DEPOSITION MASK AND METHOD OF FABRICATING THE SAME
    12.
    发明申请
    DEPOSITION MASK AND METHOD OF FABRICATING THE SAME 有权
    沉积掩模及其制造方法

    公开(公告)号:US20160149133A1

    公开(公告)日:2016-05-26

    申请号:US14706691

    申请日:2015-05-07

    Abstract: A deposition mask comprises a mask body comprising a plurality of through holes; and a deposition layer formed on external surfaces of the mask body. A method of manufacturing a deposition mask comprises: installing a deposition mask body in a chamber; forming a magnetic field between a plurality of magnet units within the chamber, wherein the deposition mask body is disposed between the magnet units; and applying voltages to first and second sputtering targets comprising a material to generate electric discharge such that particles of the material are sputtered from the first and second sputtering targets and deposited on the deposition mask body, thereby making a deposition mask with a layer of the material. The voltages having different magnitudes are applied to the first and second sputtering targets.

    Abstract translation: 沉积掩模包括:掩模体,其包括多个通孔; 以及形成在面罩主体的外表面上的沉积层。 制造沉积掩模的方法包括:将沉积掩模体安装在腔室中; 在所述室内的多个磁体单元之间形成磁场,其中所述沉积掩模体设置在所述磁体单元之间; 以及向包括材料的第一和第二溅射靶施加电压以产生放电,使得所述材料的颗粒从所述第一和第二溅射靶溅射并沉积在所述沉积掩模体上,从而制备具有所述材料层的沉积掩模 。 具有不同幅度的电压被施加到第一和第二溅射靶。

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