公开(公告)号：US20150092168A1

公开(公告)日：2015-04-02

申请号：US14563792

申请日：2014-12-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Siegfried Alexander Tromp ,  Nicolaas Ten Kate ,  Raymond Wilhelmus Louis Lafarre

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/67109 ,  H01L21/67248 ,  H01L21/6838 ,  H01L22/26 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A substrate holder for use in a lithographic apparatus. The substrate holder comprises a main body, a plurality of burls and a heater and/or a temperature sensor. The main body has a surface. The plurality of burls project from the surface and have end surfaces to support a substrate. The heater and/or temperature sensor is provided on the main body surface. The substrate holder is configured such that when a substrate is supported on the end surfaces, a thermal conductance between the heater and/or temperature sensor and the substrate is greater than a thermal conductance between the heater and/or temperature sensor and the main body surface.

Abstract translation: 用于光刻设备的衬底保持器。 衬底保持器包括主体，多个毛刺和加热器和/或温度传感器。 主体有一个表面。 多个毛刺从表面突出并具有端面以支撑基底。 加热器和/或温度传感器设置在主体表面上。 衬底保持器构造成使得当衬底被支撑在端表面上时，加热器和/或温度传感器和衬底之间的热导率大于加热器和/或温度传感器与主体表面之间的热导率 。