公开(公告)号：US07796804B2

公开(公告)日：2010-09-14

申请号：US12176095

申请日：2008-07-18

Applicant: Kris Bhaskar ,  Mark McCord ,  Santosh Bhattacharyya ,  Ardis Liang ,  Richard Wallingford ,  Hubert Altendorfer ,  Kais Maayah

Inventor： Kris Bhaskar ,  Mark McCord ,  Santosh Bhattacharyya ,  Ardis Liang ,  Richard Wallingford ,  Hubert Altendorfer ,  Kais Maayah

IPC: G06K9/00

CPC classification number: G03F7/7065 ,  G01N21/93 ,  G01N21/95607 ,  G03F1/84 ,  G06T7/001 ,  G06T2207/30148

Abstract: Methods for generating a standard reference die for use in a die to standard reference die inspection and methods for inspecting a wafer are provided. One computer-implemented method for generating a standard reference die for use in a die to standard reference die inspection includes acquiring output of an inspection system for a centrally located die on a wafer and one or more dies located on the wafer. The method also includes combining the output for the centrally located die and the one or more dies based on within die positions of the output. In addition, the method includes generating the standard reference die based on results of the combining step.

Abstract translation: 提供了用于生产用于模具的标准参考模具用于标准参考模具检验的方法和用于检查晶片的方法。 一种计算机实现的用于生产用于模具中的标准参考模具用于标准参考模具检查的方法包括获取用于晶片上的位于中心的管芯和位于晶片上的一个或多个管芯的检查系统的输出。 该方法还包括基于输出的管芯位置组合用于位于中心的管芯和一个或多个管芯的输出。 此外，该方法包括基于组合步骤的结果生成标准参考管芯。

公开(公告)号：US07738093B2

公开(公告)日：2010-06-15

申请号：US12115833

申请日：2008-05-06

Applicant: David Alles ,  Mark Wihl ,  Stan Stokowski ,  Yalin Xiong ,  Damon Kvamme

Inventor： David Alles ,  Mark Wihl ,  Stan Stokowski ,  Yalin Xiong ,  Damon Kvamme

IPC: G01N21/00

CPC classification number: G03F1/84

Abstract: Methods for detecting and classifying defects on a reticle are provided. One method includes acquiring images of the reticle at first and second conditions during inspection of the reticle. The first condition is different than the second condition. The method also includes detecting the defects on the reticle using one or more of the images acquired at the first condition. In addition, the method includes classifying an importance of the defects detected on the reticle using one or more of the images acquired at the second condition. The detecting and classifying steps are performed substantially simultaneously during the inspection.

Abstract translation: 提供了在掩模版上检测和分类缺陷的方法。 一种方法包括在检查光罩期间的第一和第二条件下获取光罩的图像。 第一个条件不同于第二个条件。 该方法还包括使用在第一条件下获取的图像中的一个或多个来检测掩模版上的缺陷。 此外，该方法包括使用在第二条件下获取的一个或多个图像来分类在掩模版上检测到的缺陷的重要性。 检测和分类步骤在检查期间基本上同时进行。

公开(公告)号：US07613598B2

公开(公告)日：2009-11-03

申请号：US11542806

申请日：2006-10-04

Applicant: Jon Opsal ,  Hanyou Chu ,  Xuelong Cao ,  Youxian Wen

Inventor： Jon Opsal ,  Hanyou Chu ,  Xuelong Cao ,  Youxian Wen

IPC: G06F17/50

CPC classification number: G01N21/4788

Abstract: A method for modeling samples includes the use of control points to define lines profiles and other geometric shapes. Each control point used within a model influences a shape within the model. Typically, the control points are used in a connect-the-dots fashion where a set of dots defines the outline or profile of a shape. The layers within the sample are typically modeled independently of the shape defined using the control points. The overall result is to minimize the number of parameters used to model shapes while maintaining the accuracy of the resulting scatterometry models.

Abstract translation: 用于建模样本的方法包括使用控制点来定义线轮廓和其他几何形状。 模型中使用的每个控制点影响模型内的形状。 通常，控制点以连接点的方式使用，其中一组点定义形状的轮廓或轮廓。 样品中的层通常被模拟，独立于使用控制点定义的形状。 总体结果是最小化用于建模形状的参数数量，同时保持得到的散射测量模型的准确性。

公开(公告)号：US07400402B2

公开(公告)日：2008-07-15

申请号：US11657368

申请日：2007-01-24

Applicant: Walter Lee Smith

Inventor： Walter Lee Smith

IPC: G01J4/00 ,  G01N21/00

CPC classification number: G01N21/1717 ,  G01N21/4788 ,  G01N2021/1719

Abstract: An apparatus for scatterometry measurements is disclosed. The apparatus includes a modulated pump source for exciting the sample. A separate probe beam is directed to interact with the sample and the modulated optical response is measured. The measured data is subjected to a scatterometry analysis in order to evaluate geometrical sample features that induce light scattering.

