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公开(公告)号：US11866837B2
公开(公告)日：2024-01-09
申请号：US15342515
申请日：2016-11-03
Applicant: Nivarox-FAR S.A.
Inventor： Pierre Cusin , Alex Gandelhman , Michel Musy
CPC classification number: C25D1/003 , C22C19/03 , C25D1/00 , C25D1/20 , G04B45/0069 , G04B45/0076 , B44F7/00 , C25D3/12
Abstract: The invention relates to a method for fabrication of a one-piece, metal-based component of simple shape offering the illusion of faceting and/or chamfering for forming all or part of the exterior part of a timepiece.
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2.发明申请MICROMECHANICAL COMPONENT WITH A REDUCED CONTACT SURFACE AND ITS FABRICATION METHOD 有权具有减少接触面的微机械部件及其制造方法公开(公告)号：US20160376147A1
公开(公告)日：2016-12-29
申请号：US15171002
申请日：2016-06-02
Applicant: Nivarox-FAR S.A.
Inventor： Alex Gandelhman , Andre Pin
CPC classification number: B81C1/00619 , B81B2201/035 , B81B2203/0384 , B81C1/00103 , B81C2201/0112 , B81C2201/0132 , B81C2201/0138 , B81C2201/014 , B81C2201/0188 , B81C2201/0198 , G04B13/02 , G04B13/026 , G04B13/027 , G04D99/00
Abstract: The invention relates to a silicon-based component with at least one reduced contact surface which, formed from a method combining at least one oblique side wall etching step with a “Bosch” etch of vertical side walls, improves, in particular, the tribology of components formed by micromachining a silicon-based wafer.
Abstract translation: 本发明涉及具有至少一个还原接触表面的硅基组分，其由至少一个倾斜侧壁蚀刻步骤与垂直侧壁的“博世”蚀刻法组合的方法形成，特别是改进了摩擦学 通过微加工硅基晶片形成的部件。
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公开(公告)号：US12124223B2
公开(公告)日：2024-10-22
申请号：US17121095
申请日：2020-12-14
Applicant: Nivarox-FAR S.A.
Inventor： Pierre Cusin , Alex Gandelhman , Michel Musy , Clare Golfier
CPC classification number: G04D3/0069 , B29C59/02 , C25D1/00 , G03F7/20
Abstract: A method for fabricating a metallic timepiece component, wherein the method includes the steps of forming, via a UV-LIGA type process combined with hot stamping, a multi-level photosensitive resin mould and electroplating a layer of at least one metal from at least two conductive layers to form a block that substantially reaches the upper surface of the photosensitive resin.
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公开(公告)号：US11774914B2
公开(公告)日：2023-10-03
申请号：US17149112
申请日：2021-01-14
Applicant: Nivarox-FAR S.A.
Inventor： Pierre Cusin , Alex Gandelhman
CPC classification number: G04D3/0069 , G04B17/045
Abstract: A one-piece silicon device with flexible blades (2, 3), in particular for timepieces, for example a pivot with crossed blades, and to a method for manufacturing the device (1). The method includes: forming (21) a one-piece silicon device (1) blank from a wafer of the SOI type, the device (1) including two flexible blades (2, 3), each formed in a different layer of the SOI wafer, the blades (2, 3) being arranged in two different substantially parallel planes, the blades (2, 3) being separated by a clearance (7); growing a first silicon oxide layer on the surface of at least one of the blades (2, 3) bordering the clearance, the first silicon oxide layer being formed from a first sub-layer of silicon of the one or more blades (2, 3); and removing the first silicon oxide layer to increase the clearance (7) between the two blades (2, 3).
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5.发明授权公开(公告)号：US10981783B2
公开(公告)日：2021-04-20
申请号：US16441068
申请日：2019-06-14
Applicant: Nivarox-FAR S.A.
