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公开(公告)号：US20190254152A1
公开(公告)日：2019-08-15
申请号：US16391890
申请日：2019-04-23
Applicant: ASML Netherlands B.V.
Inventor： Daniel Jason Riggs , Robert Jay Rafac
IPC: H05G2/00
CPC classification number: H05G2/008
Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.
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公开(公告)号：US20180139831A1
公开(公告)日：2018-05-17
申请号：US15724104
申请日：2017-10-03
Applicant: ASML Netherlands B.V.
Inventor： Daniel Jason Riggs , Robert Jay Rafac
IPC: H05G2/00
CPC classification number: H05G2/008
Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.
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23.发明授权公开(公告)号：US09832852B1
公开(公告)日：2017-11-28
申请号：US15343768
申请日：2016-11-04
Applicant: ASML Netherlands B.V.
Inventor： Igor V. Fomenkov , Robert Jay Rafac
CPC classification number: H05G2/006 , H01S3/10069 , H01S3/107 , H01S3/11 , H01S3/136 , H01S3/2232 , H01S3/2308 , H01S2301/08 , H05G2/003 , H05G2/008
Abstract: A method and apparatus for control of a dose of extreme ultraviolet (EUV) radiation generated by a laser produced plasma (LPP) EUV light source. Each laser pulse is modulated to be of a width that is determined to be sufficient to allow for extraction of a suitable uniform amount of energy in the laser source gain medium; in some embodiments the suitable uniform amount of energy to be extracted may be selected to avoid self-lasing. The EUV energy created by each pulse is measured and total EUV energy created by the fired pulses determined, and a desired energy for the next pulse is determined based upon whether the total EUV energy is greater or less than a desired average EUV energy times the number of pulses. The energy of the next pulse is modulated, either by modulating its magnitude or by modulating the amplification of the pulse by one or more amplifiers, but without decreasing the determined width of the laser pulse.
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公开(公告)号：US09713240B2
公开(公告)日：2017-07-18
申请号：US14824147
申请日：2015-08-12
Applicant: ASML Netherlands B.V.
Inventor： Daniel Jason Riggs , Robert Jay Rafac
IPC: H05G2/00
Abstract: A method includes providing a target material that includes a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; controlling a radiant exposure delivered to the target material from the first beam of radiation to within a predetermined range of radiant exposures; and stabilizing a power of the EUV light emitted from the plasma by controlling the radiant exposure delivered to the target material from the first beam of radiation to within the predetermined range of radiant exposures.
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公开(公告)号：US12078934B2
公开(公告)日：2024-09-03
申请号：US17277027
申请日：2019-08-12
Applicant: ASML Netherlands B.V.
Inventor： Robert Jay Rafac , Igor Vladimirovich Fomenkov
CPC classification number: G03F7/70133 , G03F7/70025 , G03F7/70033 , G03F7/70041 , G03F7/70558 , H05G2/008
Abstract: Disclosed is a system and method for generating EUV radiation in which a laser is used in a multistage process to illuminate without altering a target material and then irradiate the target material to alter a target material with the illumination stage being used to determine the timing for firing during the irradiation stage or stages.
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Patent Agency Ranking
公开(公告)号：US20220151052A1
公开(公告)日：2022-05-12
申请号：US17583799
申请日：2022-01-25
Applicant: ASML Netherlands B.V.
Inventor： Michael Anthony Purvis , Klaus Martin Hummler , Chengyuan Ding , Robert Jay Rafac , Igor Vladimirovich Fomenkov
Abstract: An amplified optical beam is provided to a region that receives a target including target material, an interaction between the amplified optical beam and the target converting at least some of the target material from a first form to a second form to form a light-emitting plasma; first data comprising information related to the amplified optical beam is accessed; second data comprising information related to the light-emitting plasma is accessed; and an amount of the target material converted from the first form to the second form is determined. The determination is based on at least the first data and the second data, and the second form of the target material is less dense than the first form of the target material.
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公开(公告)号：US20220086998A1
公开(公告)日：2022-03-17
申请号：US17416636
申请日：2020-01-27
Applicant: ASML Netherlands B.V.
Inventor： Robert Jay Rafac
Abstract: An apparatus includes: a diagnostic system configured to diagnostically interact with a current target (110c) traveling along a trajectory (TR) and before the current target enters a target space; a first detection apparatus (120) configured to detect first light; a second detection apparatus (130) configured to detect second light; and a control system (150) in communication with the first and second detection apparatuses. The first light includes: light (140) produced from an interaction between the no current target and the diagnostic system, and light (142) emitted from a plasma produced by a previous target. The second light includes the light (142) emitted from the plasma produced by the previous target. The control system (150) is configured to: produce an analysis signal based on first and second signals produced from respective outputs of the first and second detection apparatuses; and estimate a property of the current target based on the produced analysis signal.
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公开(公告)号：US10401704B2
公开(公告)日：2019-09-03
申请号：US15349600
申请日：2016-11-11
Applicant: ASML Netherlands B.V.
Inventor： Robert Jay Rafac
Abstract: A wavefront of a light beam that exits an acousto-optic material is estimated; a control signal for an acousto-optic system that includes the acousto-optic material is generated, the control signal being based on the estimated wavefront of the light beam; andthe control signal is applied to the acousto-optic system to generate a frequency-chirped acoustic wave that propagates in the acousto-optic material, the frequency-chirped acoustic wave forming a transient diffractive element in the acousto-optic material, an interaction between the transient diffractive element and the light beam adjusting the wavefront of the light beam to compensate for a distortion of the wavefront of the light beam, the distortion of the wavefront being at least partially caused by a physical effect in the acousto-optic material.
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公开(公告)号：US09980359B2
公开(公告)日：2018-05-22
申请号：US14824289
申请日：2015-08-12
Applicant: ASML Netherlands B.V.
Inventor： Daniel Jason Riggs , Robert Jay Rafac
Abstract: In a laser produced plasma (LPP) extreme ultraviolet (EUV) system, a plasma created from droplets irradiated by a laser pulse can become destabilized. The instability of the plasma can reduce the amount of EUV energy generated over time. While other systems seek to stabilize the plasma by varying a pulse width of the laser pulses, the systems and methods described herein stabilize the plasma by varying an intensity of the laser pulses. The intensity of the laser pulses is varied based on a comparison of the amount of EUV energy generated from current pulse to an expected amount of EUV energy. The intensity of the laser pulses can be varied on a pulse-by-pulse basis by an EUV controller that instructs a pulse actuator.
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30.发明授权公开(公告)号：US09832854B2
公开(公告)日：2017-11-28
申请号：US14824280
申请日：2015-08-12
Applicant: ASML Netherlands B.V.
Inventor： Daniel Jason Riggs , Robert Jay Rafac
Abstract: In a laser produced plasma (LPP) extreme ultraviolet (EUV) system, a droplet is irradiated by a laser pulse to produce a plasma in a chamber. This generates forces that cause the plasma to destabilize and subsequent droplets to have their flight trajectory and speed altered as they approach the plasma. This destabilization is detectable from oscillations in the amount of EUV energy generated. To reduce the oscillations by stabilizing the plasma and travel of the droplets, a proportional-integral (PI) controller algorithm is used to modify an energy of subsequent laser pulses based on the EUV energy generated in the chamber. By modifying the energy of subsequent laser pulses, the plasma stabilizes, which reduces effects on droplet flight and stabilizes the amount of EUV energy generated, allowing the plasma chamber to operate for longer intervals and to lower the amount of reserve power maintained by a laser source.
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