Abstract translation: 公开了一种用于散射测量的装置。 该装置包括用于激发样品的调制泵浦源。 引导单独的探针光束与样品相互作用，并测量调制的光学响应。 对测量数据进行散射分析，以评估诱导光散射的几何样本特征。

公开(公告)号：US07142300B2

公开(公告)日：2006-11-28

申请号：US10829727

申请日：2004-04-22

Applicant: Eliezer Rosengaus

Inventor： Eliezer Rosengaus

IPC: G01J4/00

CPC classification number: G01N21/9503

Abstract: A method and apparatus for enhancing image contrast between resist-covered and bare silicon regions of a wafer, applicable to Edge Bead Removal inspection. The wafer is illuminated separately by s-polarized light and p-polarized light impinging at near the Brewster angle of silicon or resist, and an image difference between the reflected s-polarized light and the reflected p-polarized light is derived.

Abstract translation: 一种用于增强晶片的抗蚀覆盖层和裸硅区域之间的图像对比度的方法和装置，适用于边缘去除废料检查。 通过在硅或抗蚀剂的布鲁斯特角附近入射的s偏振光和p偏振光分别照射晶片，并且导出反射的s偏振光和反射的p偏振光之间的图像差。

公开(公告)号：US10670535B2

公开(公告)日：2020-06-02

申请号：US16296132

申请日：2019-03-07

Applicant: KLA-Tencor Corporation

Inventor： Brian Duffy ,  Ajay Gupta ,  Thanh Huy Ha

IPC: G01N21/88 ,  G03F7/20 ,  G01N21/95 ,  G01N23/00 ,  G01N21/956

Abstract: Methods and systems for determining parameter(s) of a metrology process to be performed on a specimen are provided. One system includes one or more computer subsystems configured for automatically generating regions of interest (ROIs) to be measured during a metrology process performed for the specimen with the measurement subsystem based on a design for the specimen. The computer subsystem(s) are also configured for automatically determining parameter(s) of measurement(s) performed in first and second subsets of the ROIs during the metrology process with the measurement subsystem based on portions of the design for the specimen located in the first and second subsets of the ROIs, respectively. The parameter(s) of the measurement(s) performed in the first subset are determined separately and independently of the parameter(s) of the measurement(s) performed in the second subset.

公开(公告)号：US10395356B2

公开(公告)日：2019-08-27

申请号：US15603249

申请日：2017-05-23

Applicant: KLA-Tencor Corporation

Inventor： Jing Zhang ,  Kris Bhaskar

IPC: G06T7/00

Abstract: Methods and systems for generating a simulated image from an input image are provided. One system includes one or more computer subsystems and one or more components executed by the one or more computer subsystems. The one or more components include a neural network that includes two or more encoder layers configured for determining features of an image for a specimen. The neural network also includes two or more decoder layers configured for generating one or more simulated images from the determined features. The neural network does not include a fully connected layer thereby eliminating constraints on size of the image input to the two or more encoder layers.

公开(公告)号：US10360477B2

公开(公告)日：2019-07-23

申请号：US15402169

申请日：2017-01-09

Applicant: KLA-Tencor Corporation

Inventor： Kris Bhaskar ,  Scott Young ,  Mark Roulo ,  Jing Zhang ,  Laurent Karsenti ,  Mohan Mahadevan ,  Bjorn Brauer

IPC: G06K9/00 ,  G06K9/62 ,  G06K9/66 ,  G06T7/00

Abstract: Methods and systems for performing one or more functions for a specimen using output simulated for the specimen are provided. One system includes one or more computer subsystems configured for acquiring output generated for a specimen by one or more detectors included in a tool configured to perform a process on the specimen. The system also includes one or more components executed by the one or more computer subsystems. The one or more components include a learning based model configured for performing one or more first functions using the acquired output as input to thereby generate simulated output for the specimen. The one or more computer subsystems are also configured for performing one or more second functions for the specimen using the simulated output.

公开(公告)号：US10359371B2

公开(公告)日：2019-07-23

申请号：US15243809

申请日：2016-08-22

Applicant: KLA-Tencor Corporation

Inventor： Brian Duffy ,  Ashok Kulkarni ,  Michael Lennek ,  Allen Park

IPC: G06K9/64 ,  G06T7/00 ,  G01N21/95 ,  H01L21/66 ,  G01N21/956 ,  G05B19/418

Abstract: Methods and systems for determining characteristic(s) of patterns of interest (POIs) are provided. One system is configured to acquire output of an inspection system generated at the POI instances without detecting defects at the POI instances. The output is then used to generate a selection of the POI instances. The system then acquires output from an output acquisition subsystem for the selected POI instances. The system also determines characteristic(s) of the POI using the output acquired from the output acquisition subsystem.

公开(公告)号：US10346740B2

公开(公告)日：2019-07-09

申请号：US15609009

申请日：2017-05-31

Applicant: KLA-Tencor Corporation

Inventor： Jing Zhang ,  Kris Bhaskar

IPC: G06N7/02 ,  G06N7/04 ,  G06N7/06 ,  G06N7/08 ,  G06N3/08 ,  G06N3/04 ,  G06K9/62

Abstract: Methods and systems for training a neural network are provided. One system includes one or more components executed by one or more computer subsystems. The one or more components include a neural network configured for determining inverted features of input images in a training set for a specimen input to the neural network, a forward physical model configured for reconstructing the input images from the inverted features thereby generating a set of output images corresponding to the input images in the training set, and a residue layer configured for determining differences between the input images in the training set and their corresponding output images in the set. The one or more computer subsystems are configured for altering one or more parameters of the neural network based on the determined differences thereby training the neural network.