Inventor： Alex Gandelhman , Pierre Cusin , Marco Verardo
Abstract: A system including two components intended to be in friction contact with each other in a given direction, wherein the friction occurs in a functional area, wherein the system is at least one of the two components including, on a surface in the functional area, a texture formed of a series of troughs of rounded shape separated by peaks or a series of bumps of rounded shape separated by troughs, the troughs extending parallel in the given direction and allowing for the evacuation of debris produced by friction and serving as a reservoir for a lubricant. A method for manufacturing at least one component or a mold by the DRIE (deep reactive ion etching) process, wherein surface defects on the sidewalls machined by the DRIE process are used to form the troughs.
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Patent Agency Ranking
6.发明授权公开(公告)号：US12037695B2
公开(公告)日：2024-07-16
申请号：US17120799
申请日：2020-12-14
Applicant: Nivarox-FAR S.A.
Inventor： Pierre Cusin , Alex Gandelhman , Michel Musy , Clare Golfier
CPC classification number: C25D1/003 , G03F7/0002 , G03F7/0035 , G03F7/164 , G03F7/168
Abstract: A method for manufacturing metal horological components, includes the steps of forming a multilevel mould made of a photosensitive resin, with a UV-LIGA method, and galvanically depositing a layer of at least one metal starting from a conductive layer in order to form a block that substantially reaches the upper surface of the photosensitive resin.
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公开(公告)号：US11334025B2
公开(公告)日：2022-05-17
申请号：US16522206
申请日：2019-07-25
Applicant: Nivarox-FAR S.A.
Inventor： Pierre Cusin , Alex Gandelhman , Anguel Kostadinov
Abstract: A method for producing a thermocompensated and coloured coil spring including the steps of forming a first layer of silicon oxide on at least one face of the core and on at least one other face of the core, the first layer having a thickness equal to a fraction of the thickness required for achieving thermal compensation, removing the first layer from at least one face of the core, forming a second layer of silicon oxide on at least one face of the core and on at least one other face of the core, the second layer having a thickness equal to the remaining fraction of the thickness required for achieving thermal compensation which is lower than or equal to 1 μm for giving at least one face of the core a colour as a result of the interference effect.
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8.发明授权公开(公告)号：US09740174B2
公开(公告)日：2017-08-22
申请号：US15339249
申请日：2016-10-31
Applicant: Nivarox-FAR S.A.
Inventor： Pierre Cusin , Alex Gandelhman , Michel Musy
CPC classification number: G04B45/0076 , B44C1/227 , B44F7/00 , B81C1/00126 , G04B19/042 , G04B19/12 , G04B45/0015 , G04D3/0046 , G04D3/0074
Abstract: The invention relates to a method for fabrication of a one-piece, silicon-based component of simple shape offering the illusion of faceting and/or chamfering for forming all or part of the exterior part of a timepiece.
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公开(公告)号：US09731964B2
公开(公告)日：2017-08-15
申请号：US15171002
申请日：2016-06-02
Applicant: Nivarox-FAR S.A.
Inventor： Alex Gandelhman , Andre Pin
CPC classification number: B81C1/00619 , B81B2201/035 , B81B2203/0384 , B81C1/00103 , B81C2201/0112 , B81C2201/0132 , B81C2201/0138 , B81C2201/014 , B81C2201/0188 , B81C2201/0198 , G04B13/02 , G04B13/026 , G04B13/027 , G04D99/00
Abstract: The invention relates to a silicon-based component with at least one reduced contact surface which, formed from a method combining at least one oblique side wall etching step with a “Bosch” etch of vertical side walls, improves, in particular, the tribology of components formed by micromachining a silicon-based wafer.
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10.发明授权公开(公告)号：US11454886B2
公开(公告)日：2022-09-27
申请号：US17080984
申请日：2020-10-27
Applicant: Nivarox-FAR S.A.
Inventor： Pierre Cusin , Alex Gandelhman , Michel Musy , Clare Golfier
Abstract: A method for manufacturing metallic horological components includes the steps of forming a LIGA-UV type method a multi-level photosensitive resin mould and of galvanically depositing a layer of at least one metal using at least two conductive layers to form a block substantially reaching the top surface of the photosensitive resin.
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