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11.发明授权Sample dimension inspecting/measuring method and sample dimension inspecting/measuring apparatus 有权样品尺寸检测/测量方法和样品尺寸检测/测量仪器公开(公告)号：US08338804B2
公开(公告)日：2012-12-25
申请号：US13041894
申请日：2011-03-07
CPC分类号： G01B15/04 , G03F1/86 , G06T7/001 , G06T7/13 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/24592 , H01J2237/2817
摘要： One of principal objects of the present invention is to provide a sample dimension measuring method for detecting the position of an edge of a two-dimensional pattern constantly with the same accuracy irrespective of the direction of the edge and a sample dimension measuring apparatus. According to this invention, to accomplish the above object, it is proposed to correct the change of a signal waveform of secondary electrons which depends on the direction of scanning of an electron beam relative to the direction of a pattern edge of an inspection objective pattern. It is proposed that when changing the scanning direction of the electron beam in compliance with the direction of a pattern to be measured, errors in the scanning direction and the scanning position are corrected. In this configuration, a sufficient accuracy of edge detection can be obtained irrespective of the scanning direction of the electron beam.
摘要翻译： 本发明的主要目的之一是提供一种用于以与边缘的方向无关的方式以相同的精度恒定地检测二维图案的边缘的位置的样本尺寸测量方法和样本尺寸测量装置。 根据本发明，为了实现上述目的，提出了相对于检查对象图案的图案边缘的方向取决于电子束的扫描方向的二次电子的信号波形的变化。 建议当根据要测量的图案的方向改变电子束的扫描方向时，校正扫描方向和扫描位置的误差。 在该结构中，与电子束的扫描方向无关，可以获得足够的边缘检测精度。
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12.发明授权Sample dimension inspecting/measuring method and sample dimension inspecting/measuring apparatus 有权样品尺寸检测/测量方法和样品尺寸检测/测量仪器公开(公告)号：US07923703B2
公开(公告)日：2011-04-12
申请号：US12279564
申请日：2007-02-09
CPC分类号： G01B15/04 , G03F1/86 , G06T7/001 , G06T7/13 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/24592 , H01J2237/2817
摘要： One of principal objects of the present invention is to provide a sample dimension measuring method for detecting the position of an edge of a two-dimensional pattern constantly with the same accuracy irrespective of the direction of the edge and a sample dimension measuring apparatus. According to this invention, to accomplish the above object, it is proposed to correct the change of a signal waveform of secondary electrons which depends on the direction of scanning of an electron beam relative to the direction of a pattern edge of an inspection objective pattern. It is proposed that when changing the scanning direction of the electron beam in compliance with the direction of a pattern to be measured, errors in the scanning direction and the scanning position are corrected. In this configuration, a sufficient accuracy of edge detection can be obtained irrespective of the scanning direction of the electron beam.
摘要翻译： 本发明的主要目的之一是提供一种用于以与边缘的方向无关的方式以相同的精度恒定地检测二维图案的边缘的位置的样本尺寸测量方法和样本尺寸测量装置。 根据本发明，为了实现上述目的，提出了相对于检查对象图案的图案边缘的方向取决于电子束的扫描方向的二次电子的信号波形的变化。 建议当根据要测量的图案的方向改变电子束的扫描方向时，校正扫描方向和扫描位置的误差。 在该结构中，与电子束的扫描方向无关，可以获得足够的边缘检测精度。
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公开(公告)号：US07732792B2
公开(公告)日：2010-06-08
申请号：US12188791
申请日：2008-08-08
CPC分类号： G03F7/70616 , G06T7/0006 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/2817
摘要： Mutual compatibility is established between the measurement with a high magnification and the measurement in a wide region. A pattern measurement apparatus is proposed which adds identification information to each of fragments that constitute a pattern within an image obtained by the SEM, and which stores the identification information in a predetermined storage format. Here, the identification information is added to each fragment for distinguishing between one fragment and another fragment. According to the above-described configuration, it turns out that the identification information is added to each fragment on the SEM image which has possessed no specific identification information originally. As a result, it becomes possible to implement the SEM-image management based on the identification information.
