公开(公告)号：US20160190484A1

公开(公告)日：2016-06-30

申请号：US14859895

申请日：2015-09-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jungin LEE ,  Yoonhyun KWAK ,  Sunyoung LEE ,  Ohyun KWON ,  Seungyeon KWAK ,  Jiyoun LEE ,  Seokhwan HONG ,  Aram JEON

IPC: H01L51/00 ,  C09K11/06 ,  C07F15/00

CPC classification number: C09K11/06 ,  C07F15/0033 ,  C07F15/0086 ,  C09K2211/1007 ,  C09K2211/1029 ,  C09K2211/1096 ,  C09K2211/185 ,  H01L51/0081 ,  H01L51/0085 ,  H01L51/5016

Abstract: An organometallic compound represented by Formula 1: M(L1)n1(L2)n2  Formula 1 wherein in Formula 1, M, L1, L2, n1, and n2 are the same as described in the specification.

公开(公告)号：US20160111657A1

公开(公告)日：2016-04-21

申请号：US14676103

申请日：2015-04-01

Applicant: SAMSUNG ELECTRONICS CO., LTD.,

Inventor： Kumhee LEE ,  Jiyoun LEE ,  Yoonhyun KWAK ,  Hyun KOO ,  Daeyoung CHUNG

IPC: H01L51/00 ,  C07D495/04 ,  C07D491/048 ,  C07D405/14

CPC classification number: H01L51/0072 ,  C07D405/14 ,  C07D491/048 ,  C07D495/04 ,  H01L51/0059 ,  H01L51/0067 ,  H01L51/0071 ,  H01L51/0073 ,  H01L51/0085 ,  H01L51/5016

Abstract: A carbazole compound represented by Formula 1: wherein in Formula 1, groups and variables are the same as described in the specification.

Abstract translation: 由式1表示的咔唑化合物：其中在式1中，基团和变量与说明书中描述的相同。

公开(公告)号：US20240237507A1

公开(公告)日：2024-07-11

申请号：US18406353

申请日：2024-01-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jeoungin Yi ,  Seungyeon KWAK ,  Juhyun KIM ,  Sangho PARK ,  Sunyoung LEE ,  Jiyoun LEE ,  Yoonhyun KWAK ,  Hyun KOO ,  Sunghun LEE ,  Hyeonho CHOI

IPC: H10K85/30 ,  C07F15/00 ,  C09K11/06 ,  H10K50/11 ,  H10K50/15 ,  H10K50/16 ,  H10K50/17 ,  H10K50/18

CPC classification number: H10K85/342 ,  C07F15/0033 ,  C09K11/06 ,  C09K2211/1007 ,  C09K2211/1029 ,  C09K2211/1033 ,  C09K2211/1044 ,  C09K2211/185 ,  H10K50/11 ,  H10K50/15 ,  H10K50/16 ,  H10K50/17 ,  H10K50/171 ,  H10K50/18

Abstract: Provided is an organometallic compound represented by Formula 1, an organic light-emitting device including the same, and an electronic apparatus including the organic light-emitting device.


M(L1)n1(L2)n2  



M, L1, L2, n1, and n2 in Formula 1 are the same as described in the present specification.

公开(公告)号：US20230397488A1

公开(公告)日：2023-12-07

申请号：US18447919

申请日：2023-08-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jongwon CHOI ,  Soyeon KIM ,  Jiyoun LEE ,  Yongsuk CHO ,  Dmitry KRAVCHUK ,  Yoonhyun KWAK ,  Hyun KOO ,  Myungsun SIM ,  Sunghun LEE ,  Byoungki CHOI

IPC: H10K85/30 ,  C07F15/00 ,  C09K11/06

CPC classification number: H10K85/342 ,  C07F15/0033 ,  C09K11/06 ,  C09K2211/1029 ,  C09K2211/185 ,  H10K50/11

Abstract: An organometallic compound represented by Formula 1 and an organic light-emitting device including the same:






Y2, ring A2, R1 to R8, R13 to R20, and d2 in Formula 1 may be each independently the same as described in the specification.

