METHOD OF FABRICATING 3D NANOSTRUCTURED METAL OXIDES USING PROXIMITY-FIELD NANOPATTERNING AND ATOMIC LAYER DEPOSITION
    1.
    发明申请
    METHOD OF FABRICATING 3D NANOSTRUCTURED METAL OXIDES USING PROXIMITY-FIELD NANOPATTERNING AND ATOMIC LAYER DEPOSITION 审中-公开
    使用近场纳米管和原子层沉积制备三维纳米结构金属氧化物的方法

    公开(公告)号:US20140349085A1

    公开(公告)日:2014-11-27

    申请号:US14097971

    申请日:2013-12-05

    CPC classification number: B01D67/0039 B01D67/0062 B01D71/024 Y10T428/24802

    Abstract: The present invention is 3D nanostructured porous metal oxide and the method of fabricating said metal oxide, wherein said method is comprising the steps of: (a) spin-coating with photoresist onto substrate; (b) forming periodic 3D porous nanostructure patterned pore in said photoresist using proximity-field nanopatterning; (c) impregnating metal oxide into said 3D pore of photoresist having said periodic 3D pore pattern as template via atomic layered deposition (ALD) with metal precursor; and (d) obtaining 3D nanostructured porous metal oxide having the inverse shape of said template by removing said photoresist template.

    Abstract translation: 本发明是3D纳米结构多孔金属氧化物和制造所述金属氧化物的方法,其中所述方法包括以下步骤:(a)将光致抗蚀剂旋涂到基底上; (b)使用接近场纳米图案在所述光致抗蚀剂中形成周期性的3D多孔纳米结构图案孔; (c)通过具有金属前体的原子层状沉积(ALD)将金属氧化物浸渍到具有所述周期性3D孔隙图案的光致抗蚀剂的3D孔中作为模板; 和(d)通过去除所述光致抗蚀剂模板获得具有所述模板的倒数形状的3D纳米结构多孔金属氧化物。

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