公开(公告)号：US20060023195A1

公开(公告)日：2006-02-02

申请号：US11218620

申请日：2005-09-06

Applicant: Frederick Carter ,  Daniel Galburt ,  Stephen Roux

Inventor： Frederick Carter ,  Daniel Galburt ,  Stephen Roux

IPC: H02K41/00 ,  G03B27/42 ,  G03B27/58

CPC classification number: G03F7/70066 ,  G03F7/70758 ,  G03F7/70816 ,  G03F7/70825 ,  H02K41/03 ,  H02K2201/18

Abstract: A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with respect to a reference frame and at an orientation with respect to the reference frame. Preferably, the reticle-masking blade carriage assembly is electromagnetically levitated. At least one of the position and the orientation of the reticle-masking blade carriage assembly is measured. At least one of the position and the orientation of the reticle-masking blade carriage assembly is controlled. Optionally, the reticle-masking blade carriage assembly is moved within a dimension within a range defined by the reference frame. The dimension can be two dimensions. The movement of the reticle-masking blade carriage assembly can be controlled.

Abstract translation: 一种用于在光刻系统中控制掩模掩模刀片的方法，装置和系统。 掩模版掩模刀片由掩模版掩模刀片托架组件支撑。 掩模版掩模刀片托架组件相对于参考框架在相对于参考框架的取向处悬浮。 优选地，掩模掩模刮板滑架组件是电磁悬浮的。 测量掩模版掩模片滑架组件的位置和取向中的至少一个。 掩模版掩模刀片支架组件的位置和取向中的至少一个被控制。 可选地，掩模版掩模刮板滑架组件在由参考框限定的范围内的尺寸内移动。 尺寸可以是两个维度。 可以控制掩模掩模刮板托架组件的运动。

公开(公告)号：US20060016247A1

公开(公告)日：2006-01-26

申请号：US10894028

申请日：2004-07-20

Applicant: Daniel Galburt ,  Earl Ebert ,  Joseph Lyons

Inventor： Daniel Galburt ,  Earl Ebert ,  Joseph Lyons

IPC: G01B13/08

CPC classification number: G01B13/04

Abstract: A system and method that use a fluid gauge proximity sensor. A source of modulated unidirectional or alternating fluid flow travels along at least one path having a nozzle and a flow or pressure sensor. The fluid exists at a gap between the nozzle and a target. The sensor outputs an amplitude modulated signal that varies according to a size of the gap. The amplitude modulated signal is processed either digitally or in analog devices, which can include being filtered (e.g., band pass, band limited, high pass, etc. filter) to include the modulated frequency and sufficient bandwidth on either side of that frequency and/or being demodulated using a demodulator operating at the acoustical driver modulation frequency. Using this system and method can result in only ambient acoustical energy in a desired frequency range of the device actually having the opportunity to interfere with the device operation. This can lower the devices overall sensitivity to external acoustical noise and sensor offset.

公开(公告)号：US20050231048A1

公开(公告)日：2005-10-20

申请号：US11154669

申请日：2005-06-17

Applicant: Daniel Galburt

Inventor： Daniel Galburt

IPC: H02K9/19 ,  H02K9/22 ,  H02K41/02 ,  H02K41/03 ,  H02K9/00 ,  H02K3/24 ,  H02K5/18

CPC classification number: G03F7/70858 ,  G03F7/70758 ,  H02K9/19 ,  H02K9/22 ,  H02K41/02

Abstract: An actuator coil with a race track winding that generates a magnetic field. A cooling tube has cooling liquid flowing therethrough and is wrapped around a periphery of the race track winding. A plurality of thermal conductive strips are arranged generally transverse to at least portions of the race track winding so as to conduct heat from the racetrack winding to the cooling tube.

Abstract translation: 具有产生磁场的赛道绕组的致动器线圈。 冷却管具有流过其中的冷却液，并缠绕在跑道绕组的周边。 多个导热条通常横贯至赛道绕组的至少部分，以将热量从跑道线圈传导到冷却管。

公开(公告)号：US20050200830A1

公开(公告)日：2005-09-15

申请号：US11128315

申请日：2005-05-13

Applicant: Frederick Carter ,  Daniel Galburt ,  Stephen Roux

Inventor： Frederick Carter ,  Daniel Galburt ,  Stephen Roux

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/62

CPC classification number: G03F7/70066 ,  G03F7/70758 ,  G03F7/70816 ,  G03F7/70825 ,  H02K41/03 ,  H02K2201/18

Abstract: A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with respect to a reference frame and at an orientation with respect to the reference frame. Preferably, the reticle-masking blade carriage assembly is electromagnetically levitated. At least one of the position and the orientation of the reticle-masking blade carriage assembly is measured. At least one of the position and the orientation of the reticle-masking blade carriage assembly is controlled. Optionally, the reticle-masking blade carriage assembly is moved within a dimension within a range defined by the reference frame. The dimension can be two dimensions. The movement of the reticle-masking blade carriage assembly can be controlled.

Abstract translation: 一种用于在光刻系统中控制掩模掩模刀片的方法，装置和系统。 掩模版掩模刀片由掩模版掩模刀片托架组件支撑。 掩模版掩模刀片托架组件相对于参考框架在相对于参考框架的取向处悬浮。 优选地，掩模掩模刮板滑架组件是电磁悬浮的。 测量掩模版掩模片滑架组件的位置和取向中的至少一个。 掩模版掩模刀片支架组件的位置和取向中的至少一个被控制。 可选地，掩模版掩模刮板滑架组件在由参考框限定的范围内的尺寸内移动。 尺寸可以是两个维度。 可以控制掩模掩模刮板托架组件的运动。

公开(公告)号：US20050185163A1

公开(公告)日：2005-08-25

申请号：US11110903

申请日：2005-04-21

Applicant: Daniel Galburt

Inventor： Daniel Galburt

IPC: H01L21/027 ,  G03F7/20 ,  G03B27/42

CPC classification number: G03F7/70758 ,  G03F7/70833 ,  G03F7/709

Abstract: A method, system, and apparatus for management of reaction loads in a lithography system is described. An isolated structure is supported by a non-isolated structure. The isolated structure supports a moveable stage. A linear motor includes a first linear motor element and a second linear motor element. The first linear motor element is coupled to the moveable stage. A plurality of parallel flexure plates mount the second linear motor element on the isolated structure. A flexure rod is coupled between the non-isolated structure and the second linear motor element.

Abstract translation: 描述了用于管理光刻系统中的反应负载的方法，系统和装置。 隔离结构由非隔离结构支持。 隔离结构支持可移动阶段。 线性马达包括第一线性马达元件和第二线性马达元件。 第一线性马达元件联接到可移动台。 多个平行弯曲板将第二线性马达元件安装在隔离结构上。 挠性杆联接在非隔离结构和第二线性电动机元件之间。