摘要翻译： 在高倍率的测量与广泛的测量之间建立相互兼容性。 提出了一种图案测量装置，其将识别信息添加到构成由SEM获得的图像内的图案的每个片段，并以预定的存储格式存储识别信息。 这里，将识别信息添加到每个片段以区分一个片段和另一个片段。 根据上述结构，原来在原始不具有特定识别信息的SEM图像上将识别信息添加到各片段。 结果，可以实现基于识别信息的SEM图像管理。
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14.发明申请SAMPLE DIMENSION INSPECTING/MEASURING METHOD AND SAMPLE DIMENSION INSPECTING/MEASURING APPARATUS 有权样本尺寸检查/测量方法和样品尺寸检查/测量装置公开(公告)号：US20090218491A1
公开(公告)日：2009-09-03
申请号：US12279564
申请日：2007-02-09
IPC分类号： G01N23/00
CPC分类号： G01B15/04 , G03F1/86 , G06T7/001 , G06T7/13 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/28 , H01J2237/24592 , H01J2237/2817
摘要： One of principal objects of the present invention is to provide a sample dimension measuring method for detecting the position of an edge of a two-dimensional pattern constantly with the same accuracy irrespective of the direction of the edge and a sample dimension measuring apparatus. According to this invention, to accomplish the above object, it is proposed to correct the change of a signal waveform of secondary electrons which depends on the direction of scanning of an electron beam relative to the direction of a pattern edge of an inspection objective pattern. It is proposed that when changing the scanning direction of the electron beam in compliance with the direction of a pattern to be measured, errors in the scanning direction and the scanning position are corrected. In this configuration, a sufficient accuracy of edge detection can be obtained irrespective of the scanning direction of the electron beam.
摘要翻译： 本发明的主要目的之一是提供一种用于以与边缘的方向无关的方式以相同的精度恒定地检测二维图案的边缘的位置的样本尺寸测量方法和样本尺寸测量装置。 根据本发明，为了实现上述目的，提出了相对于检查对象图案的图案边缘的方向取决于电子束的扫描方向的二次电子的信号波形的变化。 建议当根据要测量的图案的方向改变电子束的扫描方向时，校正扫描方向和扫描位置的误差。 在该结构中，与电子束的扫描方向无关，可以获得足够的边缘检测精度。
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15.发明授权Method and apparatus of pattern inspection and semiconductor inspection system using the same 有权图案检查方法和装置以及使用其的半导体检查系统公开(公告)号：US07507961B2
公开(公告)日：2009-03-24
申请号：US11453229
申请日：2006-06-15
CPC分类号： G06T7/0006 , G06T2207/30148 , H01J2237/221 , H01J2237/2817
摘要： A pattern inspection apparatus can be provided, for example, in a scanning electron microscope system. When patterns of a plurality of layers are included in a SEM image, the apparatus separates the patterns according to each layer by using design data of the plurality of layers corresponding to the patterns. Consequently, the apparatus can realize inspection with use of only the pattern of a target layer to be inspected, pattern inspection differently for different layers, or detection of a positional offset between the layers.
摘要翻译： 例如，可以在扫描型电子显微镜系统中设置图案检查装置。 当在SEM图像中包含多层图案时，该装置通过使用与图案相对应的多个层的设计数据，根据每层分离图案。 因此，该装置可以仅使用要检查的目标层的图案，不同层的图案检查或层之间的位置偏移的检测来实现检查。
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公开(公告)号：US20130279793A1
公开(公告)日：2013-10-24
申请号：US13882141
申请日：2011-10-26
IPC分类号： G06T7/00
CPC分类号： G06T7/0004 , G06T7/001 , G06T2207/30141 , G06T2207/30152 , H01J37/222 , H01J37/28 , H01J2237/24578 , H01J2237/24592 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： An object of the present invention is to provide an image processing apparatus and a computer program which detects a defect such as a scum at high speed and with high precision. In order to accomplish the above-described object, the present invention proposes an image processing apparatus and a computer program which acquires image data, and detects edge branch points from this image data. Here, at each of the edge branch points, an edge associated therewith branches off in at least three or more directions. According to this configuration, it becomes possible to detect a defect such as a scum without utilizing the reference-pattern image. As a consequence, it becomes possible to detect the scum at high speed and with high precision.
摘要翻译： 本发明的目的是提供一种图像处理装置和计算机程序，其以高速和高精度检测浮渣等缺陷。 为了实现上述目的，本发明提出一种图像处理装置和计算机程序，其获取图像数据，并从该图像数据检测边缘分支点。 这里，在每个边缘分支点处，与其相关联的边缘在至少三个或更多个方向上分支。 根据该结构，能够在不利用基准图案图像的情况下检测浮渣等缺陷。 因此，可以高速，高精度地检测浮渣。
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公开(公告)号：US09183622B2
公开(公告)日：2015-11-10
申请号：US13882141
申请日：2011-10-26
CPC分类号： G06T7/0004 , G06T7/001 , G06T2207/30141 , G06T2207/30152 , H01J37/222 , H01J37/28 , H01J2237/24578 , H01J2237/24592 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： An object of the present invention is to provide an image processing apparatus and a computer program which detects a defect such as a scum at high speed and with high precision. In order to accomplish the above-described object, the present invention proposes an image processing apparatus and a computer program which acquires image data, and detects edge branch points from this image data. Here, at each of the edge branch points, an edge associated therewith branches off in at least three or more directions. According to this configuration, it becomes possible to detect a defect such as a scum without utilizing the reference-pattern image. As a consequence, it becomes possible to detect the scum at high speed and with high precision.
