METHOD AND SYSTEM FOR PLANNING METROLOGY MEASUREMENTS
    1.
    发明申请
    METHOD AND SYSTEM FOR PLANNING METROLOGY MEASUREMENTS 审中-公开
    用于规划量度测量的方法和系统

    公开(公告)号:US20160363872A1

    公开(公告)日:2016-12-15

    申请号:US15121479

    申请日:2015-02-26

    Abstract: A method for use in planning metrology measurements, the method comprising: providing inverse total measurement uncertainty (TMU) analysis equations for upper and lower confidence limits TMUUL and TMULL of the TMU being independent on prior knowledge of measurements by a tool under test (TuT) and a reference measurement system (RMS), thereby enabling estimation of input parameters for said equations prior to conducting an experiment of the TMU analysis; and determining at least one of a total number N of samples to be measured in the TMU analysis and an average number ns of measurements per sample by the RMS.

    Abstract translation: 一种用于规划度量测量的方法,所述方法包括:提供用于上限和下限置信限的反向总测量不确定度(TMU)分析方程,TMUU和TMU独立于被测试工具(TuT)的现有测量知识, 和参考测量系统(RMS),从而能够在进行TMU分析的实验之前估计所述方程式的输入参数; 并且在TMU分析中确定待测量的样本的总数N中的至少一个,并且通过RMS确定每个样本的平均数ns。

Patent Agency Ranking