-
1.
公开(公告)号:US20240387168A1
公开(公告)日:2024-11-21
申请号:US18624788
申请日:2024-04-02
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jinwoo Park , Heeyeop Chae , Yongjae Kim , Sangwuk Park , Yuna Lee , Jihye Lee , Jungpyo Hong
IPC: H01L21/02 , C23C16/44 , H01L21/311
Abstract: A method of manufacturing a semiconductor element includes placing a structure, the structure including a substrate and a first metal-containing film disposed on the substrate, fluorinating at least one atomic layer from an exposed surface of the first metal-containing film by supplying a fluorinating gas to the structure to form a fluorinated atomic layer, and etching the fluorinated atomic layer of the first metal-containing film by supplying an etching gas to the structure, wherein the etching gas includes an inert gas in a plasma state.
-
公开(公告)号:US11756493B2
公开(公告)日:2023-09-12
申请号:US17583753
申请日:2022-01-25
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jihye Lee , Bora Jin , Youngjin Yoon , Yeoul Lee , Jaesung Lee , Sunil Lee
CPC classification number: G09G3/3433 , G09G3/2003 , G09G2300/023 , G09G2320/0686
Abstract: A stacked display device and a control method thereof are provided. The stacked display device includes a stacked display including a first panel and a second panel comprising a different transmittance from the first panel and a processor to obtain a first layer image to display an image on the first panel and a second layer image to display an image on the second panel, adjust brightness of the second layer image based on a ratio between a first transmittance for the first panel and a second transmittance for the second panel, and a pixel value of the second layer image, and control the stacked display to display the second layer image of which brightness is adjusted on the second panel while displaying the first layer image on the first panel.
-
公开(公告)号:USD974289S1
公开(公告)日:2023-01-03
申请号:US29784320
申请日:2021-05-19
Applicant: Samsung Electronics Co., Ltd.
Designer: Jaehyung Kim , Kwanhee Lee , Jihye Lee
-
公开(公告)号:US20220076062A1
公开(公告)日:2022-03-10
申请号:US17525620
申请日:2021-11-12
Applicant: SAMSUNG ELECTRONICS CO., LTD. , INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY
Inventor: Jihye Lee , Taegyu Lim , Taeoh Kim , Hyeongmin Lee , Sangyoun Lee
Abstract: The present disclosure relates to an image processing device including: a memory configured to store one or more instructions; and a processor configured to execute the one or more instructions stored in the memory to: extract one or more input patches based on an input image; extract one or more pieces of feature information respectively corresponding to the one or more input patches, based on a dictionary including mapping information indicating mappings between a plurality of patches and pieces of feature information respectively corresponding to the plurality of patches; and obtain a final image by performing a convolution operation between the extracted one or more pieces of feature information and a filter kernel.
-
公开(公告)号:USD788052S1
公开(公告)日:2017-05-30
申请号:US29564918
申请日:2016-05-17
Applicant: Samsung Electronics Co., Ltd.
Designer: Younho Choi , Jihye Lee , Searom Jung , Daejoong Kim , Jisoo Lim , Jeasung Kim , Sangyoung Lee , Joonyoung Lee , Hyungsun Lee , Heeseok Jeong , Kyuhyun Cho , Shiyun Cho
-
公开(公告)号:USD986868S1
公开(公告)日:2023-05-23
申请号:US29785285
申请日:2021-05-25
Applicant: Samsung Electronics Co., Ltd.
Designer: Jaehyung Kim , Kwanhee Lee , Jihye Lee
Abstract: FIG. 1 is a front perspective view of a case for electronic device showing our new design;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a left-side view thereof;
FIG. 5 is a right-side view thereof;
FIG. 6 is a top view thereof; and,
FIG. 7 is a bottom view thereof.
The broken lines in the figures depict portions of the case for electronic device which form no part of the claimed design.-
公开(公告)号:US11575882B2
公开(公告)日:2023-02-07
申请号:US17135247
申请日:2020-12-28
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Bora Jin , Yeoul Lee , Jihye Lee , Kyungmin Lim , Jaesung Lee
IPC: H04N13/395 , H04N13/122 , G06N3/08 , G09G3/00 , H04N13/351 , H04N13/128
Abstract: An electronic apparatus includes a stacked display including a plurality of panels, and a processor configured to obtain first light field (LF) images of different viewpoints, input the obtained first LF images to an artificial intelligence model for converting an LF image into a layer stack, to obtain a plurality of layer stacks to which a plurality of shifting parameters indicating depth information in the first LF images are respectively applied, and control the stacked display to sequentially and repeatedly display, on the stacked display, the obtained plurality of layer stacks. The artificial intelligence model is trained by applying the plurality of shifting parameters that are obtained based on the depth information in the first LF images.
-
公开(公告)号:USD859390S1
公开(公告)日:2019-09-10
申请号:US29614543
申请日:2017-08-21
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Designer: Byunglyul Park , Kangho Park , Bora Han , Sehan Kim , Yoonha Paick , Bongkyu Song , Ilwoo Lee , Jihye Lee
-
公开(公告)号:USD800976S1
公开(公告)日:2017-10-24
申请号:US29560623
申请日:2016-04-08
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Designer: Hyunhee Im , Jeonghoon Kang , Sangyoung Kweon , Jihye Lee , Jihoon Choi
-
公开(公告)号:US11961839B2
公开(公告)日:2024-04-16
申请号:US18133156
申请日:2023-04-11
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Hyojin Kim , Jihye Lee , Sangmoon Lee , Seung Hun Lee
IPC: H01L29/161 , H01L27/092
CPC classification number: H01L27/092 , H01L29/161
Abstract: A semiconductor device including a substrate; a first active pattern on the substrate and extending in a first direction, an upper portion of the first active pattern including a first channel pattern; first source/drain patterns in recesses in an upper portion of the first channel pattern; and a gate electrode on the first active pattern and extending in a second direction crossing the first direction, the gate electrode being on a top surface and on a side surface of the at least one first channel pattern, wherein each of the first source/drain patterns includes a first, second, and third semiconductor layer, which are sequentially provided in the recesses, each of the first channel pattern and the third semiconductor layers includes silicon-germanium (SiGe), and the first semiconductor layer has a germanium concentration higher than those of the first channel pattern and the second semiconductor layer.
-
-
-
-
-
-
-
-
-