公开(公告)号：US20240322521A1

公开(公告)日：2024-09-26

申请号：US18735830

申请日：2024-06-06

Applicant: Gigaphoton Inc.

Inventor： Koichi FUJII ,  Takanobu ISHIHARA ,  Osamu WAKABAYASHI

IPC: H01S5/062 ,  G03F7/00

CPC classification number: H01S5/06233 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70525 ,  G03F7/70575

Abstract: An electronic device manufacturing method includes acquiring a pulse spectral shape of pulse laser light, and a target integrated spectral shape realized by the pulse laser light of pulses generated based on wavelength sequence in which a center wavelength of the pulse laser light periodically changes; calculating target center wavelengths allocated to the pulses to realize the target integrated spectral shape, and a number of allocation pulses of each target center wavelength being the number of allocation pulses per cycle of the wavelength sequence; calculating the wavelength sequence by correspondingly allocating at least one first center wavelength having the number of allocation pulses of 2 or greater so that the smaller the number of allocation pulses is, the larger a time interval of the allocation pulses for the first center wavelength is, and then correspondingly allocating at least one second center wavelength having the number of allocation pulses of 1.

公开(公告)号：US20220385028A1

公开(公告)日：2022-12-01

申请号：US17819013

申请日：2022-08-11

Applicant: Gigaphoton Inc.

Inventor： Koichi FUJII ,  Osamu WAKABAYASHI

IPC: H01S3/106 ,  H01S3/08 ,  G03F7/20

Abstract: A line narrowing device includes a first prism; first and second gratings arranged on the optical path of the light beam having passed through the first prism at positions different in a direction of grooves of either the first grating or the second grating; a beam adjustment optical system arranged on the optical path of the light beam between the first prism and at least one grating of the first and second gratings, and causing a first portion of the light beam to be incident on the first grating and causing a second portion of the light beam to be incident on the second grating; a first actuator adjusting an incident angle of the first portion on the first grating; a second actuator adjusting an incident angle of the second portion on the second grating; and a third actuator adjusting an energy ratio of the first and second portions.

公开(公告)号：US20220373896A1

公开(公告)日：2022-11-24

申请号：US17817190

申请日：2022-08-03

Applicant: Gigaphoton Inc.

Inventor： Koichi FUJII ,  Osamu WAKABAYASHI

IPC: G03F7/20 ,  H01S3/11 ,  H01S5/12 ,  H01S3/225

Abstract: An exposure system according to an aspect of the present disclosure includes a laser apparatus that outputs pulsed laser light, an illuminating optical system that guides the pulsed laser light to a reticle, a reticle stage, and a processor that controls the output of the pulsed laser light from the laser apparatus and the movement of the reticle performed by the reticle stage. The reticle has a first region where a first pattern is disposed and a second region where a second pattern is disposed, and the first and second regions are each a region continuous in a scan width direction perpendicular to a scan direction of the pulsed laser light, with the first and second regions arranged side by side in the scan direction. The processor controls the laser apparatus to output the pulsed laser light according to each of the first and second regions by changing the values of control parameters of the pulsed laser light in accordance with each of the first and second regions.