Invention Grant
- Patent Title: Laser system for target metrology and alteration in an EUV light source
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Application No.: US17277027Application Date: 2019-08-12
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Publication No.: US12078934B2Publication Date: 2024-09-03
- Inventor: Robert Jay Rafac , Igor Vladimirovich Fomenkov
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: DiBerardino McGovern IP Group LLC
- International Application: PCT/EP2019/071536 2019.08.12
- International Announcement: WO2020/064195A 2020.04.02
- Date entered country: 2021-03-17
- Main IPC: G03F7/00
- IPC: G03F7/00 ; H05G2/00
Abstract:
Disclosed is a system and method for generating EUV radiation in which a laser is used in a multistage process to illuminate without altering a target material and then irradiate the target material to alter a target material with the illumination stage being used to determine the timing for firing during the irradiation stage or stages.
Public/Granted literature
- US20210263422A1 LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SOURCE Public/Granted day:2021-08-26
Information query
