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    Semiconductor thermal process control utilizing position oriented temperature generated thermal mask
    15.
    发明授权
    Semiconductor thermal process control utilizing position oriented temperature generated thermal mask 失效
    半导体热过程控制利用定位温度产生的热掩模

    公开(公告)号：US07667162B2

    公开(公告)日：2010-02-23

    申请号：US11103968

    申请日：2005-04-11

    Applicant: Wolfgang R. Aderhold ,  Balasubramanian Ramachandran ,  Leonid M. Tertitski ,  Patrick F. Stone

    Inventor： Wolfgang R. Aderhold ,  Balasubramanian Ramachandran ,  Leonid M. Tertitski ,  Patrick F. Stone

    IPC: H05B1/02 ,  C30B25/16 ,  F27B5/14

    CPC classification number: H01L21/67248 ,  H01L21/67115

    Abstract: During fabrication, a rotating semiconductor substrate is radiated in accordance with a thermal recipe. Temperature measurements of the semiconductor substrate are obtained along with the position of the semiconductor substrate at the time of each temperature measurement. It is then determined for the position of the semiconductor substrate whether at least one particular temperature measurement of the temperature measurements should be filtered. If so, at least one filtered temperature measurement is obtained. The radiation of the semiconductor substrate is subsequently controlled based on the temperature measurements, the at least one filtered temperature measurement, and the thermal recipe.

    Abstract translation: 在制造期间，根据热配方照射旋转的半导体衬底。 半导体衬底的温度测量结果与每个温度测量时的半导体衬底的位置一起获得。 然后确定半导体衬底的位置是否应过滤温度测量的至少一个特定温度测量。 如果是这样，则获得至少一个过滤的温度测量值。 随后基于温度测量，至少一个过滤温度测量和热配方控制半导体衬底的辐射。

    Low noise filter for a wireless receiver
    16.
    发明授权
    Low noise filter for a wireless receiver 有权
    无线接收机的低噪声滤波器

    公开(公告)号：US07415264B2

    公开(公告)日：2008-08-19

    申请号：US10949534

    申请日：2004-09-25

    Applicant: Aly Ismail ,  John E. Vasa ,  Balasubramanian Ramachandran

    Inventor： Aly Ismail ,  John E. Vasa ,  Balasubramanian Ramachandran

    IPC: H04B1/16 ,  H04B1/10

    CPC classification number: H04B1/30 ,  H03F3/45968 ,  H03F2200/294 ,  H03F2200/372

    Abstract: A low noise filter is arranged to receive an input signal from a downconverter. The low noise filter is constructed to block or cancel any DC offset in the input signal, as well as filter selected frequency components from the input signal. The low noise filter uses a shared capacitor both to handle the DC offset and to set filter response characteristics. As the low noise filter is implemented with a Frequency Dependent Negative Resistance (FDNR) device, the shared capacitor may be relatively small. The low noise filter has a load capacitor, with the output of the load capacitor coupled to a bias resistor and voltage. This bias structure cooperates with the load capacitor to set a high cutoff frequency for the low noise filter useful for blocking or canceling the DC offset.

    Abstract translation: 低噪声滤波器布置成从下变频器接收输入信号。 低噪声滤波器被构造为阻挡或消除输入信号中的任何DC偏移，以及从输入信号中滤除所选择的频率分量。 低噪声滤波器使用共享电容器来处理DC偏移并设置滤波器响应特性。 由于利用频率相关负电阻（FDNR）器件实现低噪声滤波器，所以共享电容器可能相对较小。 低噪声滤波器具有负载电容，负载电容的输出耦合到偏置电阻和电压。 该偏置结构与负载电容器配合，为低噪声滤波器设置高截止频率，可用于阻断或抵消DC偏移。

    Adaptive control method for rapid thermal processing of a substrate
    18.
    发明申请
    Adaptive control method for rapid thermal processing of a substrate 有权
    一种基板快速热处理的自适应控制方法

    公开(公告)号：US20070238202A1

    公开(公告)日：2007-10-11

    申请号：US11393423

    申请日：2006-03-30

    Applicant: Joseph Ranish ,  Tarpan Dixit ,  Dean Jennings ,  Balasubramanian Ramachandran ,  Aaron Hunter ,  Wolfgang Aderhold ,  Bruce Adams ,  Wen Chang

