公开(公告)号：US20250140588A1

公开(公告)日：2025-05-01

申请号：US18790371

申请日：2024-07-31

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ilyoung HAN ,  Sumin KIM ,  Minwoo RHEE ,  Hyunjin LEE ,  Kyeongbin LIM

IPC: H01L21/677 ,  H01L21/67 ,  H01L21/68

Abstract: A wafer on which a hydrophilic pattern is applied is provided to a die seat on which a first magnetic pattern is formed and a hydrophobic pattern is applied around the hydrophilic pattern. Liquid is dispensed to the die seat. A first die on which a second magnetic pattern is formed is seated on the wafer and the first die is first-aligned using capillary force of the liquid. Liquid is dispensed onto an upper surface of the first die. A second die is seated on the upper surface of the first die and the second die is first-aligned with capillary force of the liquid on the upper surface of the first die. A magnetic field is generated in the first magnetic pattern and the second magnetic pattern and the first magnetic pattern and the second magnetic pattern are secondly-aligned using magnetic force.

公开(公告)号：US20230324791A1

公开(公告)日：2023-10-12

申请号：US18313555

申请日：2023-05-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eunkyung LEE ,  Sumin KIM ,  Hyunwoo KIM ,  Juhyeon PARK ,  Giyoung SONG ,  Sukkoo HONG ,  Yoonhyun KWAK ,  Youngmin NAM ,  Byunghee SOHN ,  Sunyoung LEE ,  Aram JEON ,  Sungwon CHOI

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C309/12 ,  C07D333/76 ,  C07C381/12

CPC classification number: G03F7/0045 ,  C07C309/12 ,  C07C381/12 ,  C07D333/76 ,  G03F7/038 ,  G03F7/039 ,  C07C2603/74

Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:





wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.

公开(公告)号：US20220116198A1

公开(公告)日：2022-04-14

申请号：US17336625

申请日：2021-06-02

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hanbyeul NA ,  Sumin KIM ,  Hongrak SON ,  Junho SHIN

IPC: H04L9/00 ,  H04L9/30

Abstract: A homomorphic operation accelerator includes a plurality of circuits and a homomorphic operation managing circuit. The plurality of circuits may perform homomorphic operations. The homomorphic operation managing circuit may receive ciphertext data, homomorphic encryption information and homomorphic operation information from an external device. The homomorphic operation managing circuit may activate or deactivate each of a plurality of enable signals applied to the plurality of circuits based on the homomorphic encryption information and the homomorphic operation information. The homomorphic operation managing circuit may activate or deactivate each of the plurality of circuits based on the plurality of enable signals. The homomorphic encryption information may be associated with a homomorphic encryption algorithm used to generate the ciphertext data. The homomorphic operation information may be associated with the homomorphic operations to be performed on the ciphertext data.

公开(公告)号：US20210067825A1

公开(公告)日：2021-03-04

申请号：US16959340

申请日：2018-12-19

Applicant: SAMSUNG ELECTRONICS CO., LTD

Inventor： Sungmin LIM ,  Changwon CHOI ,  Sumin KIM ,  Younghyun KIM ,  Youngin PARK ,  Hanjin PARK ,  Seockyoung SHIM ,  Taehoon LEE

IPC: H04N21/431 ,  G06F3/0483 ,  H04N21/4782 ,  G06F3/0482

Abstract: The disclosure provides a display device and a content providing method thereof. The content providing method of the display device includes: displaying a list including a plurality of web pages pre-selected by a user; and displaying, in case that a user command for selecting one of the plurality of web pages is input, a reconstructed content obtained by reconstructing the selected web page based on a type of the selected web page.

公开(公告)号：US20230194987A1

公开(公告)日：2023-06-22

申请号：US18084718

申请日：2022-12-20

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hyunji SONG ,  Sumin KIM ,  Hyunwoo KIM ,  Juhyeon PARK

IPC: G03F7/039

CPC classification number: G03F7/0392

Abstract: A photoresist polymer and a photoresist composition, the photoresist polymer including a first repeating unit represented by Chemical Formula 1:

公开(公告)号：US20230178280A1

公开(公告)日：2023-06-08

申请号：US18075814

申请日：2022-12-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sumin KIM ,  Minwoo Rhee ,  Yongchul Shin ,  Ilyoung Han ,  Nungpyo Hong ,  Seungdon Lee ,  Kyeongbin Lim

IPC: H01F13/00 ,  H01L25/00 ,  H01L23/00

CPC classification number: H01F13/00 ,  H01L25/50 ,  H01L23/564

Abstract: A die alignment method includes vertically aligning a first die comprising first magnetic patterns and a second die comprising second magnetic patterns with each other using magnetic force between the first magnetic patterns and the second magnetic patterns. Each of the first magnetic patterns and the second magnetic patterns comprises a horizontally magnetically anisotropic material. The first magnetic patterns and the second magnetic patterns do not vertically overlap each other when the first die and the second die are vertically aligned with each other.

