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公开(公告)号:US20180190706A1
公开(公告)日:2018-07-05
申请号:US15909413
申请日:2018-03-01
Inventor: Mitsuyoshi MORI , Ryohei MIYAGAWA , Yoshiyuki OHMORI , Yoshihiro SATO , Yutaka HIROSE , Yusuke SAKATA , Toru OKINO
IPC: H01L27/146 , H01L27/30
CPC classification number: H01L27/14636 , H01L27/1461 , H01L27/14612 , H01L27/1463 , H01L27/1464 , H01L27/14643 , H01L27/14645 , H01L27/307
Abstract: A solid-state imaging device according to the present disclosure includes: a charge storage region that stores a signal charge obtained through photoelectric conversion in a photoelectric conversion film; an amplification transistor that amplifies the signal charge stored in the charge storage region in a corresponding pixel; a contact plug that is electrically connected to the charge storage region and contains a semiconductor material; and a line that is disposed above the contact plug and contains a semiconductor material. The contact plug and the charge storage region are electrically connected, and the contact plug and a gate electrode of the amplification transistor are electrically connected via the line.
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公开(公告)号:US20170345865A1
公开(公告)日:2017-11-30
申请号:US15678790
申请日:2017-08-16
Inventor: Yusuke SAKATA , Mitsuyoshi MORI , Yutaka HIROSE , Hiroshi MASUDA , Hitoshi KURIYAMA , Ryohei MIYAGAWA
IPC: H01L27/148 , H01L27/146 , H01L21/768 , H01L23/485
CPC classification number: H01L27/14806 , H01L21/76886 , H01L23/485 , H01L27/1463 , H01L27/14643 , H01L27/14665 , H01L2924/00 , H01L2924/0002
Abstract: A solid-state imaging device includes: a first electrode formed above a semiconductor substrate; a photoelectric conversion film formed on the first electrode and for converting light into signal charges; a second electrode formed on the photoelectric conversion film; a charge accumulation region electrically connected to the first electrode and for accumulating the signal charges converted from the light by the photoelectric conversion film; a reset gate electrode for resetting the charge accumulation region; an amplification transistor for amplifying the signal charges accumulated in the charge accumulation region; and a contact plug in direct contact with the charge accumulation region, comprising a semiconductor material, and for electrically connecting to each other the first electrode and the charge accumulation region.
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公开(公告)号:US20170229599A1
公开(公告)日:2017-08-10
申请号:US15328648
申请日:2015-07-09
Inventor: Yusuke SAKATA , Manabu USUDA , Mitsuyoshi MORI , Yutaka HIROSE , Yoshihisa KATO
IPC: H01L31/107 , H01L27/146
CPC classification number: H01L31/1075 , H01L27/14609 , H01L27/1461 , H01L27/14636 , H01L27/1464 , H01L27/14643 , H01L27/14647 , H01L31/107 , H02S40/44
Abstract: A photodiode that multiplies a charge generated by photoelectric conversion in an avalanche region includes: a p− type semiconductor layer having interfaces; an n+ type semiconductor region located inside the p− type semiconductor layer and in contact with the interface; an n+ type semiconductor region located inside the p− type semiconductor layer and connected to the n+ type semiconductor region; and a p type semiconductor region located between the n+ type semiconductor region and the interface, wherein the n+ type semiconductor region, the n+ type semiconductor region, and the p type semiconductor region each have a higher impurity concentration than the p− type semiconductor layer, the avalanche region is a region between the n+ type semiconductor region and the p type semiconductor region inside the p− type semiconductor layer, and the n+ type semiconductor region has a smaller area than the n+ type semiconductor region in planar view.
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