Method for forming thin film and apparatus therefor
    11.
    发明申请
    Method for forming thin film and apparatus therefor 有权
    薄膜形成方法及其设备

    公开(公告)号:US20060011231A1

    公开(公告)日:2006-01-19

    申请号:US10529904

    申请日:2003-10-03

    IPC分类号: H01L31/00

    摘要: A plurality of antenna elements, each of which has first and second linear conductors whose first ends are electrically interconnected are formed. The antenna elements are arranged in plane in such a way that the first and second linear conductors are alternated and separated from one another at regular intervals, thereby forming one or more array antennas which are disposed in a chamber. The second ends of the first linear conductors are connected to a high-frequency power supply, and the second ends of the second linear conductors are connected to ground. A plurality of substrates are parallel placed on both sides of the array antennas at distances approximate to the distances between the linear conductors. A film is formed by introducing an ingredient gas into the chamber.

    摘要翻译: 形成有多个天线元件,每个天线元件具有第一和第二线性导体,其第一端电互连。 天线元件布置在平面中,使得第一和第二线性导体以规则的间隔彼此交替和分离,从而形成设置在腔室中的一个或多个阵列天线。 第一线性导体的第二端连接到高频电源,第二线性导体的第二端连接到地。 多个基板平行地放置在阵列天线的两侧,距离线性导体之间的距离近似。 通过将成分气体引入室中形成膜。

    Plasma CVD method
    13.
    发明授权
    Plasma CVD method 有权
    等离子体CVD法

    公开(公告)号:US09165748B2

    公开(公告)日:2015-10-20

    申请号:US12855809

    申请日:2010-08-13

    摘要: A plasma CVD method uses an electrode array in a reaction chamber, the electrode array including a plurality of inductively coupled electrodes, each electrode being folded back at the center so that each electrode is substantially U-shaped with two parallel straight portions, the electrodes are arranged such that all of the parallel straight portions are arranged parallel to each other in a common plane, each of the electrodes having at least a portion with a diameter of 10 mm or less, and a phase controlled power supply for feeding high frequency power to the feeding portions so as to establish a standing wave of a half wavelength or natural number multiple of a half wavelength between a feeding portion and a folded back portion and between a grounded portion and the folded back portion, and is controlled to have a phase difference between adjacent two feeding portions.

    摘要翻译: 等离子体CVD法在反应室中使用电极阵列,电极阵列包括多个电感耦合电极,每个电极在中心折回,使得每个电极基本上为U形,具有两个平行的直线部分,电极为 被布置为使得所有平行的直线部分在公共平面中彼此平行地布置,每个电极具有至少一个直径为10mm或更小的部分,以及用于将高频功率馈送到 馈送部分,以便在馈送部分和折回部分之间以及在接地部分和折回部分之间建立半波长或自然数倍的半波长的驻波,并且被控制为具有相位差 在相邻的两个进给部分之间。

    PLASMA CVD METHOD
    14.
    发明申请
    PLASMA CVD METHOD 有权
    等离子体CVD法

    公开(公告)号:US20100316815A1

    公开(公告)日:2010-12-16

    申请号:US12855809

    申请日:2010-08-13

    IPC分类号: C23C16/50

    摘要: A plasma CVD method uses an electrode array in a reaction chamber, the electrode array including a plurality of inductively coupled electrodes, each electrode being folded back at the center so that each electrode is substantially U-shaped with two parallel straight portions, the electrodes are arranged such that all of the parallel straight portions are arranged parallel to each other in a common plane, each of the electrodes having at least a portion with a diameter of 10 mm or less, and a phase controlled power supply for feeding high frequency power to the feeding portions so as to establish a standing wave of a half wavelength or natural number multiple of a half wavelength between a feeding portion and a folded back portion and between a grounded portion and the folded back portion, and is controlled to have a phase difference between adjacent two feeding portions.

    摘要翻译: 等离子体CVD法在反应室中使用电极阵列,电极阵列包括多个电感耦合电极,每个电极在中心折回,使得每个电极基本上为U形,具有两个平行的直线部分,电极为 被布置为使得所有平行的直线部分在公共平面中彼此平行地布置,每个电极具有至少一个直径为10mm或更小的部分,以及用于将高频功率馈送到 馈送部分,以便在馈送部分和折回部分之间以及在接地部分和折回部分之间建立半波长或自然数倍的半波长的驻波,并被控制为具有相位差 在相邻的两个进给部分之间。

    Discharge apparatus, plasma processing method and solar cell
    15.
    发明申请
    Discharge apparatus, plasma processing method and solar cell 审中-公开
    放电装置,等离子体处理方法和太阳能电池

    公开(公告)号:US20050067934A1

    公开(公告)日:2005-03-31

    申请号:US10670476

    申请日:2003-09-26

    摘要: The object of this invention is to realize the new configuration of antenna and the electric power feeding method which substantially suppress the generation of standing wave and consequently to provide a discharge apparatus to generate plasma having an excellent uniformity, a plasma processing method for large-area substrate, and a solar cell manufactured with a high productivity. The present invention is composed of a plurality of U-shaped antenna elements having a power feeding end and a grounded end which are arranged to form an array antenna in such a way that the grounded end and the power feeding end are alternately placed in parallel at regular intervals on a plane, wherein the alternating current electric powers with the same excitation frequency are simultaneously fed to the power feeding ends with the phase shift of 180 degrees between adjacent power feeding ends, the excitation frequency of the alternating current power is 10 MHz-2 GHz, and the length of the conductor is set so that the measured ratio of reflected wave to incident wave is 0.1 or less at the power feeding end. It is also possible to determine the length La of straight conductor to hold the inequality: 0.5(1/α)

