VARIO-ASTIGMATIC BEAM EXPANDER
    11.
    发明申请

    公开(公告)号:US20080297912A1

    公开(公告)日:2008-12-04

    申请号:US11757267

    申请日:2007-06-01

    Applicant: Leo Baldwin

    Inventor: Leo Baldwin

    CPC classification number: G02B27/0068 G02B27/0911 G02B27/0966 H01S3/005

    Abstract: A vario-astigmatic beam expander is capable of collimating an astigmatic light beam, or inducing astigmatism in a well-collimated beam, by passing the light beam through a combination of spherical and cylindrical lenses, whereby both the degree of astigmatism and the axis of astigmatism induced are continuously adjustable. The beam expander has applications in industrial laser processing systems.

    Abstract translation: 通过使光束通过球面透镜和柱面透镜的组合,偏光散光扩束器能够准直像散光束,或者在良好准直的光束中引起散光,由此散光程度和散光轴 诱导是连续可调的。 扩束器适用于工业激光加工系统。

    Method and apparatus for laser machining
    12.
    发明授权
    Method and apparatus for laser machining 有权
    激光加工方法和装置

    公开(公告)号:US08350187B2

    公开(公告)日:2013-01-08

    申请号:US12413531

    申请日:2009-03-28

    Applicant: Leo Baldwin

    Inventor: Leo Baldwin

    CPC classification number: B23K26/073 B23K26/0622

    Abstract: A method and apparatus is presented for laser machining complex features in workpieces using programmable laser focal spot shapes. A deformable mirror is inserted into the laser beam path of a laser machining system and programmed to alter the shape of the laser beam focal spot in real time as the workpiece is being laser machined in order to achieve improved control over the shape and size of laser machined features.

    Abstract translation: 提出了一种使用可编程激光焦点形状激光加工工件中复杂特征的方法和装置。 将可变形反射镜插入到激光加工系统的激光束路径中,并且被编程为在激光加工工件时实时改变激光束焦点的形状,以便实现对激光器的形状和尺寸的改进的控制 加工功能。

    ADAPTIVE OPTIC BEAMSHAPING IN LASER PROCESSING SYSTEMS
    13.
    发明申请
    ADAPTIVE OPTIC BEAMSHAPING IN LASER PROCESSING SYSTEMS 失效
    激光加工系统中的自适应光学吸收

    公开(公告)号:US20100059490A1

    公开(公告)日:2010-03-11

    申请号:US12207338

    申请日:2008-09-09

    CPC classification number: B23K26/0676 B23K26/0613 B23K26/066 B23K26/705

    Abstract: A laser processing system quickly and flexibly modifies a processing beam to determine and implement an improved or optimum beam profile for a particular application (or a subset of the application). The system reduces the sensitivity of beam shaping subsystems to variations in the laser processing system, including those due to manufacturing tolerances, thermal drift, variations in component performance, and other sources of system variation. Certain embodiments also manipulate lower quality laser beams (higher M2 values) to provide acceptable shaped beam profiles.

    Abstract translation: 激光处理系统快速且灵活地修改处理光束,以确定并实现特定应用(或应用的子集)的改进或最佳光束简档。 该系统降低了光束成形子系统对激光加工系统变化的敏感性,包括由制造公差,热漂移,部件性能变化以及其他系统变化来源引起的偏差。 某些实施例还操纵较低质量的激光束(较高的M2值)以提供可接受的成形梁轮廓。

    METHOD AND APPARATUS FOR ACHIEVING PANCHROMATIC RESPONSE FROM A COLOR-MOSAIC IMAGER
    14.
    发明申请
    METHOD AND APPARATUS FOR ACHIEVING PANCHROMATIC RESPONSE FROM A COLOR-MOSAIC IMAGER 失效
    用于从彩色图像成像器中获得平面响应的方法和装置

    公开(公告)号:US20090147112A1

    公开(公告)日:2009-06-11

    申请号:US12328881

    申请日:2008-12-05

    Applicant: Leo Baldwin

    Inventor: Leo Baldwin

    CPC classification number: H04N9/045 G03B17/00 H04N5/332

    Abstract: A method and apparatus for achieving monochromatic response from a low-cost color imager is presented. In this method and apparatus, the out-of-band response to infrared (IR) light is by solid state sensors exploited to produce a monochrome image. The monochrome image is produced by removing the IR blocking filter from the sensor and illuminating the scene to be imaged with IR radiation from an LED. The wavelength emitted from the LED is matched to the wavelength or wavelengths that correspond to a region where the sensor's response to IR light is relatively even, despite the color-mosaic filter permanently attached to the sensor.

