公开(公告)号：US20230064193A1

公开(公告)日：2023-03-02

申请号：US17796641

申请日：2021-01-20

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Patrick WARNAAR ,  Vasco Tomas TENNER ,  Hugo Augustinus Joseph CRAMER ,  Bram Antonius Gerardus LOMANS ,  Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN ,  Ahmet Burak CUNBUL ,  Alexander Prasetya KONIJNENBERG

IPC: G06T7/00 ,  G01N21/47 ,  G03F7/20 ,  G06T5/00

Abstract: Disclosed is a method of measuring a periodic structure on a substrate with illumination radiation having at least one wavelength, the periodic structure having at least one pitch. The method comprises configuring, based on a ratio of said pitch and said wavelength, one or more of: an illumination aperture profile comprising one or more illumination regions in Fourier space; an orientation of the periodic structure for a measurement; and a detection aperture profile comprising one or more separated detection regions in Fourier space. This configuration is such that: i) diffracted radiation of at least a pair of complementary diffraction orders is captured within the detection aperture profile, and ii) said diffracted radiation fills at least 80% of the one or more separated detection regions. The periodic structure is measured while applying the configured one or more of illumination aperture profile, detection aperture profile and orientation of the periodic structure.

公开(公告)号：US20220350260A1

公开(公告)日：2022-11-03

申请号：US17761475

申请日：2020-09-03

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Armand Eugene Albert ,  Justin Lloyd KREUZER ,  Nikhil MEHTA ,  Patrick WARNAAR ,  Vasco Tomas TENNER ,  Patricius Aloysius Jacobus TINNEMANS ,  Hugo Augustinus Joseph CRAMER

IPC: G03F7/20 ,  G01N21/956 ,  G01N21/95

Abstract: Disclosed is a method for a metrology measurement on an area of a substrate comprising at least a portion of a target structure. The method comprises receiving a radiation information representing a portion of radiation scattered by the are, and using a filter in a Fourier domain for removing or suppressing at least a portion of the received radiation information that does not relate to radiation that has been scattered by the target structure for obtaining a filtered radiation information for the metrology measurement, wherein characteristics of the filter are based on target information about the target structure.

公开(公告)号：US20190310559A1

公开(公告)日：2019-10-10

申请号：US16376639

申请日：2019-04-05

Applicant: Stichting VU ,  Stichting Nederlandse Wetenschappelijk Onderzoek Instituten ,  Universiteit van Amsterdam ,  ASML Netherlands B.V.

Inventor： Johannes Fitzgerald DE BOER ,  Vasco Tomas TENNER ,  Arie Jeffrey DEN BOEF ,  Christos MESSINIS

IPC: G03F7/20 ,  G01N21/88

Abstract: Methods and apparatus are disclosed for determining a characteristic of a structure. In one arrangement, the structure is illuminated with first illumination radiation to generate first scattered radiation. A first interference pattern is formed by interference between a portion of the first scattered radiation reaching a sensor and first reference radiation. The structure is also illuminated with second illumination radiation from a different direction. A second interference pattern is formed using second reference radiation. The first and second interference patterns are used to determine the characteristic of the structure. Azimuthal angles of the first and second reference radiations onto the sensor are different.