公开(公告)号：US20200328237A1

公开(公告)日：2020-10-15

申请号：US16808157

申请日：2020-03-03

Applicant: Samsung Display Co., Ltd.

Inventor： Dong-min LEE ,  Ji-Hwan KIM ,  Jongoh SEO ,  Byung Soo SO ,  Dong-Sung LEE ,  Jonghoon CHOI

IPC: H01L27/12 ,  H01L21/02

Abstract: A laser apparatus includes a laser generator configured to generate a first laser beam proceeding along a first direction, and an inversion module configured to convert the first laser beam to a second laser beam proceeding along the first direction, the inversion module including a splitter configured to form a reflected laser beam by partially reflecting the first laser beam, and a transmitted laser beam by partially transmitting the first laser beam, and a prism configured to reflect the reflected laser beam.

公开(公告)号：US20200303424A1

公开(公告)日：2020-09-24

申请号：US16821484

申请日：2020-03-17

Applicant: Samsung Display Co., LTD.

Inventor： Dong-Sung LEE ,  Jongoh SEO ,  Byung Soo SO ,  Dong-min LEE ,  Yeon Hee JEON ,  Jonghoon CHOI

IPC: H01L27/12 ,  H01L29/786 ,  H01L29/04 ,  H01L21/02

Abstract: A display device may include a thin film transistor disposed on a substrate, and a display element electrically connected to the thin film transistor. The thin film transistor may include an active pattern including polycrystalline silicon, a gate insulation layer disposed on the active pattern, and a gate electrode disposed on the gate insulation layer. An average value of grain sizes of the active pattern may be in a range of about 400 nm to about 800 nm. An RMS value of a surface roughness of the active pattern may be about 4 nm or less. A method of manufacturing a polycrystalline silicon layer may include cleaning an amorphous silicon layer with hydrofluoric acid, rinsing the amorphous silicon layer with hydrogenated deionized water, and irradiating the amorphous silicon layer with a laser beam having an energy density of about 440 mJ/cm2 to about 490 mJ/cm2.

公开(公告)号：US20220173134A1

公开(公告)日：2022-06-02

申请号：US17672574

申请日：2022-02-15

Applicant: Samsung Display Co., Ltd.

Inventor： Dong-min LEE ,  Ji-Hwan KIM ,  Jongoh SEO ,  Byung Soo SO ,  Dong-Sung LEE ,  Jonghoon CHOI

IPC: H01L27/12 ,  H01L21/02 ,  B23K26/53 ,  H01S3/00 ,  G02B27/12

Abstract: A laser apparatus includes a laser generator configured to generate a first laser beam proceeding along a first direction, and an inversion module configured to convert the first laser beam to a second laser beam proceeding along the first direction, the inversion module including a splitter configured to form a reflected laser beam by partially reflecting the first laser beam, and a transmitted laser beam by partially transmitting the first laser beam, and a prism configured to reflect the reflected laser beam.