公开(公告)号：US20190289707A1

公开(公告)日：2019-09-19

申请号：US16434197

申请日：2019-06-07

Applicant: Gigaphoton Inc.

Inventor： Yuichi NISHIMURA ,  Takayuki YABU ,  Yoshifumi UENO

IPC: H05G2/00 ,  G02B26/08

Abstract: An EUV light generation system includes: a target supply unit; a prepulse laser that outputs a prepulse laser beam; a main pulse laser that outputs a main pulse laser; a light focusing optical system that focuses the prepulse and main pulse laser beams on a predetermined region; an actuator that changes a focusing position of the prepulse laser beam by the light focusing optical system; a first sensor that captures an image of a target; and a control unit that stores a reference position of the actuator, calculates a predetermined parameter on the target after irradiation with the prepulse laser beam and before irradiation with the main pulse laser beam based on image data obtained from the first sensor, and controls the actuator to approach the reference position if the predetermined parameter does not satisfy a first condition.

公开(公告)号：US20180352641A1

公开(公告)日：2018-12-06

申请号：US16055274

申请日：2018-08-06

Applicant: GIGAPHOTON INC.

Inventor： Yuichi NISHIMURA ,  Takayuki YABU

IPC: H05G2/00 ,  G03F7/20 ,  G01J1/42

CPC classification number: H05G2/008 ,  G01J1/4209 ,  G01J1/4257 ,  G01J1/429 ,  G03F7/70033 ,  H05G2/00 ,  H05G2/003 ,  H05G2/006

Abstract: An extreme ultraviolet light generating apparatus moves a generation position of extreme ultraviolet light based on an instruction from an external device and includes a chamber in which a target fed therein is irradiated with laser light so that the extreme ultraviolet light is generated from the target; a target feeder configured to output and feed the target into the chamber; a condensing mirror configured to condense the laser light on the target fed into the chamber; a stage configured to regulate a position of the target feeder; a manipulator configured to regulate a position of the condensing mirror; and a control unit configured to be able to control at least one of the stage, the manipulator, and a radiation timing of the laser light to the target, in a feedforward method, when the generation position is moved during generation of the extreme ultraviolet light.

公开(公告)号：US20230413411A1

公开(公告)日：2023-12-21

申请号：US18305946

申请日：2023-04-24

Applicant: GIGAPHOTON INC.

Inventor： Shogo KITASAKA ,  Yuichi NISHIMURA ,  Takayuki YABU

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/008 ,  G03F7/70033

Abstract: An EUV light generation system includes a chamber, a target supply device supplying a target to a plasma generation region in the chamber, a laser device outputting pulse laser light, a beam sensor measuring one of a position and an angle of an optical axis of the pulse laser light as a first optical characteristic, a first reflection control mirror whose angle is controlled, and a processor controlling the laser device. The processor calculates a first corrected angle based on a first attenuation curve defined by the angle of the first reflection control mirror at an end of an immediately preceding irradiation period, the angle of the first reflection control mirror at a cold state, an elapsed time from a start of the pause period, and a first time constant, and to change the angle of the first reflection control mirror to the first corrected angle, during a pause period.

公开(公告)号：US20210333718A1

公开(公告)日：2021-10-28

申请号：US17366219

申请日：2021-07-02

Applicant: Gigaphoton Inc.

Inventor： Yuichi NISHIMURA ,  Takayuki YABU ,  Tsukasa HORI

IPC: G03F7/20 ,  H05G2/00

Abstract: An extreme ultraviolet light generation system according to an aspect of the present disclosure includes a first actuator that changes a travel direction of prepulse laser light to be output from a first optical element arranged on an optical path of the prepulse laser light between a prepulse laser device and a beam combiner, and a second actuator that changes irradiation positions of the prepulse laser light and main pulse laser light to be output from a light concentrating optical system, a plurality of sensors that detect light radiated from a predetermined region by a target being irradiated with the main pulse laser light, and a controller. Here, the controller controls the first actuator so that an evaluation value calculated from output of the plurality of sensors approaches a target value, and thereafter, controls the second actuator so that the evaluation value approaches the target value.

公开(公告)号：US20180343729A1

公开(公告)日：2018-11-29

申请号：US16055279

申请日：2018-08-06

Applicant: Gigaphoton Inc.

Inventor： Yuichi NISHIMURA ,  Takayuki YABU

IPC: H05G2/00 ,  H01S3/00 ,  G03F7/20 ,  G01J1/42

CPC classification number: H05G2/008 ,  G01J1/4209 ,  G01J1/4257 ,  G01J1/429 ,  G03F7/70033 ,  H01S3/0071 ,  H05G2/00

Abstract: An extreme ultraviolet light generating apparatus includes: EUV light sensors configured to measure energy of extreme ultraviolet light from mutually different directions, the extreme ultraviolet light being generated by applying laser light to a target supplied to a predetermined region in a chamber; an application position adjusting unit configured to adjust an application position of the laser light to the target supplied to the predetermined region; and a controller configured to control the application position adjusting unit such that a centroid of the extreme ultraviolet light becomes a targeted centroid, the centroid of the extreme ultraviolet light being specified from measurement results of the EUV light sensors, the controller controlling the application position adjusting unit such that the application position is scanned in accordance with reference scan points mutually different in position, and calibrating the targeted centroid based on the measurement results acquired for the reference scan points.

公开(公告)号：US20180235064A1

公开(公告)日：2018-08-16

申请号：US15955031

申请日：2018-04-17

Applicant: Gigaphoton Inc.

Inventor： Takayuki YABU ,  Yuichi NISHIMURA

IPC: H05G2/00

CPC classification number: H05G2/008

Abstract: The extreme ultraviolet light generating apparatus includes a target supply unit to output a target, a driver laser to output a driver laser beam with which the target is irradiated, a guide laser to output a guide laser beam, a beam combiner to have optical paths of the driver laser beam and the guide laser beam substantially coincide with each other and output these beams, a first optical element including a first actuator to adjust an optical path of the driver laser beam to be incident on the beam combiner, a second optical element including a second actuator to adjust an optical path of the guide laser beam to be incident on the beam combiner, a sensor to detect the guide laser beam outputted from the beam combiner to output detected data, and a controller to receive the detected data, control the second actuator based on the detected data, and control the first actuator based on an amount of controlling of the second actuator.