIE. First step etches the BCB layer partially by a mixed gas of CF4 and O2, where CF4 has a first partial pressure, second step etches the photo-resist patterned on the top of the BCB layer by a mixed gas of CF4 and O2, where CF4 in this step has the second partial pressure less than the first partial pressure, and third step etches the BCB left in the first step by mixed gas of CF4 and O2, where CF4 in this step has the third partial pressure greater than the second partial pressure.
Abstract:
A mobile station (UE) according to the present invention includes: a reception unit (11) configured to receive broadcast information in a second cell, after a handover from a first cell to the second cell in response to received handover information; and a control unit (12) configured to continue a communication performed in the second cell by using the broadcast information when the reception unit (11) succeeds in receiving the broadcast information, and to perform a re-establishment process when it is determined that the reception unit (11) has failed to receive the broadcast information.
Abstract:
A semiconductor laser includes a first optical confinement layer, a plurality of first quantum wires and buried semiconductor regions disposed on a first area, a plurality of second quantum wires and buried semiconductor regions disposed on a second area, an active layer disposed on a third area, and a second optical confinement layer. The plurality of first quantum wires and the buried semiconductor regions constitute a first distributed Bragg reflector, and the plurality of second quantum wires and the buried semiconductor regions constitute a second distributed Bragg reflector. The third area is disposed between the first area and the second area. The buried semiconductor regions have a refractive index different from the average refractive index of the first quantum wires and the average refractive index of the second quantum wires. These distributed Bragg reflectors form a DBR laser having a cavity length defined by the length of the active layer.
Abstract:
A CPU locks a memory card attached to a card mount with a password by a lock/unlock processing according to an access limit application program, and unlocks the lock based on a predetermined condition. The function to control the secrecy of data recorded on the card is thus improved.
Abstract:
A TAG, LAG or YbAG anti-corrosion layer of which Si content is 100 ppm or under and total content of Ca and Mg is 200 ppm or under is provided on the internal surface of a tubular YAG base of a discharge envelope. The mean particle size of the anti-corrosion layer is 20 &mgr;m or over, and the mean particle size of the base is 15 &mgr;m or under.
Abstract:
Novel indoloylguanidine derivatives shown by formula (1), wherein R1 represents one or more, the same or different substituent(s) which is selected from the group consisting of a hydrogen atom, an alkyl group, a substituted alkyl group, an alkenyl group, an alkynyl group, a cycloalkyl group, a halogen atom, nitro group, an acyl group, carboxyl group, an alkoxycarbonyl group, an aromatic group, and a group shown by formula: —OR3, —NR6R7, —SO2NR6R7 or —S(O)nR40; and R2 represents a hydrogen atom, an alkyl group, a substituted alkyl group, a cycloalkyl group, hydroxy group, an alkoxy group or a group shown by formula: —CH2R20; and which inhibit the Na+/H+ exchanger activity and are useful for the treatment and prevention of a disease caused by increased Na+/H+ exchanger activity, such as hypertension, arrhythmia, angina pectoris, cardiac hypertrophy, diabetes, disorders associated with ischemia or ischemic reperfusion, cerebro-ischemic disorders; or diseases caused by excessive cell proliferation.
Abstract translation:式(1)所示的新型吲哚酰基胍衍生物,其中R1表示一个或多个选自氢原子,烷基,取代的烷基,烯基, 炔基,环烷基,卤素原子,硝基,酰基,羧基,烷氧基羰基,芳香族基团和由下式表示的基团:-OR3,-NR6R7,-SO2NR6R7或-S(O )nR40; R2表示氢原子,烷基,取代的烷基,环烷基,羟基,烷氧基或由式-CH2R20表示的基团; 并且其抑制Na + / H +交换活性,并且可用于治疗和预防由升高的Na + / H +交换活性引起的疾病,例如高血压,心律失常,心绞痛,心脏肥大,糖尿病,与缺血或缺血再灌注相关的疾病 ,脑缺血障碍; 或由过度细胞增殖引起的疾病。
Abstract:
When successive DMA transfer is to be performed between a plurality of areas of a memory and a DVD decoder, pairs of start memory addresses and transfer counter values corresponding to the plurality of areas are respectively set in a plurality of DMA register sets. The contents of these DMA register sets are sequentially read in a predetermined order, and a plurality of DMA data transfer operations are repeatedly executed by a DMA controller. Immediately after one DMA data transfer is completed, next DMA data transfer starts in accordance with the contents of the next DMA register set. Successive DMA data transfer can be executed continuously.
Abstract:
A heat-resisting spheroidal graphite cast iron comprises carbon ranging from 1.8 to 3.4% by weight, silicon ranging from 3.5 to 6% by weight, manganese ranging from 0.7 to 1.25% by weight, chromium ranging from 3 to 5% by weight, nickel ranging from 18 to 24% by weight, an element for spheroidizing graphite, not more than 0.1% by weight, and the balance being substantially iron, thereby attaining excellent oxidation-resistance and oxide film adherance characteristics while being kept inexpensive.
Abstract:
A process to form a photodiode (PD) with the waveguide structure is disclosed. The PD processes thereby reduces a scattering of the parasitic resistance thereof. The process includes steps to form a PD mesa stripe, to bury the PD mesa stripe by the waveguide region, to etch the PD mesa stripe and the waveguide region to form the waveguide mesa stripe. In the etching, the lower contact layer plays a role of the etching stopper.
Abstract:
A method for producing a semiconductor optical device includes the steps of forming a semiconductor region including a ridge structure on a substrate; forming an insulating film on the semiconductor region; forming a non-photosensitive resin region on the insulating film, forming a first mask that defines a scribe area; forming the scribe area by etching using the first mask; after removing the first mask, forming an insulating layer by etching the insulating film, forming an electrode on the ridge structure and the non-photosensitive resin region to produce a substrate product; forming a scribe line on a surface of the semiconductor region in the scribe area of the substrate product; and cutting the product along the scribe line to form a semiconductor laser bar.