公开(公告)号：US09965848B2

公开(公告)日：2018-05-08

申请号：US15355606

申请日：2016-11-18

Applicant: KLA-Tencor Corporation

Inventor： Saibal Banerjee ,  Ashok Kulkarni ,  Jagdish Saraswatula ,  Santosh Bhattacharyya

IPC: G06K9/00 ,  G06T7/00

CPC classification number: G06T7/0006 ,  G06T2207/10061 ,  G06T2207/30148

Abstract: Shape primitives are used for inspection of a semiconductor wafer or other workpiece. The shape primitives can define local topological and geometric properties of a design. One or more rules are applied to the shape primitives. The rules can indicate presence of a defect or the likelihood of a defect being present. A rule execution engine can search for an occurrence of the shape primitives covered by the at least one rule.

公开(公告)号：US20170200265A1

公开(公告)日：2017-07-13

申请号：US15402094

申请日：2017-01-09

Applicant: KLA-Tencor Corporation

Inventor： Kris Bhaskar ,  Jing Zhang ,  Grace Hsiu-Ling Chen ,  Ashok Kulkarni ,  Laurent Karsenti

IPC: G06T7/00

CPC classification number: G06T7/0006 ,  G03F1/84 ,  G03F1/86 ,  G03F7/7065 ,  G06T7/0004 ,  G06T7/001 ,  G06T2207/10061 ,  G06T2207/20081 ,  G06T2207/30148

Abstract: Methods and systems for generating simulated output for a specimen are provided. One method includes acquiring information for a specimen with one or more computer systems. The information includes at least one of an actual optical image of the specimen, an actual electron beam image of the specimen, and design data for the specimen. The method also includes inputting the information for the specimen into a learning based model. The learning based model is included in one or more components executed by the one or more computer systems. The learning based model is configured for mapping a triangular relationship between optical images, electron beam images, and design data, and the learning based model applies the triangular relationship to the input to thereby generate simulated images for the specimen.

公开(公告)号：US20170200264A1

公开(公告)日：2017-07-13

申请号：US15402197

申请日：2017-01-09

Applicant: KLA-Tencor Corporation

Inventor： Allen Park ,  Lisheng Gao ,  Ashok Kulkarni ,  Saibal Banerjee ,  Ping Gu ,  Songnian Rong ,  Kris Bhaskar

IPC: G06T7/00

CPC classification number: G06T7/0004 ,  G01N21/9501 ,  G06T7/001 ,  G06T2207/10056 ,  G06T2207/10061 ,  G06T2207/20081 ,  G06T2207/20084 ,  G06T2207/30148

Abstract: Methods and systems for detecting anomalies in images of a specimen are provided. One system includes one or more computer subsystems configured for acquiring images generated of a specimen by an imaging subsystem. The computer subsystem(s) are also configured for determining one or more characteristics of the acquired images. In addition, the computer subsystem(s) are configured for identifying anomalies in the images based on the one or more determined characteristics without applying a defect detection algorithm to the images or the one or more characteristics of the images.

公开(公告)号：US20170186151A1

公开(公告)日：2017-06-29

申请号：US15355606

申请日：2016-11-18

Applicant: KLA-Tencor Corporation

Inventor： Saibal Banerjee ,  Ashok Kulkarni ,  Jagdish Saraswatula ,  Santosh Bhattacharyya

IPC: G06T7/00

CPC classification number: G06T7/0006 ,  G06T2207/10061 ,  G06T2207/30148

Abstract: Shape primitives are used for inspection of a semiconductor wafer or other workpiece. The shape primitives can define local topological and geometric properties of a design. One or more rules are applied to the shape primitives. The rules can indicate presence of a defect or the likelihood of a defect being present. A rule execution engine can search for an occurrence of the shape primitives covered by the at least one rule.