    摘要翻译: 本发明的目的是实现基本上抑制驻波产生的天线的新配置和馈电方法,从而提供具有均匀性优异的等离子体的放电装置,大面积等离子体处理方法 基板和以高生产率制造的太阳能电池。 本发明由具有供电端和接地端的多个U形天线元件组成,这些U形天线元件被布置成形成阵列天线,使得接地端和馈电端交替地平行放置在 其中具有相同激励频率的交流电功率在相邻供电端之间以180度的相移同时馈送到馈电端,交流功率的激励频率为10MHz- 2GHz,并且设定导体的长度,使得测得的反射波与入射波的比例在馈电端为0.1或更小。 也可以确定直线导体的长度La以保持不等式:0.5(1 /α)

    Method For Forming Thin Film And Apparatus Therefor
    17.
    发明申请
    Method For Forming Thin Film And Apparatus Therefor 审中-公开
    薄膜形成方法及其设备

    公开(公告)号:US20110297089A1

    公开(公告)日:2011-12-08

    申请号:US13211901

    申请日:2011-08-17

    摘要: A plurality of antenna elements, each of which has first and second linear conductors whose first ends are electrically interconnected are formed. The antenna elements are arranged in plane in such a way that the first and second linear conductors are alternated and separated from one another at regular intervals, thereby forming one or more array antennas which are disposed in a chamber. The second ends of the first linear conductors are connected to a high-frequency power supply, and the second ends of the second linear conductors are connected to ground. A plurality of substrates are parallel placed on both sides of the array antennas at distances approximate to the distances between the linear conductors. A film is formed by introducing an ingredient gas into the chamber.

    摘要翻译: 形成有多个天线元件,每个天线元件具有第一和第二线性导体,其第一端电互连。 天线元件布置在平面中,使得第一和第二线性导体以规则的间隔彼此交替和分离,从而形成设置在腔室中的一个或多个阵列天线。 第一线性导体的第二端连接到高频电源,第二线性导体的第二端连接到地。 多个基板平行地放置在阵列天线的两侧,距离线性导体之间的距离近似。 通过将成分气体引入室中形成膜。

    Method for forming thin film and apparatus therefor
    18.
    发明授权
    Method for forming thin film and apparatus therefor 有权
    薄膜形成方法及其设备

    公开(公告)号:US08034418B2

    公开(公告)日:2011-10-11

    申请号:US10529904

    申请日:2003-10-03

    IPC分类号: C23C16/00

    摘要: A plurality of antenna elements, each of which has first and second linear conductors whose first ends are electrically interconnected are formed. The antenna elements are arranged in plane in such a way that the first and second linear conductors are alternated and separated from one another at regular intervals, thereby forming one or more array antennas which are disposed in a chamber. The second ends of the first linear conductors are connected to a high-frequency power supply, and the second ends of the second linear conductors are connected to ground. A plurality of substrates are parallel placed on both sides of the array antennas at distances approximate to the distances between the linear conductors. A film is formed by introducing an ingredient gas into the chamber.

    摘要翻译: 形成有多个天线元件,每个天线元件具有第一和第二线性导体,其第一端电互连。 天线元件布置在平面中,使得第一和第二线性导体以规则的间隔彼此交替和分离,从而形成设置在腔室中的一个或多个阵列天线。 第一线性导体的第二端连接到高频电源,第二线性导体的第二端连接到地。 多个基板平行地放置在阵列天线的两侧,距离线性导体之间的距离近似。 通过将成分气体引入室中形成膜。

    PLASMA CVD APPARATUS AND METHOD
    20.
    发明申请
    PLASMA CVD APPARATUS AND METHOD 审中-公开
    等离子体CVD装置和方法

    公开(公告)号:US20090148624A1

    公开(公告)日:2009-06-11

    申请号:US12368740

    申请日:2009-02-10

    IPC分类号: B01J19/08 C23C16/54

    摘要: A plasma CVD apparatus includes a an electrode array in a reaction chamber, the electrode array including a plurality of inductively coupled electrodes, each electrode being folded back at the center so that each electrode is substantially U-shaped with two parallel straight portions, the electrodes are arranged such that all of the parallel straight portions are arranged parallel to each other in a common plane, each of the electrodes having at least a portion with a diameter of 10 mm or less, and a phase controlled power supply for feeding high frequency power to the feeding portions so as to establish a standing wave of a half wavelength or natural number multiple of a half wavelength between a feeding portion and a folded back portion and between a grounded portion and the folded back portion, and is controlled to have a phase difference between adjacent two feeding portions.

    摘要翻译: 等离子体CVD装置包括在反应室中的电极阵列,该电极阵列包括多个电感耦合电极,每个电极在中心折回,使得每个电极基本上为U形,具有两个平行的直线部分,电极 被布置成使得所有平行的直线部分在公共平面中彼此平行地布置,每个电极具有至少一个直径为10mm或更小的部分,以及用于馈送高频功率的相位控制电源 到馈送部分,以便在馈送部分和折回部分之间以及在接地部分和折回部分之间建立半波长的半波长或自然数倍的驻波,并被控制成具有相位 相邻两个供电部分之间的差异。