Abstract:
A method of manufacturing solid state capacitors involves providing an elongate band of solid state forming metal, folding the band into a trough-like U-shaped configuration, introducing a layer of solid state metal powder into the trough, sintering the powdered metal to thereby bond the metal to the foil, partially severing the foil and sintered powder to define a multiplicity of individual units which are thereafter processed to convert the units into capacitors by sequential dielectric forming and counterelectrode depositing steps. The individual capacitors are terminated and preferably also may be tested while still interconnected by portions of the foil, following which individual capacitors are separated by cuts which register with the initial cuts which defined the individual units. The disclosure further teaches a novel solid state capacitor fabricated in accordance with the method, the capacitor exhibiting high volumetric efficiency and being particularly adapted for surface mounting.
Abstract:
Depletion layer depth and semiconductor real estate occupation area shortcomings of conventional MOS capacitor architectures that are formed on lightly doped semiconductor material are obviated by augmenting the MOS capacitor structure with a pair of opposite conductivity type, high impurity concentration regions, both of which are directly contiguous with the lightly doped lower plate layer that underlies the capacitor's dielectric layer, and connecting both of these auxiliary heavily doped regions to a common capacitor electrode terminal for the lower plate of the capacitor. If a high negative charge is applied to the upper plate overlying the thin dielectric layer, holes are readily supplied by the auxiliary P+ region. Conversely, if a high positive charge be applied to the upper plate, electrons are readily supplied by the auxiliary N+ region. By connecting both the auxiliary N+ and P+ regions together, a deep depletion condition is prevented for either polarity of the applied voltage. An application of the MOS capacitor structure is its use in a single event upset immune memory cell formed on an insulating substrate. A pair of MOS capacitors having a structural configuration in accordance with the present invention are coupled between input and output nodes of a pair of cross-coupled MOSFET inverters that form the memory cell.
Abstract:
A monolithic ceramic capacitor having a higher DC breakdown voltage per unit thickness of the dielectric ceramic body than heretofore. The major ingredient of the ceramic is expressed as {(Ba.sub.1-x-y Ca.sub.x Sr.sub.y)O}.sub.k (Ti.sub.1-z Zr.sub.z)O.sub.2, where x, y, z and k are numerals in the ranges specified herein. To this major ingredient is added a minor proportion of a mixture of boric oxide, silicon dioxide, and lithium oxide. The relative proportions of these additives are also specified. For the fabrication of capacitors having dielectric bodies of the above composition, the moldings of the mixture of the major ingredient and additives in the specified proportions are sintered to maturity in a reductive or neutral atmosphere and then reheated at a lower temperature in an oxidative atmosphere. The sintering temperature can be so low (1000.degree.-1200.degree. C.) that the moldings can be cosintered with base metal electrodes buried therein.
Abstract:
A reduced barium titanate ceramic capacitor in the form of a rod has closely-spaced electrodes connected in parallel or two spiraled electrodes on the surface thereof and a dielectric layer underneath each. By reducing both the distance between adjacent electrodes and the width of the electrodes, a capacitor with a low power factor is obtained.
Abstract:
A tubular ceramic body has formed thereon inner and outer electrodes each comprising a nickel layer in direct contact with the ceramic body and a solder layer overlying the nickel layer. Of tin-lead composition, the solder layer is intended to make leads or the like readily solderable to the electrodes. According to the manufacturing process of the capacitor, the nickel layer is formed by electroless plating, and the solder layer by electroplating.
Abstract:
A capacitor which has been given a predetermined capacitance by sand-blasting, in which an additional metal layer of higher conductivity is galvanically deposited over the electrodes, over the junctions of the supply wire and the electrode, and over a portion of the supply wire.