Semiconductor device
    1.
    发明授权

    公开(公告)号:US11974467B2

    公开(公告)日:2024-04-30

    申请号:US17548707

    申请日:2021-12-13

    摘要: A display device and manufacturing method thereof with a high level of reliability is provided without increasing the number of manufacturing processes. The display device includes a first conductor, a first insulation layer including a first contact hole exposing a part of the first conductor, a second insulation layer including a second contact hole exposing at least a part of the first contact hole and a part of a surface of the first insulation layer, a pixel electrode overlapping a part of the second contact hole and electrically connected to the first conductor, and a third insulation layer contacting the first insulation layer via the second contact hole.

    Display device and method of manufacturing the same

    公开(公告)号:US09853094B2

    公开(公告)日:2017-12-26

    申请号:US15072631

    申请日:2016-03-17

    IPC分类号: H01L27/32

    摘要: A display device and manufacturing method thereof with a high level of reliability is provided without increasing the number of manufacturing processes. The display device includes a first conductor, a first insulation layer including a first contact hole exposing a part of the first conductor, a second insulation layer including a second contact hole exposing at least a part of the first contact hole and a part of a surface of the first insulation layer, a pixel electrode overlapping a part of the second contact hole and electrically connected to the first conductor, and a third insulation layer contacting the first insulation layer via the second contact hole.

    Semiconductor device, transistor array substrate and light emitting device

    公开(公告)号:US11217644B2

    公开(公告)日:2022-01-04

    申请号:US16665276

    申请日:2019-10-28

    IPC分类号: H01L27/32

    摘要: A display device and manufacturing method thereof with a high level of reliability is provided without increasing the number of manufacturing processes. The display device includes a first conductor, a first insulation layer including a first contact hole exposing a part of the first conductor, a second insulation layer including a second contact hole exposing at least a part of the first contact hole and a part of a surface of the first insulation layer, a pixel electrode overlapping a part of the second contact hole and electrically connected to the first conductor, and a third insulation layer contacting the first insulation layer via the second contact hole.

    Display device and manufacturing method thereof

    公开(公告)号:US10665813B2

    公开(公告)日:2020-05-26

    申请号:US16537697

    申请日:2019-08-12

    摘要: Disclosed is a display device having a pixel including a pixel electrode, an electroluminescence layer over the pixel electrode, and an opposing electrode over the electroluminescence layer. The pixel electrode possesses: a first conductive layer including a conductive oxide containing indium and zinc; a second conductive layer over the first conductive layer, the second conductive layer containing silver; and a third conductive layer over the second conductive layer, the third conductive layer including a conductive oxide containing indium and tin. A thickness of the first conductive layer is equal to or more than twice a thickness of the third conductive layer and equal to or less than five times the thickness of the third conductive layer.

    Method of manufacturing an organic EL display device, and organic EL display device

    公开(公告)号:US09865834B2

    公开(公告)日:2018-01-09

    申请号:US15091731

    申请日:2016-04-06

    IPC分类号: H01L51/56 H01L51/52 H01L27/32

    CPC分类号: H01L51/5218 H01L27/3244

    摘要: A method of manufacturing a display device includes forming a three-layer laminate by laminating a first transparent conductive film, a metal film, and a second transparent conductive film in order from a substrate side. The three-layer laminate forms a plurality of anode electrodes arranged in a pixel region and a plurality of dummy electrodes arranged on an outer side of the pixel region. The method of manufacturing a display device also includes subjecting the second transparent conductive film and the metal film to etching and subjecting the first transparent conductive film to etching. A density of a pattern of the plurality of dummy electrodes is reduced as a distance from the pixel region is increased.