公开(公告)号：US06278519B1

公开(公告)日：2001-08-21

申请号：US09015839

申请日：1998-01-29

Applicant: Allan Rosencwaig ,  Jon Opsal

Inventor： Allan Rosencwaig ,  Jon Opsal

IPC: G01J400

CPC classification number: G01B11/0641

Abstract: An optical measurement system is disclosed for evaluating samples with multi-layer thin film stacks. The optical measurement system includes a reference ellipsometer and one or more non-contact optical measurement devices. The reference ellipsometer is used to calibrate the other optical measurement devices. Once calibration is completed, the system can be used to analyze multi-layer thin film stacks. In particular, the reference ellipsometer provides a measurement which can be used to determine the total optical thickness of the stack. Using that information coupled with the measurements made by the other optical measurement devices, more accurate information about individual layers can be obtained.

公开(公告)号：US5900939A

公开(公告)日：1999-05-04

申请号：US98880

申请日：1998-06-17

Applicant: David E. Aspnes ,  Jon Opsal ,  Jeffrey T. Fanton

Inventor： David E. Aspnes ,  Jon Opsal ,  Jeffrey T. Fanton

IPC: G01B11/06 ,  G01J4/00 ,  G01N21/21

CPC classification number: G01B11/0641 ,  G01J4/00 ,  G01N21/211

Abstract: An optical measurement system for evaluating a reference sample that has at least a partially known composition. The optical measurement system includes a reference ellipsometer and at least one non-contact optical measurement device. The reference ellipsometer includes a light generator, an analyzer and a detector. The light generator generates a beam of quasimonochromatic light having a known wavelength and a known polarization for interacting with the reference sample. The beam is directed at a non-normal angle of incidence relative to the reference sample to interact with the reference sample. The analyzer creates interference between the S and P polarized components in the light beam after the light beam has interacted with reference sample. The detector measures the intensity of the light beam after it has passed through the analyzer. A processor determines the polarization state of the light beam entering the analyzer from the intensity measured by the detector, and determines an optical property of the reference sample based upon the determined polarization state, the known wavelength of light from the light generator and the composition of the reference sample. The processor also operates the optical measurement device to measure an optical parameter of the reference sample. The processor calibrates the optical measurement device by comparing the measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.

Abstract translation: 一种用于评估至少具有部分已知组成的参考样品的光学测量系统。 光学测量系统包括参考椭偏仪和至少一个非接触式光学测量装置。 参考椭偏仪包括光发生器，分析器和检测器。 光发生器产生具有已知波长和已知极化的准共振色光束，用于与参考样品相互作用。 光束相对于参考样品被引导到非正常入射角，以与参考样品相互作用。 在光束与参考样本相互作用后，分析仪在光束中产生S和P偏振分量之间的干扰。 检测器测量光束通过分析仪后的强度。 处理器根据由检测器测量的强度确定进入分析器的光束的偏振状态，并且基于所确定的偏振状态，来自光发生器的已知的光的波长以及来自光发生器的光的组成，确定参考样品的光学特性 参考样品。 处理器还操作光学测量装置以测量参考样品的光学参数。 处理器通过将来自光学测量装置的测量光学参数与来自参考椭偏仪的所确定的光学特性进行比较来校准光学测量装置。

公开(公告)号：US5864633A

公开(公告)日：1999-01-26

申请号：US649576

申请日：1996-05-17

Applicant: Jon Opsal ,  John J. Sidorowich

Inventor： Jon Opsal ,  John J. Sidorowich

IPC: G01B11/06 ,  G01N21/84 ,  G01N21/88 ,  H01L21/66 ,  G06K9/00 ,  G06F15/18

CPC classification number: G01N21/8422

Abstract: An optical inspection device generates a plurality of measured optical data from inspection of a thin film stack. A processor evolves models of theoretical data, which are compared to the measured data, and a "best fit" solution is provided as the result. Each model of theoretical data is represented by an underlying "genotype" which is an ordered list of "genes." Each gene corresponds to a selected thin film parameter of interest. Many such individual genotypes are created thereby forming a "population" of genotypes, which are evolved through the use of a genetic algorithm. Each genotype has a fitness associated therewith based on how much the theoretical data derived therefrom differs from the measured data. Individual genotypes are selected based on fitness, then a genetic operation is performed on the selected genotypes to produce new genotypes. Multiple generations of genotypes are evolved until an acceptable solution is obtained.

