公开(公告)号：US10712678B2

公开(公告)日：2020-07-14

申请号：US15046284

申请日：2016-02-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela Kruijt-Stegeman ,  Andre Bernardus Jeunink ,  Arie Jeffrey Den Boef ,  Vadim Yevgenyevich Banine ,  Michael Jozef Mathijs Renkens ,  Gerard Van Schothorst ,  Johan Frederik Dijksman ,  Carolus Johannes Catharina Schoormans ,  Adrianus Hendrik Koevoets ,  Catharinus De Schiffart ,  Sander Frederik Wuister

IPC: B29C43/58 ,  G03F9/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00 ,  G03F7/20 ,  B29C43/02 ,  B29C59/02 ,  B29C59/16

Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.

公开(公告)号：US10654217B2

公开(公告)日：2020-05-19

申请号：US15865242

申请日：2018-01-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela Kruijt-Stegeman ,  Raymond Jacobus Wilhelmus Knaapen ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Ivar Schram ,  Raymond Wilhelmus Louis Lafarre

IPC: B29C59/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00 ,  B29C59/02

Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.

公开(公告)号：US09658528B2

公开(公告)日：2017-05-23

申请号：US14610516

申请日：2015-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela Kruijt-Stegeman ,  Arie Jeffrey Den Boef ,  Andre Bernardus Jeunink

IPC: G03F7/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7076

Abstract: An imprint lithography template is provided with an alignment mark, wherein the alignment mark is formed from dielectric material having a refractive index which differs from the refractive index of the imprint lithography template, the dielectric material having a thickness which is such that it provides a phase difference between alignment radiation which has passed through the dielectric material and alignment radiation which has not passed through the dielectric material.

公开(公告)号：US20150145172A1

公开(公告)日：2015-05-28

申请号：US14610516

申请日：2015-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela Kruijt-Stegeman ,  Arie Jeffrey Den Boef ,  Andre Bernardus Jeunink

IPC: G03F7/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7076

Abstract: An imprint lithography template is provided with an alignment mark, wherein the alignment mark is formed from dielectric material having a refractive index which differs from the refractive index of the imprint lithography template, the dielectric material having a thickness which is such that it provides a phase difference between alignment radiation which has passed through the dielectric material and alignment radiation which has not passed through the dielectric material.

Abstract translation: 压印光刻模板设置有对准标记，其中对准标记由具有不同于压印光刻模板的折射率的折射率的介电材料形成，所述电介质材料具有使得其提供相位的厚度 通过电介质材料的取向辐射与未通过电介质材料的对准辐射之间的差异。

公开(公告)号：US20180162040A1

公开(公告)日：2018-06-14

申请号：US15865242

申请日：2018-01-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela Kruijt-Stegeman ,  Raymond Jacobus Wilhelmus Knaapen ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Ivar Schram ,  Raymond Wilhelmus Louis Lafarre

IPC: B29C59/00 ,  B29C59/02 ,  G03F7/00 ,  B82Y40/00 ,  B82Y10/00

CPC classification number: B29C59/002 ,  B29C59/02 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.

公开(公告)号：US09278466B2

公开(公告)日：2016-03-08

申请号：US14605637

申请日：2015-01-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Sander Frederik Wuister ,  Vadim Yevgenyevich Banine ,  Johan Frederik Dijksman ,  Yvonne Wendela Kruijt-Stegeman ,  Jeroen Herman Lammers ,  Roelof Koole

IPC: C03C15/00 ,  B29C43/34 ,  B44C1/20 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00 ,  B29C43/02 ,  B29C43/58 ,  B29K101/12

CPC classification number: B29C43/34 ,  B29C43/021 ,  B29C43/58 ,  B29C2043/025 ,  B29K2101/12 ,  B44C1/20 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.