公开(公告)号：US20230296436A1

公开(公告)日：2023-09-21

申请号：US18003801

申请日：2021-07-05

Applicant: NOVA LTD.

Inventor： Yonatan OREN ,  Eyal Hollander ,  Elad Schleifer ,  Gilad BARAK

IPC: G01J3/10 ,  G01J3/02 ,  G01J3/44 ,  G01J3/18 ,  G01J3/28

CPC classification number: G01J3/10 ,  G01J3/0208 ,  G01J3/0248 ,  G01J3/0291 ,  G01J3/18 ,  G01J3/2803 ,  G01J3/44

Abstract: Abstract: Systems and methods for metrology of workpieces such as wafers, using spectrometry of multi- spot- arrays formed over a test area of the tester workpiece, for optically measuring characteristics of the tested workpiece, where the optical metrology system is configured such that the distribution of energy density or flux of the multi-spot-array over the test area of the tested workpiece is such that prevents affecting the workpiece during its testing.