公开(公告)号：US20210223692A1

公开(公告)日：2021-07-22

申请号：US16994957

申请日：2020-08-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hyunji SONG ,  Sukkoo HONG ,  Sumin KIM ,  Yechan KIM ,  Juyoung KIM ,  Jinjoo KIM ,  Hyunwoo KIM ,  Juhyeon PARK ,  Songse YI

IPC: G03F7/004 ,  G03F7/039 ,  C07D277/26 ,  C07D263/32 ,  C07D233/64 ,  C07D213/68

Abstract: A photo-decomposable compound, a photoresist composition, and a method of manufacturing an IC device, the compound generating acid upon exposure and acts as a quenching base that neutralizes acid in an unexposed state and being represented by Formula 1: wherein, in Formula 1, Ra is a C5 to C40 substituted or unsubstituted cyclic hydrocarbon group including at least one nitrogen atom, Ya is a C1 to C20 divalent linear or cyclic hydrocarbon group, n is an integer of 1 to 5, and A+ is a counter ion.

公开(公告)号：US20240404727A1

公开(公告)日：2024-12-05

申请号：US18658706

申请日：2024-05-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sumin KIM ,  Joonmok HAN

IPC: H01B7/08

Abstract: A flexible flat cable includes a base film extending in a first direction and having a first length, a conductive wire portion on a first surface of the base film and extending in the first direction, a cover film on the conductive wire portion, extending in the first direction and exposing a part of the conductive wire portion, the cover film having a second length which is less than the first length and a first conductive tape comprising a first tape area on a surface of the cover film and extending in the first direction and a second tape area folded at a certain angle from the first tape area and having a third length.

公开(公告)号：US20230194985A1

公开(公告)日：2023-06-22

申请号：US18076818

申请日：2022-12-07

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jinjoo KIM ,  Sumin KIM ,  Hyunwoo KIM ,  Yechan KIM ,  Juyoung KIM ,  Jicheol PARK ,  Giyoung SONG ,  Suk Koo HONG

IPC: G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0392 ,  H01L21/0276 ,  H01L21/0275

Abstract: A brush polymer for a photoresist, a photoresist composition, and a method of manufacturing an integrated circuit device, the brush polymer including a core and a plurality of side polymer chains, the plurality of side polymer chains being bonded to the core and extending from the core to form a bottle-brush polymer or a star-brush polymer, together with the core, wherein each of the plurality of side polymer chains includes a first repeating unit represented by Formula 1 and a second repeating unit represented by Formula 2:

公开(公告)号：US20230120542A1

公开(公告)日：2023-04-20

申请号：US18080348

申请日：2022-12-13

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sumin KIM ,  Hyunwoo KIM ,  Sukkoo HONG ,  Yechan KIM ,  Juyoung KIM ,  Jinjoo KIM ,  Juhyeon PARK ,  Hyunji SONG ,  Songse YI

IPC: G03F7/004 ,  C07C381/12 ,  G03F7/039 ,  C07C309/12

Abstract: A photo-decomposable compound includes an anion component including an adamantyl group and a cation component including a C5 to C40 cyclic hydrocarbon group and forming a complex with the anion component. At least one of the adamantyl group and the cyclic hydrocarbon group has a substituent, which decomposes by acid and generates an alkali soluble group. The substituent includes an acid-labile protecting group. A photoresist composition includes a chemically amplified polymer, the photo-decomposable compound, and a solvent. To manufacture an integrated circuit (IC) device, a photoresist film is formed using the photoresist composition on a feature layer, a first area of the photoresist film is exposed to generate a plurality of acids from the photo-decomposable compound in the first area, the chemically amplified polymer is deprotected due to the plurality of acids, and the first area is removed to form a photoresist pattern.