公开(公告)号：US20200328360A1

公开(公告)日：2020-10-15

申请号：US16840845

申请日：2020-04-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kum Hee LEE ,  Yoonhyun KWAK ,  Sukekazu ARATANI ,  Jiyoun LEE ,  Yuri CHO ,  Jongwon CHOI ,  Whail CHOI ,  Kyuyoung HWANG

IPC: H01L51/00 ,  C07F15/00 ,  C09K11/06

Abstract: An organometallic compound represented by Formula 1, an organic light-emitting device including the organometallic compound, and a diagnostic composition including the organometallic compound: M(L1)n1(L2)n2  Formula 1 wherein, in Formula 1, M, L1, L2, n1, and n2 are each described herein.

公开(公告)号：US20190326526A1

公开(公告)日：2019-10-24

申请号：US16391808

申请日：2019-04-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yoonhyun KWAK ,  Sunyoung LEE ,  Jungin LEE ,  Jiyoun LEE ,  Aram JEON ,  Hyun KOO ,  Sukekazu ARATANI ,  Shingo ISHIHARA ,  Yuri CHO ,  Byoungki CHOI ,  Seokhwan HONG

IPC: H01L51/00 ,  C07F15/00 ,  C09K11/06

Abstract: An organometallic compound represented by Formula 1, an organic light-emitting device including the organometallic compound, and a diagnostic composition including the organometallic compound. wherein, in Formula 1, R1 to R12 and R19 are the same as described in the specification.

公开(公告)号：US20190100545A1

公开(公告)日：2019-04-04

申请号：US16139700

申请日：2018-09-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jiyoun LEE ,  Bumwoo PARK ,  Sunyoung LEE ,  Jungin LEE ,  Kyuyoung HWANG ,  Yoonhyun KWAK ,  Whail CHOI

IPC: C07F15/00 ,  C07F1/12 ,  H01L51/00 ,  H01L51/50

Abstract: An organometallic compound represented by Formula 1: wherein, in Formula 1, groups and variables are the same as described in the specification.

公开(公告)号：US20180233679A1

公开(公告)日：2018-08-16

申请号：US15897408

申请日：2018-02-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Chul BAIK ,  Soyeon KIM ,  Seungyeon KWAK ,  Jungin LEE ,  Jiyoun LEE ,  Seokhwan HONG ,  Yoonhyun KWAK ,  Ohyun KWON

IPC: H01L51/00

CPC classification number: H01L51/0087 ,  C07F15/0086 ,  H01L51/0081 ,  H01L51/5016 ,  H01L2251/308

Abstract: An organometallic compound represented by Formula 1: wherein, in Formula 1, groups and variables are the same as described in the specification.

公开(公告)号：US20250147419A1

公开(公告)日：2025-05-08

申请号：US18620240

申请日：2024-03-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jungha CHAE ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Mijeong KIM ,  Sunyoung LEE ,  Jiyoun LEE ,  Changheon LEE ,  Jinwon JEON

IPC: G03F7/027

Abstract: Provided are a resist composition and a pattern formation method using the same, the resist composition including a first organometallic compound represented by one of Formulae 1-1 to 1-4 and a second organometallic compound represented by Formula 2: wherein M11, M21, L11 to L14, L21 to L24, a11 to a14, a21 to a24, R11 to R14, R21 to R24, b11 to b14, b21 to b24, Y11 to Y13, and X11 to X13 in Formulae 1-1 to 1-4 and 2 are as described in the specification.

公开(公告)号：US20250147415A1

公开(公告)日：2025-05-08

申请号：US18635761

申请日：2024-04-15

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sunyoung LEE ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Jiyoun LEE ,  Kyuhyun IM ,  Jinwon JEON ,  Jungha CHAE ,  Minyoung HA

IPC: G03F7/004

Abstract: Provided are a resist composition and a pattern formation method using the same. The resist composition may include an organometallic compound represented by one of Formulae 1-1 to 1-4, and an additive represented by Formula 2: wherein M11, L11 to L14, a11 to a14, R11 to R14, b11 to b14, Y11 to Y13, X11 to X13, Y21, Y22, L21, and a21 in Formulae 1-1 to 1-4 and 2 are described in the specification.