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公开(公告)号：US11363706B2
公开(公告)日：2022-06-14
申请号：US17333538
申请日：2021-05-28
Applicant: Gigaphoton Inc.
Inventor： Yutaka Shiraishi , Toshihiro Nishisaka , Tsukasa Hori
Abstract: A target supply device may include a first containing member configured to contain a target substance; a second containing member configured to contain the target substance flowing from the first containing member; a ring-shaped sealing portion which is formed integrally with one of the first containing member and the second containing member, and is brought into close contact with the other containing member; and a fastening member which fastens the first containing member and the second containing member to each other so that the first containing member communicates with the second containing member through the communication portion, and presses the sealing portion against the other containing member. Here, the sealing portion being plastically deformed by being pressed against the other containing member by the fastening member to seal a gap between the first containing member and the second containing member around the communication portion due to the plastic deformation.
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Patent Agency Ranking
公开(公告)号：US10512149B2
公开(公告)日：2019-12-17
申请号：US16214435
申请日：2018-12-10
Applicant: Gigaphoton Inc.
Inventor： Tsukasa Hori , Shinji Okazaki
Abstract: An extreme UV light generation device may include: a chamber having a plasma generation region at an inside of the chamber, the chamber receiving a target substance externally supplied to the plasma generation region; an outlet port provided on the chamber; a magnetic field generating unit configured to generate a magnetic field to converge cations on the outlet port, the cations being generated from the target substance that has been turned into plasma in the plasma generation region; an electron emission unit configured to emit electrons neutralizing the cations; and an exhaust tube joined to the outlet port and through which a neutralized substance obtained by neutralizing the cations flows.
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公开(公告)号：US10143074B2
公开(公告)日：2018-11-27
申请号：US14992477
申请日：2014-06-13
Applicant: GIGAPHOTON INC.
Inventor： Tomohide Ichinose , Fumio Iwamoto , Yutaka Shiraishi , Tsukasa Hori , Hideo Hoshino
Abstract: A filter may include: a first member having a first surface provided with a channel; and a second member set with a second surface thereof covering the channel. The first member may include a first passable portion that allows a fluid to pass between the first surface and a first space, which is defined beside a surface of the first member opposite to the first surface, through a first area of the channel. The second member may include a second passable portion that allows the fluid to pass between the second surface and a second space, which is defined beside a surface of the second member opposite to the second surface, through a second area of the channel distanced from the first area.
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公开(公告)号：US09877378B2
公开(公告)日：2018-01-23
申请号：US15278629
申请日：2016-09-28
Applicant: Gigaphoton Inc.
Inventor： Tsukasa Hori , Kouji Kakizaki , Tatsuya Yanagida , Osamu Wakabayashi , Hakaru Mizoguchi
IPC: H05G2/00 , H01S3/104 , H01S3/16 , H01S3/223 , H01S3/23 , H01S3/11 , H01S3/09 , H01S3/102 , H01S3/00
CPC classification number: H05G2/008 , H01S3/005 , H01S3/0071 , H01S3/09 , H01S3/102 , H01S3/104 , H01S3/1106 , H01S3/1611 , H01S3/1643 , H01S3/1673 , H01S3/2232 , H01S3/2308 , H01S3/2366 , H01S3/2391 , H05G2/003 , H05G2/005
Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
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25.发明授权Target supply device, extreme ultraviolet light generation apparatus, and method for supplying target 有权目标供给装置，极紫外线发生装置以及供给靶的方法公开(公告)号：US08742380B2
公开(公告)日：2014-06-03
申请号：US13679930
申请日：2012-11-16
Applicant: Gigaphoton Inc.
Inventor： Tsukasa Hori , Hideo Hoshino , Tatsuya Yanagida
Abstract: A target supply device is provided that may include a pair of rails arranged to face each other, the rails having electrically conductive properties, a target transport mechanism configured to supply a target material into a space between the rails and in contact with the rails, and a power supply connected to the rails and configured to supply a current to the target material through the rails. Methods and systems using the target supply device are also provided.
Abstract translation: 提供目标供应装置，其可以包括一对导轨，其布置成彼此面对，所述导轨具有导电性质;目标传送机构，其配置成将目标材料供应到轨道之间的空间中并与导轨接触;以及 连接到轨道并被配置为通过轨道向目标材料提供电流的电源。 还提供了使用目标供应装置的方法和系统。
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26.发明授权公开(公告)号：US08710475B2
公开(公告)日：2014-04-29
申请号：US13846852
申请日：2013-03-18
Applicant: Gigaphoton Inc.
Inventor： Hiroshi Komori , Tatsuya Yanagida , Yoshifumi Ueno , Akira Sumitani , Akira Endo , Tsukasa Hori
IPC: A61N5/06
CPC classification number: G21K5/00 , G03F7/70033 , G03F7/70916 , H05G2/003 , H05G2/005 , H05G2/008
Abstract: An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.
Abstract translation: EUV（Extreme Ultra Violet）光源装置将离子发生器中的目标材料离子化，并将电离靶材材料提供到产生等离子体的点。 这减少了碎片的产生。 离子发生器同时将与激发的锡水平相对应的多个波长的激光束照射在目标材料上以电离目标材料。 电离目标材料从离子束提取器施加的高电压从电离器中提取，并被加速并提供给等离子体产生室。 当驱动激光束照射在电离靶材上时，产生等离子体，从而发射EUV辐射。
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