公开(公告)号：US20160276127A1

公开(公告)日：2016-09-22

申请号：US14658993

申请日：2015-03-16

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Yuval Gronau ,  Ishai Schwarzband ,  Benzion Sender ,  Dror Shemesh ,  Ran Schleyen ,  Ofir Greenberg

IPC: H01J37/22 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2803

Abstract: A system for scanning an object, the system may include (a) charged particles optics that is configured to: scan, with a charged particle beam and at a first scan rate, a first region of interest (ROI) of an area of the object; detect first particles that were generated as a result of the scanning of the first ROI; scan, with the charged particle beam and at a second scan rate, a second ROI of the area of the object; wherein the second scan rate is lower than the first scan rate; wherein first ROI differs from the second ROI by at least one parameter; detect second particles that were generated as a result of the scanning of the second ROA; and (b) a processor that is configured to generate at least one image of the area in response to the first and second particles.

Abstract translation: 一种用于扫描对象的系统，系统可以包括（a）带电粒子光学器件，其被配置为：以带电粒子束和第一扫描速率扫描物体的区域的第一感兴趣区域（ROI） ; 检测由于第一ROI的扫描而产生的第一粒子; 用所述带电粒子束以第二扫描速率扫描所述物体区域的第二ROI; 其中所述第二扫描速率低于所述第一扫描速率; 其中第一ROI与所述第二ROI相差至少一个参数; 检测由于第二ROA的扫描而产生的第二颗粒; 以及（b）处理器，被配置为响应于所述第一和第二粒子而产生所述区域的至少一个图像。

公开(公告)号：US20210156682A1

公开(公告)日：2021-05-27

申请号：US16692949

申请日：2019-11-22

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Benzion Sender

IPC: G01B15/00

Abstract: A method that includes performing multiple test iterations to provide multiple test results; and processing the multiple test results to provide estimates of a conductivity of each of the multiple bottoms segments. The multiple test iterations includes repeating, for each bottom segment of the multiple bottom segments, the steps of: (a) illuminating the bottom segment by a charging electron beam; wherein electrons emitted from the bottom segment due to the illuminating are prevented from exiting the hole; (b) irradiating, by a probing electron beam, an area of an upper surface of the dielectric medium; (c) collecting electrons emitted from the area of the upper surface as a result of the irradiation of the area by the probing electron beam to provide collected electrons; and (d) determining an energy of at least one of the collected electrons to provide a test result.

公开(公告)号：US10068748B2

公开(公告)日：2018-09-04

申请号：US15371332

申请日：2016-12-07

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Yoram Uziel ,  Benzion Sender ,  Doron Aspir ,  Yohanan Madmon ,  Ron Naftali ,  Yuri Belenky

IPC: H01J37/28 ,  H01J37/20 ,  G06T7/00

CPC classification number: H01J37/28 ,  G06T7/0004 ,  G06T2207/30148 ,  H01J37/20 ,  H01J2237/20228 ,  H01J2237/2817

Abstract: A method for scanning an object, the method may include moving an object by a first mechanical stage that follows a first scan pattern; introducing multiple movements, by a second mechanical stage, between the object and the first mechanical stage while the first mechanical stage follows the first scan pattern; and obtaining, by optics, images of multiple suspected defects while the first mechanical stage follows the first scan pattern; wherein a weight of the first mechanical stage exceeds a weight of the second mechanical stage.

公开(公告)号：US09847209B2

公开(公告)日：2017-12-19

申请号：US15207024

申请日：2016-07-11

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Benzion Sender ,  Alon Litman

IPC: H01J37/26

CPC classification number: H01J37/265 ,  H01J2237/15 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/28

Abstract: A system for scanning a plurality of regions of interest of a substrate using one or more charged particle beams, the system comprises: an irradiation module having charged particle optics; a stage for introducing a relative movement between the substrate and the charged particle optics; an imaging module for collecting electrons emanating from the substrate in response to a scanning of the regions of interest by the one or more charged particle beams; and wherein the charged particle optics is arranged to perform countermovements of the charged particle beam during the scanning of the regions of interest thereby countering relative movements introduced between the substrate and the charged particle optics during the scanning of the regions of interest.