    Abstract translation: 提出了一种用于从低成本彩色成像器获得单色响应的方法和装置。 在这种方法和装置中,对红外(IR)光的带外响应是利用固态传感器产生单色图像的。 通过从传感器中去除IR阻挡滤光器并照射来自LED的IR辐射成像的场景来产生单色图像。 从LED发出的波长与对应于传感器对IR光的反应相对均匀的区域的波长或波长相匹配,尽管颜色马赛克滤光片永久地附着在传感器上。

    Process and system for quality management and analysis of via drilling
    15.
    发明授权
    Process and system for quality management and analysis of via drilling 有权
    通孔钻孔质量管理与分析流程与系统

    公开(公告)号:US07544304B2

    公开(公告)日:2009-06-09

    申请号:US11484531

    申请日:2006-07-11

    Abstract: A process for laser forming a blind via in at least one layer of a circuit substrate having a plurality of capture pads of varying geometry can include, for at least one blind via to be formed in at least one layer of a circuit substrate, evaluating a capture pad geometry value (such as area and/or volume) within a predetermined distance from a drilling location with respect to a blind via geometry value (such as area and/or volume) to be formed at the drilling location. The process can include setting at least one laser operating parameter based on the evaluation in order to obtain a desired capture pad appearance after blind via formation. The process can include imaging a capture pad area defined as an area within a predetermined distance from a blind via drilling location in at least one layer of a circuit substrate, quantifying at least one appearance value for the imaged capture pad area, and determining an acceptability of the imaged capture pad areas based on the quantified appearance value.

    Abstract translation: 用于在具有多个不同几何形状的多个捕获垫的电路基板的至少一层中激光形成盲通孔的方法可以包括:至少一个盲孔以形成在电路基板的至少一层中, 相对于在钻孔位置处形成的盲孔通孔几何值(例如面积和/或体积),距离钻孔位置预定距离内的捕获垫几何值(例如面积和/或体积)。 该过程可以包括基于评估设置至少一个激光操作参数,以便在盲通孔形成之后获得期望的捕获垫外观。 该过程可以包括将被定义为距电路基板的至少一层中的盲孔通孔位置的预定距离范围内的捕获区域成像,量化成像捕获区域的至少一个出现值,以及确定可接受性 基于量化外观值的成像捕获垫区域。

    Achieving convergent light rays emitted by planar array of light sources
    16.
    发明申请
    Achieving convergent light rays emitted by planar array of light sources 有权
    实现平面光源阵列发射的会聚光线

    公开(公告)号:US20070014466A1

    公开(公告)日:2007-01-18

    申请号:US11482539

    申请日:2006-07-07

    Applicant: Leo Baldwin

    Inventor: Leo Baldwin

    CPC classification number: G01N21/9501 G01N21/55 G01N21/8806

    Abstract: Systems and methods are provided for achieving convergent light rays emitted by a planar array of light sources. In one embodiment, an imaging device is provided for inspecting semiconductors or other objects. The imaging device includes one or more imaging lens for imaging light reflected from an object. The imaging device also includes a first light source attached to a planar circuit board and a second light source attached to the planar circuit board. The imaging device further includes a first Fresnel prism for directing light from the first light source toward the object from a first direction and a second Fresnel prism for directing light from the second light source toward the object from a second direction. In one embodiment, the imaging device also includes one or more optical elements for increasing or decreasing the divergence of the light.

    Abstract translation: 提供了用于实现由平面光源阵列发射的会聚光线的系统和方法。 在一个实施例中,提供了用于检查半导体或其它物体的成像装置。 成像装置包括用于对从物体反射的光成像的一个或多个成像透镜。 成像装置还包括附接到平面电路板的第一光源和附接到平面电路板的第二光源。 成像装置还包括用于将来自第一光源的光从第一方向引导到物体的第一菲涅尔棱镜和用于将来自第二光源的光从第二方向引导到物体的第二菲涅尔棱镜。 在一个实施例中,成像装置还包括用于增加或减少光的发散的一个或多个光学元件。

    Optimizing use and performance of optical systems implemented with telecentric on-axis dark field illumination
    17.
    发明申请
    Optimizing use and performance of optical systems implemented with telecentric on-axis dark field illumination 有权
    优化利用远心轴上暗场照明实现的光学系统的使用和性能

