公开(公告)号：US12288674B2

公开(公告)日：2025-04-29

申请号：US17859316

申请日：2022-07-07

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hyosin Kim ,  Sungyong Lim ,  Minsung Kim ,  Dongyub Kim ,  Sungyeol Kim ,  Jongbeom Moon ,  Seungbo Shim

IPC: H01J37/32 ,  H03H7/38

Abstract: Provided are a hybrid matcher capable of precisely performing impedance matching at a high speed when RF power is applied with a multi-level pulse in a facility using RF plasma, and an RF matching system including the hybrid matcher. The hybrid matcher includes a matching circuit in which a plurality of variable element-switch sets are connected to each other in parallel, the variable element-switch sets each including a variable impedance element and a switch connected to the variable impedance element in series and electrically operating therewith, a sensor disposed at a front stage of the matching circuit and configured to measure a current and a voltage of radio frequency (RF) power applied from an RF generator, a variable element driver configured to drive the variable impedance element, a switch driver configured to drive the switch, and a controller configured to control the variable element driver and the switch driver.

公开(公告)号：US11282679B2

公开(公告)日：2022-03-22

申请号：US16870186

申请日：2020-05-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Donghyeon Na ,  Hyosin Kim ,  Seungbo Shim ,  Hadong Jin ,  Dougyong Sung ,  Minyoung Hur

IPC: H01J37/32 ,  H03H7/40 ,  H03H7/01

Abstract: A plasma control apparatus for controlling plasma to be uniformly distributed in a plasma chamber and a plasma processing system including the same are provided. The plasma control apparatus includes a transmission line configured to deliver radio frequency (RF) power to a plasma chamber through at least two frequencies, a matching circuit configured to control impedance for maximum delivery of the RF power, and a plasma control circuit configured to selectively and independently control harmonics at a very high frequency (VHF) among the at least two frequencies and to control plasma distribution in the plasma chamber by producing resonance for the harmonics.