公开(公告)号：US20170352880A1

公开(公告)日：2017-12-07

申请号：US15685424

申请日：2017-08-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： In Hyuk SON ,  Jun Young MUN ,  Jin Hwan PARK ,  Chan Ho PAK ,  Seung Jae LEE ,  Hyo Rang KANG

IPC: H01M4/36 ,  H01M4/505 ,  H01M4/485 ,  H01M4/525 ,  H01M4/62 ,  H01M10/052

CPC classification number: H01M4/366 ,  H01M4/485 ,  H01M4/505 ,  H01M4/525 ,  H01M4/625 ,  H01M10/052 ,  Y02T10/7011

Abstract: A method of forming a carbon coating includes heat treating lithium transition metal composite oxide Li0.9+aMbM′cNdOe, in an atmosphere of a gas mixture including carbon dioxide and compound CnH(2n+2−a)[OH]a, or compound CnH(2n), wherein M and M′ are different from each other and are selected from Ni, Co, Mn, Mo, Cu, Fe, Cr, Ge, Al, Mg, Zr, W, Ru, Rh, Pd, Os, Ir, Pt, Sc, Ti, V, Ga, Nb, Ag, Hf, Au, Cs, B, and Ba, and N is different from M and M′ and is selected from Ni, Co, Mn, Mo, Cu, Fe, Cr, Ge, Al, Mg, Zr, W, Ru, Rh, Pd, Os, Ir, Pt, Sc, Ti, V, Ga, Nb, Ag, Hf, Au, Cs, B, Ba, and a combination thereof, or selected from B, F, S, and P, and at least one of the M, M′, and N comprises Ni, Co, Mn, Mo, Cu, or Fe.

公开(公告)号：US20150021185A1

公开(公告)日：2015-01-22

申请号：US14321011

申请日：2014-07-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Da Hye PARK ,  Myung Dong CHO ,  Hyo Rang KANG ,  Hyun Seok KIM ,  Joon Seon JEONG

IPC: C02F1/469

CPC classification number: C02F1/4691 ,  C02F2001/46133 ,  C02F2001/46161 ,  C02F2305/08

Abstract: An electrode material may include a porous carbon material and an organic clay. An electrode for a capacitive deionization apparatus may include the electrode material. A method of removing ions from a fluid may include using the capacitive deionization apparatus.

Abstract translation: 电极材料可以包括多孔碳材料和有机粘土。 用于电容去离子设备的电极可以包括电极材料。 从流体中去除离子的方法可以包括使用电容去离子装置。

公开(公告)号：US20140144779A1

公开(公告)日：2014-05-29

申请号：US14039104

申请日：2013-09-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Joon Seon JEONG ,  Hyun Seok KIM ,  Da Hye PARK ,  Dong Jin HAM ,  Hyo Rang KANG

IPC: C02F1/469 ,  B03C5/02

CPC classification number: C02F1/4691 ,  B03C5/02

Abstract: A capacitive deionization apparatus may include at least one pair of porous electrodes and a spacer structure disposed between the at least one pair of electrodes. The at least one pair of porous electrodes may include an electrode material having a surface area for the electrostatic adsorption of feed ions. The spacer structure may include an electrically-insulating material with an ion exchange group on the surface thereof. The spacer structure provides a path for flowing a fluid therethrough.

Abstract translation: 电容去离子装置可以包括至少一对多孔电极和设置在至少一对电极之间的间隔结构。 至少一对多孔电极可以包括具有用于进料离子的静电吸附的表面积的电极材料。 间隔结构可以包括在其表面上具有离子交换基团的电绝缘材料。 间隔结构提供了使流体流过其中的路径。

公开(公告)号：US20130240444A1

公开(公告)日：2013-09-19

申请号：US13845471

申请日：2013-03-18

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Bo Kyung JUNG ,  Jae Eun KIM ,  Sung Soo HAN ,  Hyo KANG ,  Hyo Rang KANG ,  Jung Im HAN

IPC: C08G69/42 ,  C02F1/44

CPC classification number: C08G69/42 ,  B01D61/002 ,  C02F1/445 ,  C08G73/10 ,  Y02P20/126

Abstract: A thermosensitive copolymer may include a first repeating unit having a temperature-sensitive oligomer and a second repeating unit having an ionic moiety and a counter ion to the ionic moiety. The temperature-sensitive oligomer may be an oligomer including a repeating unit derived from a unsaturated monomer with a moiety represented by Chemical Formula 1 or Chemical Formula 2, or an oligomer including a repeating unit derived from a heterocyclic compound having C, N, O, and a C═N bond in its ring. *-C(═O)N(R2)(R3)  [Chemical Formula 1] R2 and R3 may each independently be hydrogen or a linear or branched C1 to C6 alkyl group, a C3 to C7 cycloalkyl group, or a C6 to C10 aryl group, R2 and R3 may not both be hydrogen, and R2 and R3 may be combined to form a nitrogen containing heterocycle. R4 may be a C2 to C5 alkylene group.

Abstract translation: 热敏共聚物可以包括具有温度敏感性低聚物的第一重复单元和具有离子部分的离子部分和与离子部分的抗衡离子的第二重复单元。 温度敏感性低聚物可以是包含源自具有由化学式1或化学式2表示的部分的不饱和单体的重复单元的低聚物，或包含衍生自具有C，N，O， 和环中的C = N键。 * -C（= O）N（R 2）（R 3）[化学式1] R 2和R 3可各自独立地为氢或直链或支链C 1至C 6烷基，C 3至C 7环烷基或C 6至C 10 芳基，R2和R3不能都是氢，R2和R3可以组合形成含氮杂环。 R4可以是C2-C5亚烷基。