Deposition apparatus
    1.
    发明授权

    公开(公告)号:US11441220B2

    公开(公告)日:2022-09-13

    申请号:US17010535

    申请日:2020-09-02

    Abstract: A deposition apparatus may include a chamber, a crucible in the chamber, a cover part covering the crucible, and 2n nozzles (where ‘n’ is a positive integer number) protruding from the cover part and arranged in a first direction. Among the 2n nozzles, a distance between a n-th nozzle and a (n+1)-th nozzle may be greater than a distance between a (2n−1)-th nozzle and a 2n-th nozzle.

    Method of manufacturing display apparatus

    公开(公告)号:US11171317B2

    公开(公告)日:2021-11-09

    申请号:US16777262

    申请日:2020-01-30

    Abstract: A method of manufacturing a display apparatus includes: preparing a substrate including a display area and a sensor area arranged in the display area; forming first counter electrodes on the substrate so that the first counter electrodes are spaced apart from one another in the sensor area to have a first pattern; depositing second counter electrodes having a second pattern different from the first pattern to be spaced apart from one another in the sensor area; and arranging a component to correspond to the sensor area.

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