公开(公告)号：US20160234920A1

公开(公告)日：2016-08-11

申请号：US15017000

申请日：2014-09-17

Applicant: Gigaphoton Inc.

Inventor： Toru SUZUKI ,  Tamotsu ABE ,  Osamu WAKABAYASHI ,  Tatsuya YANAGIDA

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/005

Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.

Abstract translation: 极紫外光发生装置可以包括：包括供给目标物的等离子体产生区域的室，该目标变成等离子体，使得在室内产生极紫外光; 目标供给部，被配置为通过将所述目标作为液滴输出到所述室中来将所述目标供给到所述等离子体产生区域; 液滴检测器，其被配置为检测从所述目标供给部件行进到所述等离子体产生区域的液滴; 被配置为捕获在所述室中包含所述等离子体产生区域的成像区域的图像的成像部件; 以及控制器，被配置为基于液滴检测器检测到液滴的检测定时来控制成像部分捕获成像区域的图像的成像定时。

公开(公告)号：US20150008345A1

公开(公告)日：2015-01-08

申请号：US14481620

申请日：2014-09-09

Applicant: GIGAPHOTON INC.

Inventor： Shinji NAGAI ,  Tamotsu ABE ,  Hitoshi NAGANO ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  G21K1/06

CPC classification number: H05G2/008 ,  B23K10/00 ,  B23K26/12 ,  B23K26/36 ,  G03B27/32 ,  G03F7/70025 ,  G03F7/70033 ,  G21K1/067 ,  G21K5/00 ,  G21K5/02 ,  G21K2201/064 ,  H05G2/005

Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

Abstract translation: 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 设置在所述室上的蚀刻气体导入单元，所述蚀刻气体通过所述室; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

公开(公告)号：US20130240762A1

公开(公告)日：2013-09-19

申请号：US13873001

申请日：2013-04-29

Applicant: GIGAPHOTON INC.

Inventor： Masato MORIYA ,  Osamu WAKABAYSHI ,  Tamotsu ABE ,  Takashi SUGANUMA ,  Akira ENDO ,  Akira SUMITANI

IPC: G21K5/04

CPC classification number: G21K5/04 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70858 ,  G03F7/70941 ,  G21K1/10 ,  H05G2/005 ,  H05G2/008

Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

公开(公告)号：US20130186976A1

公开(公告)日：2013-07-25

申请号：US13744334

申请日：2013-01-17

Applicant: Gigaphoton Inc.

Inventor： Takanobu ISHIHARA ,  Tamotsu ABE ,  Osamu WAKABAYASHI

IPC: B05B17/06

CPC classification number: B05B17/06 ,  B05B5/001 ,  B05B5/035 ,  B05B12/082 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A device for determining a target generation condition for a target generator which is driven by a pulse voltage to generate a droplet of a target material may include a detector configured to detect a target generated by the target generator and output a detection signal of the target, and a controller configured to control a pulse duration of the pulse voltage for driving the target generator. The controller can determine whether or not a target is generated by the target generator based on the detection signal, and determine whether or not the generated target includes a plurality of droplets based on the detection signal.

Abstract translation: 用于确定由脉冲电压驱动以产生目标材料的液滴的目标发生器的目标生成条件的装置可以包括检测器，被配置为检测由目标发生器产生的目标并输出目标的检测信号， 以及控制器，被配置为控制用于驱动目标发生器的脉冲电压的脉冲持续时间。 控制器可以基于检测信号来确定目标发生器是否产生目标，并且基于检测信号来确定生成的目标是否包括多个液滴。