公开(公告)号：US20150276567A1

公开(公告)日：2015-10-01

申请号：US14432711

申请日：2013-10-07

Applicant: FEI COMPANY

Inventor： Michael Schmidt ,  Hyun Hwa Kim ,  Sang Hoon Lee ,  Stacey Stone ,  Jeffrey Blackwood

IPC: G01N1/32 ,  H01J37/305 ,  H01J37/20

CPC classification number: G01N1/32 ,  G01N1/286 ,  H01J37/20 ,  H01J37/3053 ,  H01J2237/31745

Abstract: A method and system for exposing a portion of a structure in a sample for observation in a charged particle beam system, including extracting a sample from a bulk sample; determining an orientation of the sample that reduces curtaining; mounting the sample to a holder in the charged particle beam system so that the holder orients the sample in an orientation that reduces curtaining when the sample is milled to expose the structure; exposing the structure by milling the sample in a direction that reduces curtaining; and imaging the structure.

Abstract translation: 一种方法和系统，用于暴露用于在带电粒子束系统中观察的样品中的结构的一部分，包括从大量样品中提取样品; 确定减少绘制的样品的取向; 将样品安装到带电粒子束系统中的保持器上，使得保持器以样品取向使得当样品被研磨以暴露结构时减少绘制的取向; 通过在减少绘制的方向上研磨样品来暴露结构; 并对结构进行成像。

公开(公告)号：US20150243477A1

公开(公告)日：2015-08-27

申请号：US14432730

申请日：2013-10-07

Applicant: FEI COMPANY

Inventor： Stacey Stone ,  Sang Hoon Lee ,  Jeffrey Blackwood ,  Michael Schmidt

IPC: H01J37/30 ,  H01J37/305 ,  H01J37/31

CPC classification number: H01J37/3005 ,  G01N1/32 ,  G01N23/2255 ,  G01N2223/104 ,  G01N2223/611 ,  H01J37/3007 ,  H01J37/3053 ,  H01J37/3056 ,  H01J37/31 ,  H01J2237/063 ,  H01J2237/08 ,  H01J2237/2813 ,  H01J2237/31732 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: To reduce artifacts in a surface exposed by a focused ion beam for viewing, a trench is milled next to the region of interest, and the trench is filled to create a bulkhead. The ion beam is directed through the bulkhead to expose a portion of the region of interest for viewing. The trench is filled, for example, by charged particle beam-induced deposition. The trench is typically milled and filled from the top down, and then the ion beam is angled with respect to the sample surface to expose the region of interest.

Abstract translation: 为了减少由聚焦离子束暴露的表面中的人造物进行观察，在感兴趣区域旁边研磨沟槽，并且填充沟槽以形成隔板。 离子束被引导通过隔板以暴露感兴趣区域的一部分以供观察。 例如，通过带电粒子束诱导沉积来填充沟槽。 沟槽通常从顶部向下铣削和填充，然后离子束相对于样品表面成角度以暴露感兴趣的区域。

公开(公告)号：US20180301319A1

公开(公告)日：2018-10-18

申请号：US16012888

申请日：2018-06-20

Applicant: FEI Company

Inventor： Stacey Stone ,  Sang Hoon Lee ,  Jeffrey Blackwood ,  Michael Schmidt ,  Hyun Hwa Kim

IPC: H01J37/317 ,  H01J37/305

Abstract: A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented.

公开(公告)号：US10026590B2

公开(公告)日：2018-07-17

申请号：US14758466

申请日：2013-12-30

Applicant: FEI Company

Inventor： Stacey Stone ,  Sang Hoon Lee ,  Jeffrey Blackwood ,  Michael Schmidt ,  Hyun Hwa Kim

IPC: H01J37/317 ,  H01J37/305

Abstract: A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented.

公开(公告)号：US09696372B2

公开(公告)日：2017-07-04

申请号：US14432712

申请日：2013-10-04

Applicant: FEI Company

Inventor： Jeffrey Blackwood ,  Sang Hoon Lee ,  Michael Schmidt ,  Stacey Stone ,  Karey Holland

IPC: G01R31/305 ,  G01R31/265 ,  G01N1/28 ,  H01L21/66 ,  G01N1/32 ,  H01J37/30 ,  H01J37/153 ,  G01R31/307 ,  G01R31/28 ,  G01R31/312

CPC classification number: G01R31/2653 ,  G01N1/286 ,  G01N1/32 ,  G01R31/2808 ,  G01R31/2898 ,  G01R31/307 ,  G01R31/312 ,  H01J37/153 ,  H01J37/3005 ,  H01J2237/208 ,  H01J2237/24564 ,  H01J2237/2817 ,  H01J2237/31749 ,  H01L22/14 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Multiple planes within the sample are exposed from a single perspective for contact by an electrical probe. The sample can be milled at a non-orthogonal angle to expose different layers as sloped surfaces. The sloped edges of multiple, parallel conductor planes provide access to the multiple levels from above. The planes can be accessed, for example, for contacting with an electrical probe for applying or sensing a voltage. The level of an exposed layer to be contacted can be identified, for example, by counting down the exposed layers from the sample surface, since the non-orthogonal mill makes all layers visible from above. Alternatively, the sample can be milled orthogonally to the surface, and then tilted and/or rotated to provide access to multiple levels of the device. The milling is preferably performed away from the region of interest, to provide electrical access to the region while minimizing damage to the region.

公开(公告)号：US20150330877A1

公开(公告)日：2015-11-19

申请号：US14758150

申请日：2013-12-30

Applicant: FEI COMPANY

Inventor： Michael Schmidt ,  Jeffrey Blackwood ,  Stacey Stone ,  Sang Hoon Lee ,  Ronald Kelley ,  Trevan Landin

IPC: G01N1/32 ,  H01L21/3065

CPC classification number: G01N1/32 ,  G01N1/28 ,  H01L21/30655

Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. An ion beam mills exposes a cross section of the work piece using a bulk mill process. A deposition precursor gas is directed to the sample surface while a small amount of material is removed from the exposed cross section face, the deposition precursor producing a more uniform cross section. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

Abstract translation: 提供了一种方法和装置，用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 离子束研磨机使用大量研磨工艺暴露工件的横截面。 沉积前体气体被引导到样品表面，同时少量的材料从暴露的横截面去除，沉积前体产生更均匀的横截面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的截面是有用的。 实施例可用于制备薄TEM样品。

公开(公告)号：US08822921B2

公开(公告)日：2014-09-02

申请号：US14144902

申请日：2013-12-31

Applicant: FEI Company

Inventor： Michael Schmidt ,  Jeffrey Blackwood ,  Stacey Stone ,  Sang Hoon Lee ,  Ronald Kelley

IPC: G01N23/00 ,  G01N1/32

CPC classification number: G01N1/32 ,  G01N1/286 ,  G01N2001/2886 ,  H01J37/3056 ,  H01J2237/31745

Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

Abstract translation: 提供了一种方法和装置，用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 在最终研磨之前或期间，使用带电粒子束沉积将材料沉积到样品上，这导致无伪影的表面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的截面是有用的。 实施例可用于制备薄TEM样品。