METHOD OF MANUFACTURING THIN-FILM TRANSISTOR SUBSTRATE
    1.
    发明申请
    METHOD OF MANUFACTURING THIN-FILM TRANSISTOR SUBSTRATE 有权
    制造薄膜晶体管基板的方法

    公开(公告)号:US20170012112A1

    公开(公告)日:2017-01-12

    申请号:US15056033

    申请日:2016-02-29

    Abstract: Provided is a method of manufacturing a thin-film transistor substrate, the method includes forming a semiconductor pattern layer on a substrate. A first insulating film is formed on the semiconductor pattern layer. A metal pattern layer including a gate electrode and first and second alignment electrodes respectively spaced apart from two sides of the gate electrode is formed on the first insulating film. A cover layer covering the gate electrode is formed. The first and second alignment electrodes are removed. A first doping process is performed by doping the semiconductor pattern layer with a first impurity by using the cover layer as a mask. The cover layer is removed. A second doping process is performed by doping the semiconductor pattern layer with a second impurity having a lower impurity concentration than the first impurity by using the gate electrode as a mask.

    Abstract translation: 提供一种制造薄膜晶体管基板的方法,该方法包括在基板上形成半导体图案层。 在半导体图案层上形成第一绝缘膜。 在第一绝缘膜上形成包括栅电极的金属图案层和分别与栅电极的两侧间隔开的第一和第二取向电极。 形成覆盖栅电极的覆盖层。 去除第一和第二对准电极。 通过使用覆盖层作为掩模,通过用第一杂质掺杂半导体图案层来执行第一掺杂工艺。 盖层被去除。 通过使用栅电极作为掩模,通过掺杂具有比第一杂质更低的杂质浓度的第二杂质的半导体图案层来进行第二掺杂工艺。

    METHOD OF MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE
    3.
    发明申请
    METHOD OF MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE 有权
    制造薄膜晶体管基板的方法

    公开(公告)号:US20160372498A1

    公开(公告)日:2016-12-22

    申请号:US14987615

    申请日:2016-01-04

    Abstract: A method of manufacturing a thin film transistor substrate includes forming a semiconductor pattern on a substrate, wherein the semiconductor pattern includes a first area, a second area, and a third area, wherein the second area and the third area are located on each side of the first area; forming an insulating layer on the substrate to cover the semiconductor pattern; forming a metal pattern layer on the insulating layer using a first photosensitive pattern; doping the semiconductor pattern with first impurities using the first photosensitive pattern; forming a gate electrode by patterning the metal pattern layer using a second photosensitive pattern; and doping the semiconductor pattern with second impurities having a lower concentration than the first impurities.

    Abstract translation: 制造薄膜晶体管基板的方法包括在基板上形成半导体图案,其中半导体图案包括第一区域,第二区域和第三区域,其中第二区域和第三区域位于 第一区; 在所述衬底上形成绝缘层以覆盖所述半导体图案; 使用第一感光图案在所述绝缘层上形成金属图案层; 使用第一感光图案,用第一杂质掺杂半导体图案; 通过使用第二感光图案图案化所述金属图案层来形成栅电极; 并且用具有比第一杂质低的浓度的第二杂质来掺杂半导体图案。

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