    Inventor： Joseph Ranish ,  Tarpan Dixit ,  Dean Jennings ,  Balasubramanian Ramachandran ,  Aaron Hunter ,  Wolfgang Aderhold ,  Bruce Adams ,  Wen Chang

    IPC: H01L21/66 ,  G01R31/26

    CPC classification number: H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: The present invention generally relates to methods for the rapid thermal processing (RTP) of a substrate. Embodiments of the invention include controlling a thermal process using either a real-time adaptive control algorithm or by using a control algorithm that is selected from a suite of fixed control algorithms designed for a variety of substrate types. Selection of the control algorithm is based on optical properties of the substrate measured during the thermal process. In one embodiment, a combination of control algorithms are used, wherein the majority of lamp groupings are controlled with a fixed control algorithm and a substantially smaller number of lamp zones are controlled by an adaptive control algorithm.

    Abstract translation: 本发明一般涉及用于衬底的快速热处理（RTP）的方法。 本发明的实施例包括使用实时自适应控制算法或通过使用从针对各种基板类型设计的一套固定控制算法中选择的控制算法来控制热处理。 控制算法的选择基于在热处理期间测量的衬底的光学性质。 在一个实施例中，使用控制算法的组合，其中大多数灯分组由固定控制算法控制，并且通过自适应控制算法来控制基本上较少数量的灯区。

    Receiver for a multimode radio
    19.
    发明申请
    Receiver for a multimode radio 有权

    公开(公告)号：US20060246942A1

    公开(公告)日：2006-11-02

    申请号：US11116086

    申请日：2005-04-27

    Applicant: Balasubramanian Ramachandran ,  John Vasa ,  Tudor Lipan ,  Norman Beamish

    Inventor： Balasubramanian Ramachandran ,  John Vasa ,  Tudor Lipan ,  Norman Beamish

    IPC: H04M1/00

    CPC classification number: H04B1/707 ,  H04B1/0067 ,  H04B2201/70711

    Abstract: A receiver for a multi-mode wireless device is provided. The receiver has multiple analog RF front end modules, with each module supporting a different mode of operation. The receiver has a single digital backend module for generating a digital baseband signal. A controller selects one of the available RF modules to use, and the selected RF module provides an analog communication signal to the digital backend. Each available mode has an associated set of factors. When a particular mode is selected, the set of factors associated with the selected mode is provided to the digital backend. The digital backend uses these factors to adjust the processing characteristics of its components, such as its analog to digital converter, filters, and gain controller. In this way, the single digital backend is adaptable to the requirements of each of the available radio modes.

    Semiconductor thermal process control
    20.
    发明申请
    Semiconductor thermal process control 失效
    半导体热过程控制

    公开(公告)号：US20050254804A1

    公开(公告)日：2005-11-17

    申请号：US11103968

    申请日：2005-04-11

    Applicant: Wolfgang Aderhold ,  Balasubramanian Ramachandran ,  Leonid Tertitski ,  Patrick Stone

    Inventor： Wolfgang Aderhold ,  Balasubramanian Ramachandran ,  Leonid Tertitski ,  Patrick Stone

    IPC: H01L21/00 ,  F26B3/30

    CPC classification number: H01L21/67248 ,  H01L21/67115

    Abstract: During fabrication, a rotating semiconductor substrate is radiated in accordance with a thermal recipe. Temperature measurements of the semiconductor substrate are obtained along with the position of the semiconductor substrate at the time of each temperature measurement. It is then determined for the position of the semiconductor substrate whether at least one particular temperature measurement of the temperature measurements should be filtered. If so, at least one filtered temperature measurement is obtained. The radiation of the semiconductor substrate is subsequently controlled based on the temperature measurements, the at least one filtered temperature measurement, and the thermal recipe.

    Abstract translation: 在制造期间，根据热配方照射旋转的半导体衬底。 半导体衬底的温度测量结果与每个温度测量时的半导体衬底的位置一起获得。 然后确定半导体衬底的位置是否应过滤温度测量的至少一个特定温度测量。 如果是这样，则获得至少一个过滤的温度测量值。 随后基于温度测量，至少一个过滤温度测量和热配方控制半导体衬底的辐射。

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