LIQUID CRYSTAL DISPLAY AND METHOD OF MANUFACTURING THE SAME
    11.
    发明申请
    LIQUID CRYSTAL DISPLAY AND METHOD OF MANUFACTURING THE SAME 有权
    液晶显示器及其制造方法

    公开(公告)号:US20150198840A1

    公开(公告)日:2015-07-16

    申请号:US14308104

    申请日:2014-06-18

    CPC classification number: G02F1/133377 G02F1/1341

    Abstract: A liquid crystal display is provided. The liquid crystal display includes: a substrate; a thin film transistor; a pixel electrode; a roof layer; a plurality of microcavities; and a partition wall. The thin film transistor is disposed on the substrate. The pixel electrode is disposed on the thin film transistor. The roof layer faces the pixel electrode. The microcavities are between the pixel electrode and the roof layer, the microcavities include a liquid crystal material. The partition wall is between the microcavities, and the partition wall is perpendicular to the roof layer.

    Abstract translation: 提供液晶显示器。 液晶显示器包括:基板; 薄膜晶体管; 像素电极; 屋顶层; 多个微腔; 和隔墙。 薄膜晶体管设置在基板上。 像素电极设置在薄膜晶体管上。 屋顶层面向像素电极。 微腔在像素电极和屋顶层之间,微腔包括液晶材料。 分隔壁在微腔之间,分隔壁垂直于屋顶层。

    PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME
    12.
    发明申请
    PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME 有权
    光敏树脂组合物及其形成图案的方法

    公开(公告)号:US20140234776A1

    公开(公告)日:2014-08-21

    申请号:US14161939

    申请日:2014-01-23

    Abstract: A photosensitive resin composition includes: an acrylic copolymer comprising a polymerization product of a first monomer comprising at least one selected from an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, and a second monomer comprising an olefin-based unsaturated compound; a photosensitive component comprising at least one 1,2-quinonediazide-5-sulfonic acid ester compound selected from compounds represented by Chemical Formulae 1 to 4; a coupling agent; and a solvent, wherein a total amount of asymmetric compounds in the photosensitive component is greater than or equal to 45 area percent as determined by high performance liquid chromatography: wherein R1 is a hydroxyl group or a methyl group, and NQD is a 1,2-quinonediazide 5-sulfonyl group.

    Abstract translation: 感光性树脂组合物包括:包含含有选自不饱和羧酸和不饱和羧酸酐中的至少一种的第一单体的聚合产物和包含烯烃类不饱和化合物的第二单体的丙烯酸共聚物; 包含至少一种选自化学式1至4所示化合物的1,2-醌二叠氮化物-5-磺酸酯化合物的光敏组分; 偶联剂; 和溶剂,其中通过高效液相色谱法测定的感光组分中不对称化合物的总量大于或等于45面积%:其中R1是羟基或甲基,NQD是1,2 - 醌二叠氮化物5-磺酰基。

    DISPLAY DEVICE
    14.
    发明申请

    公开(公告)号:US20220084999A1

    公开(公告)日:2022-03-17

    申请号:US17357800

    申请日:2021-06-24

    Abstract: A display device includes: a base layer including a display area including an emission area and a non-emission area adjacent to the emission area, and a non-display area around the display area; a light emitting element in the emission area on the base layer; a color filter layer located above the light emitting element; and a light blocking pattern on the light emitting element and including a first light blocking pattern in the non-emission area and a second light blocking pattern in the non-display area. The first light blocking pattern and the second light blocking pattern are different in thickness from each other.

    PHOTOMASK AND METHOD OF FORMING FINE PATTERN USING THE SAME
    15.
    发明申请
    PHOTOMASK AND METHOD OF FORMING FINE PATTERN USING THE SAME 审中-公开
    照相机和使用其形成精细图案的方法

    公开(公告)号:US20160170295A1

    公开(公告)日:2016-06-16

    申请号:US14671822

    申请日:2015-03-27

    CPC classification number: G03F1/54 G03F7/2024 G03F7/203

    Abstract: A photomask is provided. A photomask, comprising: a transparent substrate; and a plurality of filter layers disposed on the transparent substrate, wherein the filter layers include a first filter layer, which selectively transmits first-wavelength light therethrough, and a second filter layer, which selectively transmits second-wavelength light therethrough.

    Abstract translation: 提供光掩模。 一种光掩模,包括:透明基板; 以及设置在所述透明基板上的多个滤光层,其中所述滤光层包括选择性地透射第一波长光的第一滤光层以及选择性地透过第二波长光的第二滤光层。

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