公开(公告)号：US20130292872A1

公开(公告)日：2013-11-07

申请号：US13898639

申请日：2013-05-21

Applicant: Promerus, LLC

Inventor： Brian Knapp ,  Edmund Elce ,  Brian Bedwell ,  Leah J. Langsdorf ,  Ryan Wilks

IPC: B01D61/36

CPC classification number: B01D61/362 ,  B01D69/02 ,  B01D71/44 ,  C12P7/16 ,  Y02E50/10

Abstract: Embodiments in accordance with the present invention provide forming polynorbornenes useful for forming pervaporation membranes, the membranes themselves and methods of making such membranes.

Abstract translation: 根据本发明的实施方案提供了可用于形成渗透蒸发膜的形成聚降冰片烯，膜本身和制备这种膜的方法。

公开(公告)号：US10409160B2

公开(公告)日：2019-09-10

申请号：US15918604

申请日：2018-03-12

Applicant: PROMERUS, LLC

Inventor： Pramod Kandanarachchi ,  Larry F Rhodes ,  Hendra Ng ,  Wei Zhang ,  Brian Knapp

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039

Abstract: Embodiments in accordance with the present invention encompass self-imagable polymer compositions containing a variety of photobase generators which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. The compositions of this invention can be tailored to form positive tone or negative tone images depending upon the intended application in aqueous developable medium. The images formed therefrom exhibit improved properties including low wafer stress and better thermo-mechanical properties, among other property enhancements.

公开(公告)号：US09952507B2

公开(公告)日：2018-04-24

申请号：US15042240

申请日：2016-02-12

Applicant: PROMERUS, LLC

Inventor： Pramod Kandanarachchi ,  Larry Rhodes ,  Hendra Ng ,  Wei Zhang ,  Brian Knapp

IPC: G03F7/038 ,  H01L21/027 ,  G03F7/004 ,  G03F7/039

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397

Abstract: Embodiments in accordance with the present invention encompass self-imageable polymer compositions containing a variety of photobase generators which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. The compositions of this invention can be tailored to form positive tone or negative tone images depending upon the intended application in aqueous developable medium. The images formed therefrom exhibit improved properties including low wafer stress and better thermo-mechanical properties, among other property enhancements.

公开(公告)号：US09341949B2

公开(公告)日：2016-05-17

申请号：US14261922

申请日：2014-04-25

Applicant: PROMERUS, LLC ,  SUMITOMO BAKELITE CO., LTD

Inventor： Brian Knapp ,  Cheryl Burns ,  Edmund Elce ,  Keitaro Seto ,  Hiromichi Sugiyama ,  Makoto Horii ,  Kazuyoshi Fujita

IPC: G03F7/022 ,  G03F7/20 ,  G03F7/075 ,  G03F7/004 ,  G03F7/023

CPC classification number: G03F7/0757 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0226 ,  G03F7/0233 ,  G03F7/0751 ,  G03F7/20 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2224/92247 ,  H01L2225/06562 ,  H01L2924/15311 ,  H01L2924/00014 ,  H01L2924/00

Abstract: The present invention relates to photosensitive compositions containing polynorbornene (PNB) polymers and certain additives that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs and certain hindered phenols as additives which are resistant to thermo-oxidative chain degradation.

Abstract translation: 本发明涉及含有聚降冰片烯（PNB）聚合物和某些可用于形成微电子和/或光电器件及其组件的添加剂的光敏组合物，更具体地涉及包含PNB和某些受阻酚的组合物， 氧化链降解。

公开(公告)号：US20140038112A1

公开(公告)日：2014-02-06

申请号：US14050563

申请日：2013-10-10

Applicant: Promerus, LLC

Inventor： Brian Knapp ,  Edmund Elce ,  Hendra Ng ,  Andrew Bell ,  Cheryl Burns ,  Sridevi Kaiti ,  Brian Kocher ,  Yogesh Patel ,  Masanobu Sakamoto ,  Xiaoming Wu ,  Wei Zhang

IPC: G03F7/40

CPC classification number: C08L45/00 ,  C08F232/08 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0751 ,  G03F7/38 ,  G03F7/40 ,  Y10S430/106

Abstract: Embodiments in accordance with the present invention encompass negative-tone, aqueous base developable, self-imagable polymer compositions useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.

Abstract translation: 根据本发明的实施方案包括可用于形成可以被图案化以产生微电子器件，微电子封装，微机电系统，光电子器件和显示器的结构的膜的负性，水性基底显影的自成像聚合物组合物。