公开(公告)号：US20220187701A1

公开(公告)日：2022-06-16

申请号：US17685988

申请日：2022-03-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter-Jan VAN ZWOL ,  Adrianus Johannes Maria Giesbers ,  Johan Hendrik Klootwijk ,  Evgenia Kurganova ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Mária Péter ,  Leonid Aizikovitsj Sjmaenok ,  Ties Wouter Van Der Woord ,  David Ferdinand Vles

IPC: G03F1/62

Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.

公开(公告)号：US11314163B2

公开(公告)日：2022-04-26

申请号：US16754865

申请日：2018-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Anton Wilhelmus Duys ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Mária Péter ,  Pieter-Jan Van Zwol ,  David Ferdinand Vles

IPC: G03F1/64

Abstract: A pellicle frame for supporting a pellicle, the frame having a first surface and a second surface opposite the first surface, and a structure provided between the first and the second surfaces, wherein the first and second surfaces and the structure at least partially define at least one volume therebetween that is devoid of the material that forms the frame.

公开(公告)号：US11036128B2

公开(公告)日：2021-06-15

申请号：US16060837

申请日：2016-12-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Derk Servatius Gertruda Brouns ,  Paul Janssen ,  Mohammad Reza Kamali ,  Mária Péter ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  David Ferdinand Vles ,  Willem-Pieter Voorthuijzen

IPC: G03F1/64 ,  G03F1/66 ,  G03F7/20

Abstract: A membrane assembly for EUV lithography, the membrane assembly including: a planar membrane; a border configured to hold the membrane; and a frame assembly connected to the border and configured to attach to a patterning device for EUV lithography, wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.