    公开(公告)号:US20070009257A1

    公开(公告)日:2007-01-11

    申请号:US11483133

    申请日:2006-07-07

    CPC classification number: G01N21/9501 G01N21/47 G01N2021/8822 G02B13/22

    Abstract: Systems and methods are provided for imaging a planar specular object such as a semiconductor wafer. In one embodiment, an imaging system for imaging a defect on a planar specular object includes a telecentric lens having a sufficiently aspherical surface such that the telecentric lens is substantially corrected for an optical aberration. The imaging system also includes a telecentric stop including an aperture therein to block light reflected from the planar specular object while allowing light reflected from the defect to pass through the aperture. The imaging system further includes a lens group having a system stop positioned between the telecentric stop and the lens group. The lens group is substantially corrected for the optical aberration independent of the telecentric lens.

    Abstract translation: 提供了用于对诸如半导体晶片的平面镜面物体成像的系统和方法。 在一个实施例中,用于对平面镜面物体上的缺陷进行成像的成像系统包括具有足够非球面的远心透镜,使得远心透镜基本上被校正为光学像差。 该成像系统还包括一个远心止动件,其中包括一个孔,以阻挡从该平面镜面物体反射的光,同时允许从该缺陷反射的光通过该孔。 成像系统还包括具有定位在远心止动件和透镜组之间的系统止动件的透镜组。 对于与远心透镜无关的光学像差,基本上校正了透镜组。

    Image subtraction of illumination artifacts
    18.
    发明申请
    Image subtraction of illumination artifacts 失效
    照明伪像的图像减法

    公开(公告)号:US20050163397A1

    公开(公告)日:2005-07-28

    申请号:US10921032

    申请日:2004-08-18

    Applicant: Leo Baldwin

    Inventor: Leo Baldwin

    CPC classification number: G06K9/2036

    Abstract: A method of removing an artifact resulting from an in-line illumination device of an imaging system from an object image. It includes obtaining a first image of the artifact using a first artifact illumination level and imaging the object using the imaging system wherein the illumination device is using an object illumination level. An artifact image is independent of the object and has pixel values related to the illumination level. Thus, the artifact can be removed by subtracting respective pixel values of an artifact image from respective values of the object image on a pixel address-by-pixel address basis. Various illumination levels can be used to create more than one artifact image. The artifact image for the subtraction can be one of the images taken or can be a scaled image where an artifact image is scaled to the object illumination level.

    Abstract translation: 一种从对象图像中去除由成像系统的在线照明装置产生的假象的方法。 它包括使用第一假象照明级获得伪像的第一图像,并且使用其中照明装置正在使用对象照明级别的成像系统对对象进行成像。 伪影图像与对象无关,并具有与照明级别相关的像素值。 因此,可以通过从像素地址逐像素地址的对象图像的各个值中减去伪影图像的各个像素值来去除伪像。 可以使用各种照明级别来创建多个伪影图像。 用于减法的伪影图像可以是拍摄的图像之一,也可以是将伪像图像缩放到对象照明级别的缩放图像。

    Coaxial narrow angle dark field lighting
    19.
    发明授权
    Coaxial narrow angle dark field lighting 有权
    同轴窄角暗场照明

    公开(公告)号:US06870949B2

    公开(公告)日:2005-03-22

    申请号:US10373934

    申请日:2003-02-26

    Applicant: Leo Baldwin

    Inventor: Leo Baldwin

    CPC classification number: G01N21/8806 G02B21/10

    Abstract: A coaxial narrow angle dark field imaging system is provided. The system utilizes a telecentric lens to illuminate objects with symmetric coaxial narrow angle dark field illumination. The illumination technique is particularly suited to highlight minor features or defects on planar specular objects. In particular, the coaxial light source directs light rays towards a telecentric lens which redirects the light rays towards the substantially planar specular object. The light rays are reflected back through the telecentric lens towards a camera. To the extent that the light rays are reflected from a planar specular portion of the object the light rays are blocked by a telecentric stop. Light rays reflected from a defect or feature in the planar specular object will pass through an aperture in the stop to a camera.

    Abstract translation: 提供同轴窄角暗场成像系统。 该系统利用远心镜头照射具有对称同轴窄角暗场照明的物体。 照明技术特别适用于突出平面镜面物体上的微小特征或缺陷。 特别地,同轴光源将光线引向远心透镜,该远心透镜将光线朝向基本上平面的镜面物体重定向。 光线通过远心镜头向相机反射回来。 在光线从物体的平面镜面部分反射的程度上,光线被远心停止而被阻挡。 从平面镜面物体中的缺陷或特征反射的光线将穿过停止点中的孔径到相机。

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