System and method for lateral shearing interferometry in an inspection tool

    公开(公告)号:US11609506B2

    公开(公告)日:2023-03-21

    申请号:US17723240

    申请日:2022-04-18

    Inventor: Markus Mengel

    Abstract: A method for in-situ wave front detection within an inspection system is disclosed. The method includes generating light with a light source and directing the light to a stage-level reflective mask grating structure disposed on a mask stage. The method includes directing light reflected from the stage-level reflective structure to a detector-level mask structure disposed in a plane of a detector and then collecting, with an optical element, light reflected from the detector-level mask structure. The method includes forming a pupil image on the detector and laterally shifting the stage-level reflective mask, with the mask stage, across a grating period of the stage-level reflective mask grating structure to provide phase reconstruction for lateral shearing interferometry. The method includes selectively impinging light reflected from the optical element on the one or more sensors of the detector.

    Methods, systems and apparatus of interferometry for imaging and sensing

    公开(公告)号:US11598627B2

    公开(公告)日:2023-03-07

    申请号:US16075174

    申请日:2017-02-03

    Inventor: Yizheng Zhu

    Abstract: Various methods, systems and apparatus are provided for imaging and sensing using interferometry. In one example, a system includes an interferometer; a light source that can provide light to the interferometer at multiple wavelengths (λi); and optical path delay (OPD) modifying optics that can enhance contrast in an interferometer output associated with a sample. The light can be directed to the sample by optics of the interferometer. The interferometer output can be captured by a detector (e.g., a camera) at each of the multiple wavelengths (λi). In another example, an apparatus includes an add-on unit containing OPD that can enhance contrast in an interferometer output associated with a sample illuminated by light at a defined wavelength (λi). A detector can be attached to the add-on unit to record the interferometer output at the defined wavelength (λi).

    DOUBLE-MIRROR SHEAR INTERFEROMETER
    13.
    发明申请

    公开(公告)号:US20240418499A1

    公开(公告)日:2024-12-19

    申请号:US18698422

    申请日:2022-09-29

    Abstract: A measuring arrangement for non-destructive measurement of an object surface by interferometric measuring methods, wherein light strikes the measuring arrangement as a light beam reflected from the surface, including a diaphragm with an aperture; mirror arrangement with two mirrors having mirror surfaces; a camera lens and camera; wherein the incoming light beam passes the diaphragm and diffracts before hitting the mirror arrangement and splits and deflects into two partial beams, which reach and interfere in the camera; wherein the light beam passes the camera lens in front of the camera in beam direction; and wherein one mirror of the mirror arrangement is rotatable relative to the other; and wherein the camera includes a camera chip with a local sampling frequency and the diaphragm diffracts the incoming light beam as it passes through such that its spatial frequency corresponds at most to the maximum camera chip local sampling frequency during detection.

    Extended reality virtual distance measurement system

    公开(公告)号:US11867507B1

    公开(公告)日:2024-01-09

    申请号:US18143843

    申请日:2023-05-05

    Applicant: MLOptic Corp

    Inventor: Pengfei Wu Wei Zhou

    CPC classification number: G01B9/02098 G01B9/02041

    Abstract: A system for providing a virtual distance of a device under test, the system including a light source, a wedge shear plate including a first surface, a second surface and a wedge angle, wherein the second surface is disposed at the wedge angle with respect to the first surface and the wedge shear plate is configured to be disposed between the device under test and the light source, a first detector configured for receiving a first interference pattern formed as a result of the light source being disposed through and reflected by the first surface and the second surface of the wedge shear plate and a second detector configured for receiving a second interference pattern formed as a result of the light source being disposed through and reflected by the first surface and the second surface of the wedge shear plate.

    METHODS AND APPARATUS FOR MEASURING A FEATURE OF GLASS-BASED SUBSTRATE

    公开(公告)号:US20230152082A1

    公开(公告)日:2023-05-18

    申请号:US17920528

    申请日:2021-06-10

    CPC classification number: G01B9/02098 G01B11/02 G01B11/24

    Abstract: An apparatus can comprise an illumination source and at least one wave front sensor that positioned in a first region. A reflector can be positioned in a second region. A measurement plane can be positioned between the first region and the second region. The reflector can be configured to reflect the light. The at least one wave front sensor can be configured to detect the light. Methods of measuring a feature of a glass-based substrate can comprise emitting light from the illumination source. Methods can comprise transmitting the light through a thickness of the glass-based substrate. Method can comprise transmitting the light through a target location of a first major surface of the glass-based substrate. Methods can comprise detecting the light with the at least one wave front sensor and generating a signal based on the detected light.

    Composite laminate damage detection method using an in-situ thermal gradient and expansion differences across the damage

    公开(公告)号:US11618591B2

    公开(公告)日:2023-04-04

    申请号:US16786588

    申请日:2020-02-10

    Abstract: An example system for in-situ inspection of a composite structure includes a surface-strain imaging apparatus and a controller. The surface-strain imaging apparatus is configured to image an area of an outer surface of the composite structure while a temperature of the composite structure warms to thermal equilibrium with a surrounding environment and a temperature gradient exists within the composite structure. The controller includes a processor and a memory, and is configured to detect, using data received from the surface-strain imaging apparatus, an out-of-plane displacement of the outer surface in the area caused by the temperature gradient. The controller is also configured to determine that the out-of-plane displacement satisfies a threshold condition and, based on determining that the out-of-plane displacement satisfies the threshold condition, flag the area of the outer surface for further inspection.

    Method for high-accuracy wavefront measurement base on grating shearing interferometry

    公开(公告)号:US11340118B2

    公开(公告)日:2022-05-24

    申请号:US17153783

    申请日:2021-01-20

    Abstract: A method for high-accuracy wavefront measurement based on grating shearing interferometry, which adopts a grating shearing interferometer system comprising an illuminating system, an optical imaging system under test, an object plane diffraction grating plate, an image plane diffraction grating plate, a two-dimensional photoelectric sensor, and a calculation processing unit. The object plane diffraction grating plate and the image plane diffraction grating plate are respectively arranged on the object plane and the image plane of the optical imaging system under test. The shearing phase of 1st-order diffracted beam and −1st-order diffracted beam is exactly extracted through phase shifting method, and the original wavefront is obtained by carrying out reconstruction algorithm according to a shear ratio of 2s, such that the accuracy of wavefront measurement of the optical imaging system under test is improved, wherein s is the shear ratio of the grating shearing interferometer.

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