摘要翻译： 本发明的目的是提供一种图像处理装置和计算机程序，其以高速和高精度检测浮渣等缺陷。 为了实现上述目的，本发明提出一种图像处理装置和计算机程序，其获取图像数据，并从该图像数据检测边缘分支点。 这里，在每个边缘分支点处，与其相关联的边缘在至少三个或更多个方向上分支。 根据该结构，能够在不利用基准图案图像的情况下检测浮渣等缺陷。 因此，可以高速，高精度地检测浮渣。
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18.发明授权Image processing apparatus, image processing method, and image processing program 有权图像处理装置，图像处理方法和图像处理程序公开(公告)号：US08687921B2
公开(公告)日：2014-04-01
申请号：US13578651
申请日：2011-03-25
IPC分类号： G06K9/32
CPC分类号： G06T7/001 , G06T7/74 , G06T2207/10061 , G06T2207/30148
摘要： It is an object of the present invention is to provide an image processing technique that can detect the rotation of an observation image of a specimen with high accuracy. An image processing apparatus according to the present invention indirectly corrects a rotation gap between measurement image data and reference image data through wide-angle image data including a measurement part of a specimen (FIG. 1).
摘要翻译： 本发明的目的是提供一种可以高精度地检测样本的观察图像的旋转的图像处理技术。 根据本发明的图像处理装置通过包括样本的测量部分（图1）的广角图像数据间接校正测量图像数据和参考图像数据之间的旋转间隙。
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公开(公告)号：US08363923B2
公开(公告)日：2013-01-29
申请号：US13294828
申请日：2011-11-11
申请人： Yasutaka Toyoda , Hideo Sakai , Ryoichi Matsuoka
发明人： Yasutaka Toyoda , Hideo Sakai , Ryoichi Matsuoka
IPC分类号： G06K9/00
CPC分类号： G06K9/00 , G01R31/31813 , G06K9/6255 , G06T7/001 , G06T2207/30141
摘要： Although there has been a method for evaluating pattern shapes of electronic devices by using, as a reference pattern, design data or a non-defective pattern, the conventional method has a problem that the pattern shape cannot be evaluated with high accuracy because of the difficulty in defining an exact shape suitable for the manufacturing conditions of the electronic devices. The present invention provides a shape evaluation method for circuit patterns of electronic devices, the method including a means for generating contour distribution data of at least two circuit patterns from contour data sets on the circuit patterns; a means for generating a reference pattern used for the pattern shape evaluation, from the contour distribution data; and a means for evaluating the pattern shape by comparing each evaluation target pattern with the reference pattern.
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公开(公告)号：US07978904B2
公开(公告)日：2011-07-12
申请号：US11834218
申请日：2007-08-06
CPC分类号： G06T7/0004 , G06T7/001
摘要： There is provided a pattern inspection apparatus that is capable of detecting a defect accurately and efficiently to inspect a pattern of a semiconductor device. The pattern inspection apparatus includes: a contour extraction means for extracting contour data of a pattern from a captured image of the semiconductor device; a non-linear part extraction means for extracting a non-linear part from the contour data; an angular part extraction means for extracting an angular part of a pattern from design data of the semiconductor device; and a defect detection section that compares a position of the non-linear part extracted by the non-linear part extraction section with a position of the angular part extracted by the angular part extraction section so as to detect a position of a defective part of a pattern.
摘要翻译： 提供了能够精确有效地检测缺陷以检查半导体器件的图案的图案检查装置。 图案检查装置包括：轮廓提取装置，用于从半导体装置的拍摄图像中提取图案的轮廓数据; 非线性部分提取装置，用于从轮廓数据中提取非线性部分; 角部分提取装置，用于从半导体器件的设计数据提取图案的角部; 以及缺陷检测部，其将由非线性部分提取部提取的非线性部的位置与由角部提取部提取的角部的位置进行比较，以检测不均匀部分的位置 模式。
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