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公开(公告)号:US20180090492A1
公开(公告)日:2018-03-29
申请号:US15473913
申请日:2017-03-30
Applicant: Samsung Electronics Co., Ltd.
Inventor: Rajeev RANJAN , Deepak SHARMA , Subhash KUCHANURI , Chul Hong PARK , Jae Seok YANG , Kwan Young CHUN
IPC: H01L27/088 , H01L23/528 , H01L27/02 , H01L29/06 , H01L27/092 , H01L23/522
Abstract: Integrated circuit devices are provided. The IC devices may include an active region extending in a first direction, first and second gate electrodes extending in a second direction, a first impurity region in the active region adjacent a first side of the first gate electrode, a second impurity region in the active region between a second side of the first gate electrode and a first side of the second gate electrode, a third impurity region in the active region adjacent a second side of the second gate electrode, a cross gate contact electrically connecting the first and second impurity regions, a first contact electrically connected to the third impurity region, a first wire electrically connected to the cross gate contact, and a second wire electrically connected to the first contact. The first and second wires may extend only in the first direction and may be on the same line.