ARRAY SUBSTRATE AND DISPLAY APPARATUS

    公开(公告)号:US20240431143A1

    公开(公告)日:2024-12-26

    申请号:US17907489

    申请日:2021-12-24

    Abstract: An array substrate is provided. The array substrate includes a plurality of subpixels. A respective subpixel of the plurality of subpixels includes a first transistor. The first transistor includes a gate electrode; a first electrode on the gate electrode; a semiconductor material layer on a side of the first electrode away from the gate electrode; a second electrode on a side of the semiconductor material layer away from the first electrode; an organic layer on a side of the second electrode away from the semiconductor material layer; and a third electrode on a side of the organic layer away from the second electrode. An orthographic projection of the second electrode on a base substrate at least partially overlaps with an orthographic projection of the organic layer on the base substrate.

    Support stage
    15.
    发明授权
    Support stage 有权
    支持阶段

    公开(公告)号:US09411233B2

    公开(公告)日:2016-08-09

    申请号:US14445340

    申请日:2014-07-29

    CPC classification number: G03F7/16 G02F1/1303 H01L21/68742

    Abstract: A support stage comprises a body; at least one pin hole disposed in the body; a lift pin which is received in the pin hole and movable upwards or downwards; at least one groove disposed on a hole wall of the pin hole; and balls which are accommodated in the groove and capable of freely rolling in the groove, wherein the groove is disposed around the lift pin, and is shaped and sized such that each ball is capable of rolling in the groove and a part of each ball projects beyond the hole wall of the pin hole even when the each ball is pressed by the lift pin. With the support stage according to the embodiment of the present invention, the balls are disposed in the groove of the pin hole. In this way, generation of the particles can be alleviated.

    Abstract translation: 支持阶段包括身体; 设置在所述主体中的至少一个销孔; 提升销,其被容纳在销孔中并可向上或向下移动; 设置在所述销孔的孔壁上的至少一个槽; 以及容纳在所述槽中并能够在所述槽中自由滚动的滚珠,其中所述凹槽设置在所述提升销周围,并且其形状和尺寸使得每个球能够在所述凹槽中滚动,并且每个球的一部分突出 即使当每个球被提升销按压时,超出针孔的孔壁。 在根据本发明的实施例的支撑台中,球设置在销孔的凹槽中。 以这种方式,可以减轻颗粒的产生。

    SUPPORT STAGE
    16.
    发明申请
    SUPPORT STAGE 有权
    支持阶段

    公开(公告)号:US20150227044A1

    公开(公告)日:2015-08-13

    申请号:US14445340

    申请日:2014-07-29

    CPC classification number: G03F7/16 G02F1/1303 H01L21/68742

    Abstract: A support stage comprises a body; at least one pin hole disposed in the body; a lift pin which is received in the pin hole and movable upwards or downwards; at least one groove disposed on a hole wall of the pin hole; and balls which are accommodated in the groove and capable of freely rolling in the groove, wherein the groove is disposed around the lift pin, and is shaped and sized such that each ball is capable of rolling in the groove and a part of each ball projects beyond the hole wall of the pin hole even when the each ball is pressed by the lift pin. With the support stage according to the embodiment of the present invention, the balls are disposed in the groove of the pin hole. In this way, generation of the particles can be alleviated.

    Abstract translation: 支持阶段包括身体; 设置在所述主体中的至少一个销孔; 提升销,其被容纳在销孔中并可向上或向下移动; 设置在所述销孔的孔壁上的至少一个槽; 以及容纳在所述槽中并能够在所述槽中自由滚动的滚珠,其中所述凹槽设置在所述提升销周围,并且其形状和尺寸使得每个球能够在所述凹槽中滚动,并且每个球的一部分突出 即使当每个球被提升销按压时,超出针孔的孔壁。 在根据本发明的实施例的支撑台中,球设置在销孔的凹槽中。 以这种方式,可以减轻颗粒的产生。

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