公开(公告)号：US4854710A

公开(公告)日：1989-08-08

申请号：US76876

申请日：1987-07-23

Applicant: Jon Opsal ,  Allan Rosencwaig ,  Walter L. Smith

Inventor： Jon Opsal ,  Allan Rosencwaig ,  Walter L. Smith

IPC: G01N23/203 ,  G01N21/17 ,  G01R31/265

CPC classification number: G01R31/2656 ,  G01N21/171

Abstract: A method and apparatus are disclosed for evaluating surface and subsurface features in a semiconductor sample. In operation, a periodic energy source is applied to the surface of the semiconductor sample to generate a periodic electron-hole plasma. This plasma interacts with features in the sample as it diffuses. The plasma affects the index of refraction of the sample and the changing plasma density is monitored using a radiation probe. In the preferred embodiment, the radiation probe measures the plasma induced periodic changes of reflectivity of the surface of the sample to yield information about the sample, such as ion dopant concentrations, residue deposits and defects.

Abstract translation: 公开了一种用于评估半导体样品中的表面和地下特征的方法和装置。 在操作中，将周期性能量源施加到半导体样品的表面以产生周期性电子空穴等离子体。 这种等离子体在扩散时与样品中的特征相互作用。 等离子体影响样品的折射率，并且使用辐射探针监测改变的等离子体密度。 在优选实施例中，辐射探针测量等离子体诱导的样品表面的反射率的周期性变化，以产生关于样品的信息，例如离子掺杂剂浓度残余物沉积物和缺陷。

公开(公告)号：US4750822A

公开(公告)日：1988-06-14

申请号：US845606

申请日：1986-03-28

Applicant: Allan Rosencwaig ,  Jon Opsal ,  Walter L. Smith

Inventor： Allan Rosencwaig ,  Jon Opsal ,  Walter L. Smith

IPC: G01B11/30 ,  G01N21/17 ,  G01N21/21 ,  G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G01N21/41

CPC classification number: G01N21/88 ,  G01N21/17 ,  G01N2021/1744 ,  G01N2021/178 ,  G01N2021/1789 ,  G01N21/21 ,  G01N21/4738

Abstract: A method and apparatus is disclosed for detecting defect surface states in any material and in particular semiconductors. In the subject device, a periodic localized excitation is generated at the surface of the sample with an intensity modulated pump laser beam. A probe laser beam is directed to the surface of the sample and changes in the probe beam which are in phase with the modulated pump frequency are detected. In the preferred embodiment, periodic changes in the optical reflectivity of the surface of the sample induced by an intensity modulated excitation beam are detected by measuring the corresponding modulations in the reflected power of the probe beam. Any time dependence of the probe beam modulated reflectance signal is monitored. An evaluation of defect surface states is then made by investigating the time dependence of the magnitude and/or phase of this probe beam modulated reflectance signal.

Abstract translation: 公开了用于检测任何材料，特别是半导体中的缺陷表面状态的方法和装置。 在本装置中，在强度调制的泵浦激光束的样品表面产生周期性局部激发。 探针激光束被引导到样品的表面，并且检测到与调制的泵频率同相的探针光束的变化。 在优选实施例中，通过测量探针光束的反射功率的相应调制来检测由强度调制的激发光束引起的样品的表面的光学反射率的周期性变化。 监测探测光束调制反射信号的任何时间依赖性。 然后通过研究该探测光束调制反射信号的幅度和/或相位的时间依赖性来进行缺陷表面状态的评估。

公开(公告)号：US07747424B2

公开(公告)日：2010-06-29

申请号：US11715635

申请日：2007-03-08

Applicant: Jon Opsal ,  Jingmin Leng

Inventor： Jon Opsal ,  Jingmin Leng

IPC: G06F17/50

CPC classification number: G01B11/24

Abstract: A modeling approach is disclosed which addresses samples with different regions where the structures exhibit different periodicities. In this approach, a first partial model is generated which defines the shape, material properties and periodicity of the first region. In addition, a second partial model is generated defining the shape, material properties and periodicity of the second region. These two partial models are then merged into a combined model. When optimizing the combined model, the shape and material properties of the first and second models are independently adjusted. The optical responses of the model with differing shapes and material properties are-calculated and compared to a physical sample. This process is iteratively carried out to derive a final combined model that corresponds to a physical sample.

