Low-temperature plasma deposited hydrogenated amorphous germanium carbon abrasion-resistant coatings
    11.
    发明授权
    Low-temperature plasma deposited hydrogenated amorphous germanium carbon abrasion-resistant coatings 失效
    低温等离子体沉积氢化无定形锗碳耐磨涂层

    公开(公告)号:US06844070B2

    公开(公告)日:2005-01-18

    申请号:US10232462

    申请日:2002-08-30

    摘要: A method of forming a hydrogenated amorphous germanium carbon (a-GeCx:H) film on a surface of an infrared (IR) transmissive material such as a chalcogenide is provided. The method includes positioning an IR transmissive material in a reactor chamber of a parallel plate plasma reactor and thereafter depositing a hydrogenated amorphous germanium carbon (a-GeCx:H) film on a surface of the IR transmissive material. The depositing is performed at a substrate temperature of about 130° C. or less and in the presence of a plasma which is derived from a gas mixture including a source of germanium, an inert gas, and optionally hydrogen. Optical transmissive components, such as IR sensors and windows, that have improved abrasion-resistance are also provided.

    摘要翻译: 提供了在红外(IR)透射材料如硫族化物的表面上形成氢化无定形锗碳(a-GeCx:H)膜的方法。 该方法包括将IR透射材料定位在平行板等离子体反应器的反应室中,然后在IR透射材料的表面上沉积氢化无定形锗碳(a-GeCx:H)膜。 在约130℃或更低的衬底温度下和在源自包含锗源,惰性气体和任选的氢的气体混合物的等离子体存在下进行沉积。 还提供了具有改善的耐磨性的光学透射组件,例如IR传感器和窗户。