Abstract translation: 公开了一种建模方法，其解决具有不同区域的样品，其中结构呈现不同的周期性。 在该方法中，生成第一部分模型，其定义第一区域的形状，材料特性和周期性。 另外，产生限定第二区域的形状，材料特性和周期性的第二部分模型。 然后将这两个部分模型合并成一个组合模型。 在优化组合模型时，可以独立调整第一和第二模型的形状和材料特性。 具有不同形状和材料性质的模型的光学响应被计算并与物理样品进行比较。 迭代地执行该过程以得到对应于物理样本的最终组合模型。

公开(公告)号：US20100134785A1

公开(公告)日：2010-06-03

申请号：US12616710

申请日：2009-11-11

Applicant: Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

Inventor： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

IPC: G01N21/55 ,  G01J3/00

CPC classification number: G01N21/636 ,  G01N21/1717

Abstract: A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.

Abstract translation: 调制反射测量系统包括用于产生强度调制泵浦光束和UV探测光束的激光器。 泵和探针光束聚焦在样品内的测量位置。 泵浦光束周期性地激发测量位置，并且调制被赋予探测光束。 对于一个实施例，选择探针光束的波长以对应于样品的温度反射系数的局部最大值。 对于第二实施例，探针激光器被调谐以使对热探测波束调制的热波贡献最小化，或者使得等离子体波对探测光束调制的贡献均衡。

公开(公告)号：US07646486B2

公开(公告)日：2010-01-12

申请号：US12022504

申请日：2008-01-30

Applicant: Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

Inventor： Jon Opsal ,  Lena Nicolaides ,  Alex Salnik ,  Allan Rosencwaig

IPC: G01N21/55

CPC classification number: G01N21/636 ,  G01N21/1717

Abstract: A modulated reflectance measurement system includes lasers for generating an intensity modulated pump beam and a UV probe beam. The pump and probe beams are focused on a measurement site within a sample. The pump beam periodically excites the measurement site and the modulation is imparted to the probe beam. For one embodiment, the wavelength of the probe beam is selected to correspond to a local maxima of the temperature reflectance coefficient of the sample. For a second embodiment, the probe laser is tuned to either minimize the thermal wave contribution to the probe beam modulation or to equalize the thermal and plasma wave contributions to the probe beam modulation.

Abstract translation: 调制反射测量系统包括用于产生强度调制泵浦光束和UV探测光束的激光器。 泵和探针光束聚焦在样品内的测量位置。 泵浦光束周期性地激发测量位置，并且调制被赋予探测光束。 对于一个实施例，选择探针光束的波长以对应于样品的温度反射系数的局部最大值。 对于第二实施例，探针激光器被调谐以使对热探测波束调制的热波贡献最小化，或者使得等离子体波对探测光束调制的贡献均衡。

公开(公告)号：US07619741B2

公开(公告)日：2009-11-17

申请号：US12185297

申请日：2008-08-04

Applicant: Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik ,  Jon Opsal

Inventor： Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik ,  Jon Opsal

IPC: G01N21/00

CPC classification number: G01N21/39 ,  G01N21/1717 ,  G01N21/55 ,  G01N21/636 ,  G01N21/9501 ,  G01N2201/0612 ,  G01N2201/0691

Abstract: A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.

Abstract translation: 调制反射测量系统包括三个基于单色二极管的激光器。 每个激光器可以作为探测光束或作为泵浦光源操作。 使用一系列反射镜和分束器将激光输出重定向到达物镜。 物镜将激光输出聚焦在样品上。 反射能量通过目标返回，并被分束器重定向到检测器。 锁定放大器转换检测器的输出以产生正交（Q）和同相（I）信号用于分析。 处理器使用Q和/或I信号来分析样本。 通过改变用作泵浦或探针光束源的激光器的数量，可以优化测量系统以测量不同样品类型的范围。

公开(公告)号：US07567351B2

公开(公告)日：2009-07-28

申请号：US11657359

申请日：2007-01-24

Applicant: Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

Inventor： Jon Opsal ,  Ilya Grodnensky ,  Heath Pois

IPC: G01B11/14 ,  G01N21/00

CPC classification number: G01B11/0641

Abstract: An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of micron. These measurements are compared to calibration information obtained from calibration measurements. The calibration information is derived by measuring calibration samples with the probe laser beam and at least one other technology having added information content. In the preferred embodiment, the other technology includes at least one of spectroscopic reflectometry or spectroscopic ellipsometry.

Abstract translation: 公开了一种光学测量方法，用于评估具有重复特征的半导体区域内的特性的均匀性，例如存储管芯。 该方法包括用具有微米数量级的光斑尺寸的探针激光束获得测量值。 将这些测量与从校准测量获得的校准信息进行比较。 校准信息是通过用探头激光束测量校准样品和至少一种具有添加信息内容的其他技术得出的。 在优选实施例中，其它技术包括光谱反射测量或光谱椭偏仪中的至少一种。